Patents by Inventor Sushil Padiyar

Sushil Padiyar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device processing tools and methods for patterning substrates
    Patent number: 9431267
    Abstract: In some embodiments, an electronic device processing system is provided that includes a processing tool having a first subsystem configured to carry out a first subset of processes on a substrate having pattern features, the first subsystem including a first conformal deposition chamber and a first etch chamber. The processing tool includes a second subsystem coupled to the first subsystem and configured to carry out a second subset of processes on the substrate, the second subsystem including a second conformal deposition chamber and a second etch chamber. The processing tool is configured to employ the first and second subsystems to perform pitch division on the substrate within the processing tool so as to form a reduced-pitch pattern on the substrate. Numerous other embodiments are provided.
    Type: Grant
    Filed: December 1, 2013
    Date of Patent: August 30, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Mayur Trivedi, Sushil Padiyar, Lakshmanan Karuppiah, Randhir Thakur
  • SEMICONDUCTOR DEVICE PROCESSING TOOLS AND METHODS FOR PATTERNING SUBSTRATES
    Publication number: 20140154887
    Abstract: In some embodiments, an electronic device processing system is provided that includes a processing tool having a first subsystem configured to carry out a first subset of processes on a substrate having pattern features, the first subsystem including a first conformal deposition chamber and a first etch chamber. The processing tool includes a second subsystem coupled to the first subsystem and configured to carry out a second subset of processes on the substrate, the second subsystem including a second conformal deposition chamber and a second etch chamber. The processing tool is configured to employ the first and second subsystems to perform pitch division on the substrate within the processing tool so as to form a reduced-pitch pattern on the substrate. Numerous other embodiments are provided.
    Type: Application
    Filed: December 1, 2013
    Publication date: June 5, 2014
    Inventors: Mayur Trivedi, Sushil Padiyar, Lakshmanan Karuppiah, Randhir Thakur