Abstract: In a semiconductor device having a capacitor and a method of fabricating the same, the semiconductor device comprises a semiconductor substrate having a memory cell array region and a peripheral region, a plurality of capacitors in the memory cell array region each having a storage electrode, a dielectric layer on the storage electrode, and a plate electrode on the dielectric layer, wherein an extended portion of the plate electrode extends in a direction toward the peripheral region, a dummy pattern in the peripheral region at an elevation above the semiconductor substrate that is substantially the same as that of the extended portion of the plate electrode and spaced apart from the extended portion of the plate electrode, an insulating layer formed on the plurality of capacitors in the cell array region and formed on the dummy pattern in the peripheral region, a first metal contact through the insulating layer between the extended portion of the plate electrode and the dummy pattern.