Patents by Inventor Susanne Beder
Susanne Beder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8208198Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: January 16, 2007Date of Patent: June 26, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 8199400Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: September 16, 2009Date of Patent: June 12, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 8068276Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: GrantFiled: October 6, 2010Date of Patent: November 29, 2011Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Patent number: 8031326Abstract: In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation arounType: GrantFiled: March 5, 2008Date of Patent: October 4, 2011Assignee: Carl Zeiss SMT GmbHInventors: Michael Totzeck, Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer, Aurelian Dodoc
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Publication number: 20110235013Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: ApplicationFiled: June 9, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
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Publication number: 20110228246Abstract: Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.Type: ApplicationFiled: May 25, 2011Publication date: September 22, 2011Applicant: CARL ZEISS SMT AGInventors: Bernhard Kneer, Norbert Wabra, Toralf Gruner, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20110211252Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax (Y??NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: April 6, 2011Publication date: September 1, 2011Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 7982969Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: GrantFiled: December 9, 2008Date of Patent: July 19, 2011Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
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Publication number: 20110026110Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: ApplicationFiled: October 6, 2010Publication date: February 3, 2011Applicant: CARL ZEISS SMT AGInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Patent number: 7848031Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.Type: GrantFiled: January 20, 2006Date of Patent: December 7, 2010Assignee: Carl Zeiss SMT AGInventors: Jochen Hetzler, Susanne Beder, Heiko Feldmann
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Patent number: 7835073Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: GrantFiled: January 15, 2008Date of Patent: November 16, 2010Assignee: Carl Zeiss SMT AGInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Publication number: 20100265572Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: June 16, 2010Publication date: October 21, 2010Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20100265478Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: ApplicationFiled: June 28, 2010Publication date: October 21, 2010Applicant: CARL ZEISS SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Bärbel Schwaer, Olaf Rogalsky, Arif Kazi
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Patent number: 7782440Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: November 17, 2005Date of Patent: August 24, 2010Assignee: Carl Zeiss SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Patent number: 7782538Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.Type: GrantFiled: November 12, 2008Date of Patent: August 24, 2010Assignee: Carl Zeiss SMT AGInventors: Susanne Beder, Wolfgang Singer, Karl-Heinz Schuster
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Patent number: 7728987Abstract: A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.Type: GrantFiled: May 14, 2004Date of Patent: June 1, 2010Assignee: Carl Zeiss SMT AGInventors: Ralf Arnold, Bernd Dörband, Frank Schillke, Susanne Beder
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Patent number: 7719658Abstract: Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane.Type: GrantFiled: January 13, 2005Date of Patent: May 18, 2010Assignee: Carl Zeiss SMT AGInventors: Andreas Dorsel, Toralf Gruner, Bernhard Kneer, Susanne Beder, Alexander Epple, Norbert Wabra
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Patent number: 7710640Abstract: A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.Type: GrantFiled: June 13, 2008Date of Patent: May 4, 2010Assignee: Carl Zeiss SMT AGInventors: Susanne Beder, Daniel Kraehmer, Heiko Feldmann
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Publication number: 20100014153Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: September 16, 2009Publication date: January 21, 2010Applicant: CARL ZEISS SMT AGInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20090284831Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3?) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: ApplicationFiled: December 9, 2008Publication date: November 19, 2009Applicant: CARL ZEISS SMT AGInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann