Patents by Inventor Sungyool KWON

Sungyool KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating substrate for culturing stem cell
    Patent number: 11130941
    Abstract: The present disclosure relates to a method of fabricating a substrate for culturing stem cells, including forming a plasma polymer layer from a precursor material on a substrate using plasma, and the precursor material contains a heteroaromatic compound or a linear compound.
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: September 28, 2021
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Donggeun Jung, Sungyool Kwon, Wonjin Ban, Hyuna Lim, Yoonsoo Park
  • Plasma polymerized thin film having low dielectric constant, device, and method of preparing thin film
    Patent number: 10968364
    Abstract: A plasma polymerized thin film having low dielectric constant prepared by depositing a first precursor material represented by the following Chemical Formula 1: wherein in the above Chemical Formula 1, R1 to R14 are each independently H or a substituted or non-substituted C1-C5 alkyl group, and when the R1 to R14 are substituted, their substituents comprise an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group.
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: April 6, 2021
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Donggeun Jung, Wonjin Ban, Sungyool Kwon, Yoonsoo Park, Hyuna Lim, Younghyun Kim
  • PLASMA POLYMERIZED THIN FILM HAVING LOW DIELECTRIC CONSTANT, DEVICE, AND METHOD OF PREPARING THIN FILM
    Publication number: 20200071565
    Abstract: A plasma polymerized thin film having low dielectric constant prepared by depositing a first precursor material represented by the following Chemical Formula 1: wherein in the above Chemical Formula 1, R1 to R14 are each independently H or a substituted or non-substituted C1-C5 alkyl group, and when the R1 to R14 are substituted, their substituents comprise an amino group, a hydroxyl group, a cyano group, a halogen group, a nitro group, or a methoxy group.
    Type: Application
    Filed: August 23, 2019
    Publication date: March 5, 2020
    Applicant: Research & Business Foundation Sungkyunkwan University
    Inventors: Donggeun JUNG, Wonjin BAN, Sungyool KWON, Yoonsoo PARK, Hyuna LIM, Younghyun KIM
  • METHOD OF FABRICATING SUBSTRATE FOR CULTURING STEM CELL
    Publication number: 20180371419
    Abstract: The present disclosure relates to a method of fabricating a substrate for culturing stem cells, including forming a plasma polymer layer from a precursor material on a substrate using plasma, and the precursor material contains a heteroaromatic compound or a linear compound.
    Type: Application
    Filed: June 19, 2018
    Publication date: December 27, 2018
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Donggeun JUNG, Sungyool KWON, Wonjin BAN, Hyuna LIM, Yoonsoo PARK