Abstract: A device for assisting with the styling of hair, such as with a flat ironing process. The device includes a tubular body having a first end and a second end opposite the first end, the tubular body including an axial hair passage that runs from the first end to the second end. The tubular body or other elements associated with the tubular body are elastic in nature so to constrict about and removably retain hair that is pulled through the tubular body in preparation for styling. At least the axial hair passage is comprised of, or covered or coated with, a material having a low coefficient of friction to facilitate deliberate removal of sections of hair from the tubular body during styling.

Abstract: A universal end cap for displaying collateral on a fixture arm is described.

Abstract: A payment rejection and denial management system receives a remit in response to a claim submitted for rendered medical services, processes the remit, and executes automatic actions to manage claim rejections and denials. Such a system allows medical service providers to recover payments incorrectly rejected or denied and to seek payments from secondary payers or the patient themselves.

Abstract: A universal end cap for displaying collateral on a fixture arm is described.

Abstract: A method for forming silica stain on a substrate to facilitate monitoring of the silica stain during integrated circuit manufacture. The method includes providing a silica stain test structure which has a silicon substrate, a hydrophilic silicon dioxide containing layer disposed above the silicon substrate, and a plurality of cavities formed in the silicon substrate through the silicon dioxide containing layer. The cavities have hydrophobic sidewalls. The method also includes exposing the silica stain test structure to deionized water, and drying the silica stain test structure to form the silica stain on the silicon dioxide containing layer.

Abstract: An efficient cleaning process of microelectronics devices requires lower levels of megasonic power, lower temperature and much lower concentrations of chemicals. The method controls the effectiveness of megasonics-assisted cleaning of microelectronics devices by securing a gas concentration level in the cleaning solution, such that at the process temperature the solution is partially saturated with the gas. The gas concentration can be controlled either at the plant-wide level or, preferably, at the point of use. In the latter case, two water supply inputs are provided, one of vacuum-degassed water and the other of gas-saturated water. Process water in the desired gas concentration is then obtained by mixing water from the two sources in an appropriate ratio, which resulting mixture is fed to the wafer cleaning vessel.

Abstract: An expandable carrying bag having a front surface, a rear surface, two side surfaces and an open top. The bag is characterized by at least one open loop on at least one surface of said bag. The loop is of a size sufficient to accommodate insertion of a forearm therein. In use, a forearm is inserted into the loops and the bag is pressed against the body. In this way, the weight of the load within the bag is partially displaced from the bag to the forearm thereby reducing stress on the lower back muscles.