Patents by Inventor Subhash Anand

Subhash Anand has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • AUXETIC KNITTED FABRIC
    Publication number: 20120129416
    Abstract: An auxetic knitted fabric, comprising an auxetic component knitted from at least a first type of fibre, and a stabilising component knitted from at least a second type of fibre, wherein the first and second fibre types have different mechanical properties.
    Type: Application
    Filed: April 30, 2010
    Publication date: May 24, 2012
    Applicants: AUXETIC TECHNOLOGIES LTD., GLOBAL COMPOSITES GROUP
    Inventors: Subhash Anand, David Skertchly, Andrew Alderson, Kim Alderson
  • Stretch fabric substrate for medical use
    Patent number: 7207962
    Abstract: The present invention provides a stretch fabric substrate for medical use in a simple knitted structure with a good productivity having such a desired elastic recovery of elongation that no reduction of the fabric substrate in the widthwise direction takes place when elongation is applied to a necessary extent in the lengthwise direction. The fabric substrate according to the present invention is constituted by means of a warp knit substrate, the warp knit substrate is formed by means of a chain stitch using a stretch multifilament textured yarn and elastic yarns and non-stretch yarns are inserted in the lengthwise direct ion and in the widthwise direction, respectively to the chain stitch.
    Type: Grant
    Filed: July 15, 2003
    Date of Patent: April 24, 2007
    Assignee: ALCARE Co., Ltd.
    Inventors: Subhash Anand, Subbiyan Rajendran, Hiroaki Nakamura, Takanobu Aoyagi, Masatoshi Igarashi
  • Stretch fabric substrate for medical use
    Publication number: 20060116044
    Abstract: The present invention provides a stretch fabric substrate for medical use in a simple knitted structure with a good productivity having such a desired elastic recovery of elongation that no reduction of the fabric substrate in the widthwise direction takes place when elongation is applied to a necessary extent in the lengthwise direction. The fabric substrate according to the present invention is constituted by means of a warp knit substrate, the warp knit substrate is formed by means of a chain stitch using a stretch multifilament textured yarn and elastic yarns and non-stretch yarns are inserted in the lengthwise direct ion and in the widthwise direction, respectively to the chain stitch.
    Type: Application
    Filed: July 15, 2003
    Publication date: June 1, 2006
    Applicant: ALCARE CO., LTD
    Inventors: Subhash Anand, Subbiyan Rajendran, Hiroaki Nakamura, Takanobu Aoyagi, Masatoshi Igarashi