Abstract: The disclosure relates to fluorescent lamps and methods of manufacture wherein the mercury is dosed into the lamp in a solid material containing mercury, bismuth, indium and another metal. In one embodiment, the metal is selected from the group consisting of zinc, tin, lead, silver, gold, copper, gallium, titanium, nickel, and manganese. Preferably, the atomic ratio of the indium to the bismuth is in the range of about 0.4:0.6 to 0.7:0.3. The atomic ratio of zinc to the combination indium and bismuth may preferably be in the range of about 0.01:0.99 to 0.20:0.80, and the atomic ratio of mercury to the combination of the indium, bismuth and zinc is preferably in the range of about 0.01:0.99 and 0.15:0.85.

Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.

Abstract: A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto a photoresist layer coated on the substrate.

Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.

Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.

Abstract: A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.

Abstract: Polyester compositions comprising microfibers and micropowders are disclosed. The polyester compositions are made by contacting microfibers and micropowders with polymerizable components, such as monomers, suitable for making polyesters, and polymerizing the polymerizable components. The microfibers and micropowders can be provided in the form of either separate slurries, or a single slurry. The micropowders can also alternatively be provided in the form of a powder rather than a slurry. A slurry containing microfiber and micropowders, and a process for making such a slurry, is also disclosed. Incorporating microfibers and micropowders into a polyester improves the properties of the molded parts, films and/or fibers that are made from such a polyester. A slurry containing microfibers and micropowders is more stable and easier to process, wherein the micropowder is less likely to separate out of the slurry or agglomerate when compared to a slurry containing only micropowder.

Abstract: A slurry containing microfiber and micropowders, and a process for making such a slurry, are provided. The slurry containing microfibers and micropowders is more stable and easier to process, and the micropowder is less likely to separate out of the slurry or agglomerate in comparison to a slurry containing only micropowder.

Abstract: A lithographic apparatus includes a support structure configured to hold a phase shift mask, the phase shift mask configured to pattern a beam of unpolarized radiation according to a desired pattern and a substrate table configured to hold a substrate. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate on which a negative resist layer is deposited to form an image of the pattern on the negative resist layer.

Abstract: A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate; and determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.

Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

Abstract: A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis component and an off-axis component, the mask pattern including non-printing assist features configured for a pitch larger than twice a minimum pitch of the mask pattern, and projecting an image of the illuminated mask pattern onto the substrate.

Abstract: A ring illuminator (20) has a light channeling section (22) with an input face (24) optically coupling the light channeling section (22) to a flash unit (16) of a camera (12) for obtaining flash illumination therefrom. A ring section (26) is optically coupled to the light channeling section and extends around an aperture for fitting the ring illuminator around a lens (14). The ring section has a rear surface (30) for positioning toward the body of the camera. The rear surface has a plurality of light redirecting features (28) for redirecting at least a portion of the flash illumination from within the ring section outward from the camera, around the lens of the camera.

Abstract: An apparatus for suitable for obtaining an image of a dental structure has an illuminator member placed proximate the area to be imaged. The illuminator member has a support structure (30) for retaining the illuminator member in position proximate the area to be imaged. A reference (22) is coupled to the support structure (30) of the illuminator member and disposed within the area to be imaged. At least one light source (24) is coupled to the support structure (30) of the illuminator member for directing imaging illumination toward the area to be imaged. A camera (12) records an image from within the area to be imaged using the imaging illumination from the illuminator member, wherein the image comprises the reference (22).

Abstract: The present invention provides a process for producing a polyester from a polyester composition comprising at least about 1 wt. % wollastonite, based on the total weight of the polyester composition, wherein the wollastonite is added at a temperature of about 240° C. or less. The present invention further provides a process for producing a polyester from a polyester composition comprising at least about 1 wt. % wollastonite, based on the total weight of the polyester composition, and about 0.01 wt. % other filler, based on total weight of the polyester composition, wherein the wollastonite is added at a temperature of about 240° C. or less. The invention is further directed to polyester products produced by said process and the shaped articles formed therefrom.

Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

Abstract: This invention provides certain processes to produce polyester compositions, which incorporate certain carbon black materials. This invention further provides the polyester products produced and shaped articles formed therefrom. The processes allows for the lowest levels of certain carbon blacks while maintaining the desired product attributes, such as electrical properties. The low levels of carbon black incorporated further provides production, processing, and end use benefits through a lower product melt viscosity.

Abstract: A method of reversing the tone of an image to be printed in a layer of radiation sensitive material formed on a substrate includes defining a lithographic problem, designing a patterning device, determining a first illumination arrangement and a radiation sensitive material process capable of printing a positive tone of the lithographic feature; and determining a second illumination arrangement capable of printing a negative tone of the lithographic feature with the radiation sensitive material process.

Abstract: A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.