Abstract: Provided are a method for producing pellets that are easy to be uniformly molded at the time of using the pellet for molding even when the pellets include a large amount of inorganic substance particles, the pellets, and a method for molding a resin molded article. The method for producing pellets according to the present invention includes a method for producing pellets formed from a resin composition including a crystalline macromolecule and an inorganic fine powder or organic fine powder in a mass ratio of 50:50 to 20:80, the method including the step of kneading the crystalline macromolecule and the inorganic fine powder or the organic fine powder so that the microcrystalline size of the crystalline macromolecule is 190 ? or smaller. The pellets according to the present invention are pellets formed from a resin composition including a crystalline macromolecule having a microcrystalline size of 190 ? or smaller, and inorganic substance particles in a mass ratio of 50:50 to 20:80.

Abstract: An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula: R1—C(—O)—(CR22)n—(OR3)p—(CR42)q-L-OSO3X wherein R1, R2, R3, R4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.

Abstract: A substrate processing apparatus includes a plurality of process chambers for processing a substrate, a first transfer robot configured to transfer the substrate and arranged in a first transfer chamber, a second transfer robot configured to transfer the substrate and arranged in a second transfer chamber, and a share module arranged adjacent to the first transfer chamber and the second transfer chamber and configured to receive the substrate from any one of the first transfer robot and the second transfer robot, wherein an inside of each of the first transfer chamber and the second transfer chamber is in a vacuum state, and the first transfer robot and the second transfer robot transfer the substrate in a vacuum state.

Abstract: A substrate processing apparatus according to the present invention includes a support tray that is configured in such a manner that a residual liquid getting in between a lower surface of a substrate and a substrate facing surface of the support tray is trapped in a groove. The support tray further includes a discharge part through which the residual liquid trapped in the groove is discharged from the groove through a discharge part. As a result, backflow of the residual liquid is prevented effectively, thereby preventing re-adhesion of the residual liquid to the upper surface of the substrate.

Abstract: A substrate processing method according to the invention includes a supercritical process step of processing a substrate by a processing fluid in a supercritical state by introducing the processing fluid into an internal space of the chamber accommodating the substrate, a decompression step of decompressing the internal space by discharging the processing fluid, a carry-out step of carrying out the substrate from the chamber, and a temperature adjustment step of adjusting a temperature of the internal space to a target temperature by introducing and discharging the processing fluid to and from the internal space after the substrate is carried out. Stable processing efficiency can be obtained also particularly in the case of processing a plurality of substrates in turn by properly controlling a temperature in a chamber after a process in a technique for processing a substrate by a processing fluid in a supercritical state in the chamber.

Abstract: In one exemplary embodiment, a method computer-implemented method of generating an outlier wheel data visualization for a graphical user interface (GUI) is provided. The method includes receiving emission data from a plurality of amplification reactions. The method further includes generating an outlier wheel data visualization using the emission data including a plurality of lines, where each line included in the outlier wheel data visualization represents emission data from an amplification reaction of the plurality of amplification reactions, and each line having a length and a visual indicator. The length of each line represents growth of intensity of fluorescence of the emission data and the visual indicator indicates the associated cycle number of the emission data. Further, each line is associated with an angular position so that the plurality of lines is configured in a circular shape. The method includes displaying the outlier wheel data visualization on a GUI.

Abstract: A display device may include a substrate including a circular display area and a non-display area, a plurality of pixels including a first pixel and a second pixel disposed on the display area of the substrate, a first sub-demux circuit connected to the first pixel and disposed on the non-display area, a second sub-demux circuit connected to the second pixel and disposed on the non-display area, a first connection line connected to the first sub-demux circuit and the second sub-demux circuit and disposed on the non-display area to transfer first and second data input signals to the first and second sub-demux circuits, and a plurality of gate stages connected to the pixels and disposed on the non-display area to transfer gate signals to the pixels. Some of the gate stages are disposed between the first sub-demux circuit and the second sub-demux circuit.

Abstract: In a substrate processing method according to this invention, a decompression process after processing a substrate using a fluid in a supercritical state in a chamber is divided into two stages. In the first decompress step, an internal space of the chamber is decompressed to a pressure lower than the critical pressure and higher than an atmospheric pressure while keeping the temperature of the internal space equal to or higher than a critical temperature of the processing fluid. In the second decompression step, the processing fluid is discharged at a discharge rate higher than in the first decompression step, thereby the internal space is decompressed. At this time, the discharge rate is so controlled that the temperature of the internal space when the pressure of the internal space is reduced to the atmospheric pressure becomes a predetermined target temperature.

Abstract: A language correction system, a method therefor, and a language correction model learning method of the system are disclosed. The system comprises a correction model learning unit and a language correction unit. The correction model learning unit performs machine learning on a plurality of data sets consisting of ungrammatical sentence data and error-free grammatical sentence data respectively corresponding to the ungrammatical sentence data, so as to generate a correction mode for detecting grammatical sentence data corresponding to ungrammatical sentence data to be corrected. The language correction unit generates, for a sentence to be corrected, a corresponding corrected sentence by using the correction model generated by the correction model learning unit, and displays and outputs the corrected parts together with the generated corrected sentence.

Abstract: This invention relates a processing chamber cleaning method for a supercritical processing apparatus for accommodating a supporting member supporting a substrate into a processing space of a processing chamber and processing the substrate by a processing fluid in a supercritical state in the processing space. The processing chamber cleaning method includes supporting a flat dish-like container storing a cleaning liquid on the supporting member and accommodating the supporting member into the processing space, filling the processing space with the processing fluid in the supercritical state and discharging the processing fluid. It is capable of effectively cleaning the inside of even a supercritical processing chamber including a processing space having a narrow opening and a large depth.

Abstract: In the substrate processing apparatus, a support tray supporting a substrate is housed in an internal space of a chamber. A processing fluid is supplied into the internal space from one end side of the internal space. The support tray includes a tray member and a plurality of support members attached to the tray member in such a manner as to surround a substrate facing surface. The tray member has a downstream-side standing portion that has a downstream-side standing portion that stands upward further than the substrate facing surface while located in proximity to a peripheral surface of the substrate on a downstream side supported by the plurality of support members. An upper surface of the downstream-side standing portion is below the upper surface of the substrate in a vertical direction supported by the plurality of support members.

Abstract: A substrate processing method according to this invention includes supporting a substrate having a liquid film on an upper surface substantially in a horizontal posture by placing the substrate on a flat plate-like support tray, accommodating the support tray into an internal space of a chamber and sealing the internal space, introducing a gas which is pressurized toward a gap space between a lower surface of the support tray and a bottom surface of the internal space, and processing the substrate by a supercritical processing fluid by introducing the supercritical processing fluid into the internal space. This makes it possible to shorten a time required to remove a liquid adhering to the lower surface of a substrate being carried into a chamber.

Abstract: A substrate processing method in accordance with the present invention includes forming a liquid film on an upper surface of a substrate by a wet processing apparatus; carrying the substrate having the liquid film formed thereon into a chamber of a supercritical processing apparatus by a conveyor device; and processing a substrate by a processing fluid in a supercritical state in the chamber by the supercritical processing apparatus. The method further includes blowing a gas toward a lower surface of the substrate supported in a horizontal posture by a gas discharger for at least a part of a period after the formation of the liquid film on the substrate during which the substrate is outside the chamber.

Abstract: A computer-executed method is provided for IEEE 802.15.4 devices based on an active carrier sense based carrier-sense multiple access with collision avoidance (ACS-CSMA/CA) control program and standard CSMA/CA control program for coexistence of an IEEE 802.15.4 network composing of IEEE 802.15.4 devices and IEEE 802.11 network composing of IEEE 802.11 devices sharing frequency spectra between the networks. The computer-executed method is provided on an IEEE 802.15.4 device, and causes a processor of the IEEE 802.15.4 device to perform steps that include estimating a severity of IEEE 802.11 interference based on a severity estimation metric, selecting the ACS-CSMA/CA control program based on the estimated severity.

Abstract: An observation apparatus includes an acquisition unit that acquires positional information indicating a position of a bottom surface of a support for supporting an observation target, an imaging optical system that forms an optical image showing the observation target supported by the support on an image plane, a focus adjustment unit that adjusts a focal position of the imaging optical system based on the positional information acquired by the acquisition unit, and a control unit that performs control for matching an inclination of the image plane on which the optical image is formed to an inclination of an imaging surface of an imaging element based on the positional information acquired by the acquisition unit.

Abstract: A machining system includes, a tool configured to machine a workpiece, a motor configured to rotate the tool or the workpiece, a controller configured to control the motor, a measurement device configured to acquire a load current of the motor, the controller is configured to change a rotational speed of the motor when a Mahalanobis distance exceeds a threshold, the Mahalanobis distance is a value determined by using a parameter based on the load current acquired by the measurement device in a specific machining range of the workpiece, and the parameter based on the load current includes a parameter obtained by performing Fourier transform on the load current and a measured value of the load current.

Abstract: A natural invasion promoting method that is environmentally friendly, easy to carry out, can cope with a wide range of areas and inclined surfaces, achieves efficient natural invasion, and can satisfactorily promote greening on a soil surface of interest, and a spraying material used in the method are provided. A natural invasion promoting method including: spraying a spraying material containing live algae on a soil surface; breeding the live algae; and also directly or indirectly catching flying seeds or spores by a tacky substance secreted on surfaces of the live algae or a catching structure composed of the live algae to promote greening on the soil surface.

Abstract: A measurement and imaging instrument capable of beamforming with high speed and high accuracy without approximate calculation. The instrument includes a reception unit which receives a wave arriving from a measurement object to generate a reception signal; and an instrument main body which performs a lateral modulation while superposing two waves in a two-dimensional case and three or four waves in a three-dimensional case in beamforming processing of the reception signal in which at least one wave arriving from the measurement object is processed as being transmitted or received in the axial direction or directions symmetric with respect to the axial direction to generate a multi-dimensional reception signal, performs Hilbert transform with respect to the multi-dimensional reception signal, and performs partial derivative processing or one-dimensional Fourier transform to generate analytic signals of the multi-dimensional reception signals of the two waves or the three or four waves.

Abstract: A pattern variably displaying device includes: sphere reels, in which patterns are described on a surface of a sphere; a sphere driving device, driving each of the sphere reels; and a reel control part, controlling the sphere driving device.

Abstract: A presentation device is provided in a gaming machine. The presentation device includes: a small roulette wheel, a medium roulette wheel, and a large roulette wheel, having different diameters and rotatably held on the same rotation center line; a motor, rotating each roulette wheel; a communication part, transmitting and receiving a control signal to and from the gaming machine; and a control part, controlling the motor based on the control signal from the gaming machine.