Abstract: The present invention is directed to a photo-sensitive laminate film for use in making an image mask for etching an image on a substrate. In a first preferred embodiment, the photo-sensitive laminate film comprises a support sheet having a first surface and a second surface, a layer of polymer resin composition having photocrosslinkability, the layer of polymer resin composition having a first surface and a second surface, and a fractionally-releasable bonding layer located between the first surface of the support sheet and the second surface of the layer of polymer resin composition. Upon the creation of an image mask from the layer of polymer resin composition, the image mask is capable of being separated from the first surface of the support sheet such that at least a portion of the bonding layer located between the image mask and the first surface of the support sheet is released from the support sheet with the image mask, and the remaining portion of the bonding layer remains with the support sheet.