Patents by Inventor Stuart R. Martin

Stuart R. Martin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Precision analog metal-metal capacitor
    Patent number: 6008083
    Abstract: A precision analog metal-metal capacitor is fabricated by forming a first capacitor plate in an insulation layer by forming a trench therein, depositing metal within the trench and planarizing the device. A thin dielectric layer is then deposited and patterned over the first capacitor plate. A second insulator is then deposited over the device and discrete openings etched therein to expose the insulation layer and first metal plate. Metal is deposited within the openings and planarized, thereby forming a contact to the first metal plate and the second metal plate of the capacitor.
    Type: Grant
    Filed: March 19, 1997
    Date of Patent: December 28, 1999
    Assignee: International Business Machines Corporation
    Inventors: Terry J. Brabazon, Badih El-Kareh, Stuart R. Martin, Matthew J. Rutten, Carter W. Kaanta
  • Precision analog metal-metal capacitor
    Patent number: 5708559
    Abstract: A precision analog metal-metal capacitor is fabricated by forming a first capacitor plate in an insulation layer by forming a trench therein, depositing metal within the trench and planarizing the device. A thin dielectric layer is then deposited and patterned over the first capacitor plate. A second insulator is then deposited over the device and discrete openings etched therein to expose the insulation layer and first metal plate. Metal is deposited within the openings and planarized, thereby forming a contact to the first metal plate and the second metal plate of the capacitor.
    Type: Grant
    Filed: October 27, 1995
    Date of Patent: January 13, 1998
    Assignee: International Business Machines Corporation
    Inventors: Terry J. Brabazon, Badih El-Kareh, Stuart R. Martin, Matthew J. Rutten, Carter W. Kaanta
  • Planarized ceramic substrates
    Patent number: 4761332
    Abstract: A method of planarizing or smoothing the surface of a ceramic substrate by deposition of a silicon nitride layer. The silicon nitride in addition to planarizing the surface forms an alpha particle barrier. The substrates suitable for planarization with silicon nitride in accordance with the method of the present invention are sintered oxide particles which are bonded with a silicon bonding phase. The silicon content of the silicon bonding phase is greater than the silicon content of the aggregate of the oxide particles. The silicon nitride is preferably deposited by plasma enhanced chemical vapor deposition, and the silicon bonding phase is preferably a glass.
    Type: Grant
    Filed: February 24, 1987
    Date of Patent: August 2, 1988
    Assignee: International Business Machines Corporation
    Inventors: Kenneth L. Elias, Stuart R. Martin, William J. Slattery
  • Planarized ceramic substrates
    Patent number: 4659585
    Abstract: A method of planarizing or smoothing the surface of a ceramic substrate by deposition of a silicon nitride layer. The silicon nitride in addition to planarizing the surface forms an alpha particle barrier. The substrates suitable for planarization with silicon nitride in accordance with the method of the present invention are sintered oxide particles which are bonded with a silicon bonding phase. The silicon content of the silicon bonding phase is greater than the silicon content of the aggregate of the oxide particles. The silicon nitride is preferably deposited by plasma enhanced chemical vapor deposition, and the silicon bonding phase is preferably a glass.
    Type: Grant
    Filed: June 24, 1985
    Date of Patent: April 21, 1987
    Assignee: International Business Machines Corporation
    Inventors: Kenneth L. Elias, Stuart R. Martin, William J. Slattery