Patents by Inventor Steven F. Bergeron

Steven F. Bergeron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11752412
    Abstract: A golf swing simulator/training aid includes a first rod section, a second rod section, a third rod section, a fixed weight, a grip, a first threaded connector fitting, and a second threaded connector fitting. The fixed weight is generally secured to a first end of the first rod section. The grip is generally attached to and surrounding a second end of the third rod section. The first threaded connector fitting may removably couple the first rod section to the second rod section. The second threaded connector fitting may removably couple the second rod section to the third rod section.
    Type: Grant
    Filed: April 12, 2022
    Date of Patent: September 12, 2023
    Inventor: Steven F. Bergeron
  • Publication number: 20220347543
    Abstract: A golf swing simulator/training aid includes a first rod section, a second rod section, a third rod section, a fixed weight, a grip, a first threaded connector fitting, and a second threaded connector fitting. The fixed weight is generally secured to a first end of the first rod section. The grip is generally attached to and surrounding a second end of the third rod section. The first threaded connector fitting may removably couple the first rod section to the second rod section. The second threaded connector fitting may removably couple the second rod section to the third rod section.
    Type: Application
    Filed: April 12, 2022
    Publication date: November 3, 2022
    Inventor: Steven F. Bergeron
  • Patent number: 4457820
    Abstract: A method of etching a variable thickness material on a substrate through an opening or openings is disclosed. The method includes a first etch step in which the material is isotropically etched until the substrate material is first exposed defining a first end point. Thereafter, a second anisotropic etch is performed until all of the remaining material at the opening or openings is removed.Preferably the etching is by dry plasma etching and the first end point is detected by monitoring the change in concentration of a reactive species. The change is sharply defined by taking a second derivative of the curve of the change in intensity of the peak of the sensed species.
    Type: Grant
    Filed: December 24, 1981
    Date of Patent: July 3, 1984
    Assignee: International Business Machines Corporation
    Inventors: Steven F. Bergeron, Bernard F. Duncan