Abstract: A hole-blocking silicon/titanium-oxide heterojunction for silicon photovoltaic devices and methods of forming are disclosed. The electronic device includes at least two electrodes having a current path between the two electrodes. The electronic device also includes a heterojunction formed of a titanium-oxide layer deposited over a Si layer and being disposed in the current path. The heterojunction is configured to function as a hole blocker. The first electrode may be electrically coupled to the Si layer and a second electrode may be electrically coupled to the titanium-oxide layer. The device may also include a PN junction disposed in the Si layer, in the current path. The device may also include an electron-blocking heterojunction on silicon in the current path.

Abstract: A photovoltaic device and method of making a photovoltaic device are disclosed. The method includes laminating an organic layer onto an inorganic semiconductor layer. A first electrical contact is electrically coupled to the organic layer and a second electrical contact is coupled to the inorganic semiconductor layer. The inorganic semiconductor layer may include a second organic layer. At least one of the organic layer and the second organic layer may form a heterojunction with the inorganic semiconductor layer. The organic layer may further comprise a metal layer. At least one of the organic layer, the inorganic semiconductor layer and the metal layer may be patterned.

Abstract: A photovoltaic device and method of manufacturing is disclosed. In one embodiment, the device includes a silicon layer and first and second organic layers. The silicon layer has a first face and a second face. First and second electrodes electrically are coupled to the first and second organic layers. A first heterojunction is formed at a junction between the one of the faces of the silicon layer and the first organic layer. A second heterojunction is formed at a junction between one of the faces of the silicon layer and the second organic layer. The silicon layer may be formed without a p-n junction. At least one organic layer may be configured as an electron-blocking layer or a hole-blocking layer. At least one organic layer may be comprised of phenanthrenequinone (PQ). A passivating layer may be disposed between at least one of the organic layers and the silicon layer. The passivating layer may be organic. At least one of the organic layers may passivate a surface of the silicon layer.