Abstract: Stabilization mechanisms, ladders incorporating stabilization mechanisms, and related methods may include struts or braces that are automatically deployable from a collapsed configuration to a deployed or expanded configuration to support and stabilize the ladder when it is extended. The stabilizer mechanisms may include biasing members configured to urge the struts rearward and outward as a fly rail assembly of the ladder is extended relative to a base rail assembly thereof. Some stabilizer mechanisms are manually deployable independent of each other.

Abstract: An interactive electromigration rule-based topography layout adjustment methodology is provided as an adjunct to a computer aided design tool, in particular a design rule check (DRC) mechanism, the engine for which is served by a design rule database for defining topography parameters that conform with a given semiconductor wafer fabrication process. Using a set of customized design rule statements, the DRC program is able to provide circuit designer with the ability to identify and interactively change, as necessary, dimensions of those portions of branches of interconnect (metal, contacts, vias) within the topography of an integrated circuit layout, the customized DRC statements being customized in accordance with circuit operation-derived worst case current conditions as applied to a prescribed set of electromigration-based minimum width rules for interconnect metal, contacts and vias.