Abstract: A composition is prepared by heating particles of a nuclear fuel material in a metal salt that decomposes below 1000° C. to form a metal oxide. Magnesium nitrate hexahydrate is an example of such a metal salt. A resulting composition includes the particles homogeneously dispersed in a matrix of magnesium oxide. After the composition is used in a nuclear reactor, the now spent composition is removed, cooled, and the matrix is dissolved away from the spent particles, which can be reused in another nuclear fuel composition. The recovered fuel particles also contain some fission products that provide a radiation barrier that discourages theft of the recovered fuel particles.

Abstract: A process of preparing diamond, e.g., diamond fiber, by subjecting a hydrocarbon material, e.g., a hydrocarbon fiber, to a plasma treatment in a gaseous feedstream for a sufficient period of time to form diamond, e.g., a diamond fiber is disclosed. The method generally further involves pretreating the hydrocarbon material prior to treatment with the plasma by heating within an oxygen-containing atmosphere at temperatures sufficient to increase crosslinking within said hydrocarbon material, but at temperatures insufficient to melt or decompose said hydrocarbon material, followed by heating at temperatures sufficient to promote outgassing of said crosslinked hydrocarbon material, but at temperatures insufficient to convert said hydrocarbon material to carbon.

Abstract: A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.