Patents by Inventor Stuart N. Rounds

Stuart N. Rounds has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for photoresist stripping using reverse flow
    Patent number: 5071485
    Abstract: A method and apparatus for stripping a photoresist layer from a semiconductor wafer, wherein oxidizing gas is fed from the edge of the wafer to the center. The oxidizing gas may be directed so that it is incident on the heated wafer support platform before it is incident on the wafer.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: December 10, 1991
    Assignee: Fusion Systems Corporation
    Inventors: John C. Matthews, Robert D. Wooten, David S. Ferris, Stuart N. Rounds
  • Apparatus for photoresist stripping
    Patent number: 4885047
    Abstract: An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: December 5, 1989
    Assignee: Fusion Systems Corporation
    Inventors: Michael G. Ury, John C. Matthews, Stuart N. Rounds