Patents by Inventor Suguru Kenmochi

Suguru Kenmochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9796156
    Abstract: The invention relates to a gas barrier film laminate comprising at least two gas barrier films and a pressure-sensitive adhesive layer, the at least two gas barrier films being stacked through the pressure-sensitive adhesive layer, at least one of the at least two gas barrier films including a base formed of a plastic film, and at least one gas barrier layer provided on the base, and the pressure-sensitive adhesive layer being a layer formed using a rubber-based pressure-sensitive adhesive composition that includes a rubber-based compound. The invention also relates to an electronic member comprising the gas barrier film laminate. The gas barrier film laminate exhibits a high water vapor barrier capability, and does not show interfacial lifting at the end thereof.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: October 24, 2017
    Assignee: LINTEC CORPORATION
    Inventors: Suguru Kenmochi, Satoshi Naganawa
  • Patent number: 9580625
    Abstract: Provided is a gas barrier pressure-sensitive adhesive sheet having at least one gas barrier layer and at least one pressure-sensitive adhesive layer, the at least one pressure-sensitive adhesive layer having a storage modulus at 23° C. of 1.5×104 to 1.0×107 Pa, and the gas barrier pressure-sensitive adhesive sheet not including a base layer.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: February 28, 2017
    Assignee: LINTEC CORPORATION
    Inventors: Emi Fuchi, Suguru Kenmochi, Satoshi Naganawa, Koichi Nagamoto
  • Patent number: 9336991
    Abstract: The disclosed ion implantation apparatus has a vacuum chamber 11, a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and a gas introduction unit having a gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction unit and a gas discharge outlet are disposed so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 10, 2016
    Assignee: LINTEC Corporation
    Inventors: Satoshi Naganawa, Daisuke Goto, Suguru Kenmochi
  • Patent number: 9330880
    Abstract: An ion implantation device equipped with a vacuum chamber (11), an electrode roll (13) on a portion of the outer circumferential part of which a film (2) is wound, a voltage application means (21) that applies a voltage to the electrode roll, and a gas introduction means (31) that introduces a gas into the vacuum chamber, wherein a voltage is applied to the electrode roll by means of the voltage application means and a gas is introduced by means of the gas introduction means, and an ion implantation process is performed on the surface of the film. In addition, electrode members (42) are provided opposing the surface of the electrode roll on which the film is wound.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 3, 2016
    Assignee: LINTEC CORPORATION
    Inventors: Satoshi Naganawa, Daisuke Goto, Suguru Kenmochi
  • Publication number: 20150206710
    Abstract: The disclosed ion implantation apparatus has a vacuum chamber 11, a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and. a gas introduction unit having a. gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction unit and a gas discharge outlet are disposed, so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween.
    Type: Application
    Filed: September 12, 2013
    Publication date: July 23, 2015
    Applicant: LINTEC Corporation
    Inventors: Satoshi Naganawa, Daisuke Goto, Suguru Kenmochi
  • Publication number: 20150206700
    Abstract: An ion implantation device equipped with a vacuum chamber (11), an electrode roll (13) on a portion of the outer circumferential part of which a film (2) is wound, a voltage application means (21) that applies a voltage to the electrode roll, and a gas introduction means (31) that introduces a gas into the vacuum chamber, wherein a voltage is applied to the electrode roll by means of the voltage application means and a gas is introduced by means of the gas introduction means, and an ion implantation process is performed on the surface of the film. In addition, electrode members (42) are provided opposing the surface of the electrode roll on which the film is wound.
    Type: Application
    Filed: September 12, 2013
    Publication date: July 23, 2015
    Inventors: Satoshi Naganawa, Daisuke Goto, Suguru Kenmochi
  • Publication number: 20150030829
    Abstract: The present invention relates to a gas barrier film laminate comprising at least two gas barrier films, the gas barrier film laminate having a configuration in which two adjacent gas barrier films are stacked through a pressure-sensitive adhesive layer, and the pressure-sensitive adhesive layer having a shear load reduction ratio ? (%) given by an expression (I) in claim 1, of 70% or less; and an adhesive film that is used to produce a gas barrier film laminate that includes at least two gas barrier films, and has a configuration in which two adjacent gas barrier films are stacked through a pressure-sensitive adhesive layer, the adhesive film comprising at least a gas barrier film and a pressure-sensitive adhesive layer that are stacked adjacent to each other, the pressure-sensitive adhesive layer having a shear load reduction ratio ? (%) given by an expression (I) in claim 11, of 70% or less.
    Type: Application
    Filed: March 5, 2013
    Publication date: January 29, 2015
    Applicant: LINTEC CORPORATION
    Inventors: Suguru Kenmochi, Satoshi Naganawa, Koichi Nagamoto
  • Publication number: 20140178622
    Abstract: The present invention is a gas barrier pressure-sensitive adhesive sheet comprising at least one gas barrier layer and at least one pressure-sensitive adhesive layer, the at least one pressure-sensitive adhesive layer having a storage modulus at 23° C. of 1.5×104 to 1.0×107 Pa, and the gas barrier pressure-sensitive adhesive sheet not including a base layer.
    Type: Application
    Filed: July 25, 2012
    Publication date: June 26, 2014
    Applicant: LINTEC CORPORATION
    Inventors: Emi Fuchi, Suguru Kenmochi, Satoshi Naganawa, Koichi Nagamoto
  • Publication number: 20140170431
    Abstract: The invention relates to a gas barrier film laminate comprising at least two gas barrier films and a pressure-sensitive adhesive layer, the at least two gas barrier films being stacked through the pressure-sensitive adhesive layer, at least one of the at least two gas barrier films including a base formed of a plastic film, and at least one gas barrier layer provided on the base, and the pressure-sensitive adhesive layer being a layer formed using a rubber-based pressure-sensitive adhesive composition that includes a rubber-based compound. The invention also relates to an electronic member comprising the gas barrier film laminate. The gas barrier film laminate exhibits a high water vapor barrier capability, and does not show interfacial lifting at the end thereof.
    Type: Application
    Filed: July 6, 2012
    Publication date: June 19, 2014
    Applicant: LINTEC CORPORATION
    Inventors: Suguru Kenmochi, Satoshi Naganawa