Patents by Inventor Sun-Hee Jin

Sun-Hee Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11974605
    Abstract: Provided is an aerosol generating device. The aerosol generating device includes: an accommodation part into which a cigarette is capable of being inserted; and a heating element passing through a hole formed in a bottom surface of the accommodation part, protruding into the accommodation part and capable of heating the cigarette inserted into the accommodation part, wherein, on the bottom-surface, the ratio of a cross-sectional area of the hole with respect to a cross-sectional area of the heating element is greater than or equal to 1.8.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: May 7, 2024
    Assignee: KT&G CORPORATION
    Inventors: Yong Joon Jang, Chul Ho Jang, Ga Hee Lim, Sun Jin Jin
  • Patent number: 8828630
    Abstract: Disclosed are photosensitive resin composition that includes a dye including a methine-based compound represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and a metal complex, and a color filter using the same.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: September 9, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Nam-Gwang Kim, Shahrokh Motallebi, In-Jae Lee, Sun-Hee Jin, Jae-Hyun Kim, Hwan-Sung Cheon, Gyu-Seok Han
  • Publication number: 20130122422
    Abstract: Disclosed are photosensitive resin composition that includes a dye including a methine-based compound represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and a metal complex, and a color filter using the same.
    Type: Application
    Filed: August 20, 2012
    Publication date: May 16, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, Nam-Gwang KIM, Shahrokh MOTALLEBI, In-Jae LEE, Sun-Hee JIN, Jae-Hyun KIM, Hwan-Sung CHEON, Gyu-Seok HAN
  • Patent number: 8361682
    Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: January 29, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Nam-Gwang Kim, Sang-Won Cho, Tae-Gyu Chun, Noh-Seok Byon, Sun-Hee Jin, Jae-Hyun Kim, Gyu-Seok Han
  • Publication number: 20110305980
    Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.
    Type: Application
    Filed: December 20, 2010
    Publication date: December 15, 2011
    Applicant: Cheil Industries Inc.
    Inventors: Nam-Gwang KIM, Sang-Won CHO, Tae-Gyu CHUN, Noh-Seok BYON, Sun-Hee JIN, Jae-Hyun KIM, Gyu-Seok HAN
  • Publication number: 20090155717
    Abstract: The present invention relates to a photosensitive resin composition for a color filter, which has an excellent stripper-resistance and is developed by an alkali aqueous solution, and a color filter formed of the photosensitive resin composition. The photosensitive resin composition includes: (A) a carboxyl-containing acryl-based binder resin; (B) a double bond-containing acryl carboxylate resin represented by the following Formula 1; (C) an acryl-based photopolymerization monomer; (D) a photopolymerization initiator; (E) a pigment; and (F) a solvent. The photosensitive resin composition has excellent stripper resistance, and thus can be used when a color filter is fabricated on a TFT array substrate in order to ensure a high aperture ratio. In the above formula, R1 is hydrogen or methyl, R2 is hydrogen, hydroxyl, C1 to C10 alkyl, or —CO—R5—COOH wherein R5 is a moiety derived from an acid anhydride, R3 is R6COO— wherein R6 is aryl, R4 is R7COO— wherein R7 is alkyl, 5?m?50, 1?n?20, and 10?o?100.
    Type: Application
    Filed: December 18, 2008
    Publication date: June 18, 2009
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Sang-Won CHO, Gyu-Seok HAN, Ho-Jeong PAEK, Myung-Jin LEE, Sun-Hee JIN, Cheon-Seok LEE