Abstract: A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to ?50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from ?50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Abstract: In a method and system for vapor etching, a material to be etched and an etch resistant material are placed into an etching chamber. Thereafter, a pressure in the etching chamber is adjusted to a desired pressure and the substrate is exposed to an etching gas and a gas that comprises oxygen. The exposure substantially selectively etches the material to be etched while substantially avoiding the etching of the etch resistant material.

Abstract: A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to ?50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from ?50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Abstract: A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to ?50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from ?50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Abstract: A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to ?50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from ?50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

Abstract: Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.

Abstract: A method for eliminating interference when analyzing a test sample of a bulk inert gas in an ion mobility spectrometer is disclosed which includes the steps of providing an ionization source for the spectrometer to form ions of the bulk inert gas, mixing a reagent gas with the test sample prior to entry into the spectrometer to alter the nature of the ions formed by the bulk inert gas to shift the location of a bulk inert gas mobility peak such that a bulk inert gas mobility peak does not overlap with an impurity mobility peak of the ions of a trace impurity of interest, whereby bulk inert gas ions are quenched and a clusters of the reagent gas and the bulk gas are formed. Alternatively, the reagent gas may be mixed with the drift gas in the ion mobility spectrometer, rather than with the test sample.

Abstract: A device for measuring a total concentration of impurities in a sample gas is provided which includes a housing having an inlet to allow the sample gas to enter the housing, an emitter to generate ions from the sample gas, a field gradient to accelerate the ions toward a collector, the collector adapted to measure total ions, and an outlet to allow the sample gas to exit the housing, whereby a change in total ions received by the collector indicates a change in the total concentration of impurities in the sample gas.

Abstract: Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.

Abstract: A gas sampling and inlet device for a mass spectrometer has a hollow housing sleeve with an open inside region and a hollow inner sleeve with an open inside region, with the inner sleeve coaxial to the housing sleeve. One end of the housing sleeve and one end of the inner sleeve are connected with a single first end cap. The second end of the housing sleeve has a second end cap, but the second end of the inner sleeve is open such that the inside of the inner sleeve is open to the inside of the housing sleeve. The first end cap has a small diameter orifice adapted to receive a gaseous fluid. The second end cap is connected to a mass spectrometer. The second end cap has an orifice adapted to receive a gaseous fluid into the mass spectrometer that is substantially smaller in diameter than the orifice in the first end cap. The housing sleeve has a vacuum pump port to allow a vacuum to be created in the interior of the inlet device.

Abstract: An apparatus for generating a low concentration calibration gas mixture containing percent, ppm, ppb or ppt amounts of a desired analyte from a high concentration gas mixture and a high purity diluent using a series of source gas containing vessels and a series of parallel gas or chemical conduits controlled by mass flow controllers in a purged enclosure with conduits to purge gas conduits of residual gases or corrosive gases.