Patents by Inventor Sung-yun Kang

Sung-yun Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11572426
    Abstract: The present disclosure relates to a 2-dimensional polymer nanosheet, a device including the nanosheet and a method of morphologically tunable preparing the nanosheet. Two-dimensional (2D) polymer nanosheets have been attracting immense attention owing to their potential applications in optical devices, membranes, and catalysis. A new crystalline polyacetylene is described that contains fluorenes and triisopropylsilyl side chains, which could self-assemble into sharp-edged 5-nm-thick square nanosheets with a narrow length dispersity of 1.01, by simple heating and aging in dichloromethane (DCM). The addition of tetrahydrofuran (THF) or chloroform to the heated polymer solution in DCM changed the morphology from square to rectangle. The aspect ratios increased linearly, from 1.0 to 10.6, according to the amount of THF or chloroform added, while maintaining narrow length dispersities less than 1.06.
    Type: Grant
    Filed: January 6, 2021
    Date of Patent: February 7, 2023
    Assignee: SNU R&DB FOUNDATION
    Inventors: Tae-Lim Choi, Sanghee Yang, Sung-Yun Kang
  • Patent number: 11377548
    Abstract: Semi-conducting two-dimensional (2D) nanoobjects, prepared by self-assembly of conjugated polymers, are promising materials for optoelectronic applications. However, there has been no example of 2D nanosheets with controlled lengths and aspect ratios at the same time via self-assembly. Herein, the inventors successfully prepared uniform semi-conducting 2D sheets using a conjugated poly(cyclopentenylene vinylene) homopolymer and its block copolymer by blending and heating. Using these as 2D seeds, living crystallization-driven self-assembly (CDSA) was achieved by adding the homopolymer as a unimer. Interestingly, unlike typical 2D CDSA examples showing radial growth, this homopolymer assembled only in one direction. Owing to this uniaxial growth, the lengths of the 2D nanosheets could be precisely tuned with narrow dispersity according to the unimer-to-seed ratio. The inventors also studied the growth kinetics of the living 2D CDSA and confirmed first-order kinetics.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: July 5, 2022
    Assignee: SNU R&DB FOUNDATION
    Inventors: Tae-Lim Choi, Sanghee Yang, Sung-Yun Kang
  • Publication number: 20210324190
    Abstract: Semi-conducting two-dimensional (2D) nanoobjects, prepared by self-assembly of conjugated polymers, are promising materials for optoelectronic applications. However, there has been no example of 2D nanosheets with controlled lengths and aspect ratios at the same time via self-assembly. Herein, the inventors successfully prepared uniform semi-conducting 2D sheets using a conjugated poly(cyclopentenylene vinylene) homopolymer and its block copolymer by blending and heating. Using these as 2D seeds, living crystallization-driven self-assembly (CDSA) was achieved by adding the homopolymer as a unimer. Interestingly, unlike typical 2D CDSA examples showing radial growth, this homopolymer assembled only in one direction. Owing to this uniaxial growth, the lengths of the 2D nanosheets could be precisely tuned with narrow dispersity according to the unimer-to-seed ratio. The inventors also studied the growth kinetics of the living 2D CDSA and confirmed first-order kinetics.
    Type: Application
    Filed: April 16, 2021
    Publication date: October 21, 2021
    Inventors: Tae-Lim CHOI, Sanghee YANG, Sung-Yun KANG
  • Publication number: 20210206894
    Abstract: The present disclosure relates to a 2-dimensional polymer nanosheet, a device including the nanosheet and a method of morphologically tunable preparing the nanosheet. Two-dimensional (2D) polymer nanosheets have been attracting immense attention owing to their potential applications in optical devices, membranes, and catalysis. A new crystalline polyacetylene is described that contains fluorenes and triisopropylsilyl side chains, which could self-assemble into sharp-edged 5-nm-thick square nanosheets with a narrow length dispersity of 1.01, by simple heating and aging in dichloromethane (DCM). The addition of tetrahydrofuran (THF) or chloroform to the heated polymer solution in DCM changed the morphology from square to rectangle. The aspect ratios increased linearly, from 1.0 to 10.6, according to the amount of THF or chloroform added, while maintaining narrow length dispersities less than 1.06.
    Type: Application
    Filed: January 6, 2021
    Publication date: July 8, 2021
    Inventors: Tae-Lim CHOI, Sanghee YANG, Sung-Yun KANG
  • Patent number: 6997670
    Abstract: A semiconductor wafer transfer apparatus includes a wafer supporting block to support a semiconductor wafer, a casing which is formed along a moving path of the wafer supporting block and having a guiding slot through which a part of the wafer supporting block passes, a driving part which is accommodated in the casing and moves the wafer supporting block, a connection part which connects the driving part with the wafer supporting block, and a shield part which shields the driving part from the guide slot. Accordingly, dust and particles generated inside the casing is effectively prevented from leaking out through the guide slot.
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: February 14, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kwang-il Kim, Sung-yun Kang
  • Publication number: 20040076506
    Abstract: A semiconductor wafer transfer apparatus includes a wafer supporting block to support a semiconductor wafer, a casing which is formed along a moving path of the wafer supporting block and having a guiding slot through which a part of the wafer supporting block passes, a driving part which is accommodated in the casing and moves the wafer supporting block, a connection part which connects the driving part with the wafer supporting block, and a shield part which shields the driving part from the guide slot. Accordingly, dust and particles generated inside the casing is effectively prevented from leaking out through the guide slot.
    Type: Application
    Filed: July 29, 2003
    Publication date: April 22, 2004
    Applicant: SAMSUNG Electronics Co., Ltd.
    Inventors: Kwang-il Kim, Sung-Yun Kang
  • Patent number: 6089763
    Abstract: A semiconductor wafer processing system having a multi-layered arrangement of wafer processing units included in a spinner to carry out photoresist coating and developing processes for the formation of micro patterns on semiconductor wafers, thereby enabling an easy increase in those processing units coping with an introduction of new processes without increasing the occupying space of the processing units, while being capable of achieving accurate wafer feeding and loading operations, and minimizing the consumption of a chemical solvent coated over wafers. The system includes groups of modules each being selected from first and second modules. The first module includes a plurality of bake units each having bake boxes arranged in a multi-layered fashion, the bake units being arranged adjacent to one another in the wafer feeding direction, and a spin unit, such as a spine coater or a spine developer, fixedly mounted on the bake units.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: July 18, 2000
    Assignee: DNS Korea Co., Ltd.
    Inventors: Jin-Young Choi, Hee-Young Kang, Kyung-Dae Park, Tae-Su Kim, Jun-Seong Lee, Dong-Ho Kim, Sung-Yun Kang, Jai-Moon Ryu, Han-Kil Kang