Patents by Inventor Susumu Hiraoka

Susumu Hiraoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6662115
    Abstract: A method for comparing DNA base sequences by comparing similarities between two amino acid sequences translated from two DNA base sequences, respectively, includes (1) a step of dividing each of the first DNA base sequence and the second DNA base sequence into groups of successive three nucleotides each, translating each of these groups of nucleotides into an amino acid, and thereby obtaining a first amino acid sequence and a second amino acid sequence, and (2) a step of determining similarities between each amino acid of the first translated amino acid sequence and each amino acid of the second translated amino acid sequence in view of nucleotide insertions or deletions in the first and second DNA base sequence and amino acid insertions or deletions in the first and second translated amino acid sequence. The method is repeated by shifting the base sequences one base at a time.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: December 9, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Keiichi Nagai, Ryotaro Irie, Susumu Hiraoka, Naoko Kasahara
  • Publication number: 20010010903
    Abstract: A method for comparing DNA base sequences by comparing similarities between two amino acid sequences translated from two DNA base sequences, respectively, comprises (1) a step of dividing each of the first DNA base sequence and the second DNA base sequence into groups of successive three nucleotides each, translating each of these groups of nucleotides into an amino acid, and thereby obtaining a first amino acid sequence and a second amino acid sequence, (2) a step of determining similarities between each amino acid of the first translated amino acid sequence and each amino acid of the second translated amino acid sequence in view of nucleotide insertions or deletions in the first and second DNA base sequences and amino acid insertions or deletions in the first and second translated amino acid sequences, accumulating the thus determined similarities, and thereby determining a combination of each amino acid of the first amino acid sequence and a corresponding amino acid of the second amino acid sequence which
    Type: Application
    Filed: March 30, 1998
    Publication date: August 2, 2001
    Inventors: KEIICHI NAGAI, RYOTARO IRIE, SUSUMU HIRAOKA, NAOKO KASAHARA
  • Patent number: 5505778
    Abstract: An apparatus for treating solid surface using a thermally excited molecular beam according to the present invention is capable of completely preventing flying of contaminant caused by a heating source to a sample. To achieve this, in the present invention, the heating source for exciting the molecules is hermetically separated from the sample. Alternatively, a container where the heating source is housed and a container where the sample is accommodated are separated such that a conductance between the two containers is sufficiently small. In this way, chemical reactions between the molecular beam of the reactive gas which is highly reactive and the heating source heated to high temperatures can be eliminated, and flying of the contaminant to the sample can thus be greatly reduced. As a result, flying of the contaminating substances caused by the heating source to the sample can be prevented, and reduction in the surface treating rate of the sample, caused by the contaminant, can be prevented.
    Type: Grant
    Filed: July 15, 1991
    Date of Patent: April 9, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Tetsuo Ono, Susumu Hiraoka, Sakae Saito, Kunio Harada, Mituhiro Tachibana, Shigeo Kubota, Keizo Suzuki
  • Patent number: 5401357
    Abstract: A method may be used to dry etch a sample including a plurality of regions different from each other in the photo-absorption of a light having a specified wavelength using an etching gas plasma. The method is capable of selectively etching the desired material from a plurality of materials having different types of band gap energies or from a plurality of materials having different band gap energies. The method includes a step of irradiating a light having the specified wavelength on the sample for reducing an etching rate of a region having a large photo-absorption coefficient to the light, thereby selectively etching a region having a small photo-absorption coefficient to the light.
    Type: Grant
    Filed: September 1, 1992
    Date of Patent: March 28, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Hidekazu Okuhira, Tetsuo Ono, Susumu Hiraoka, Keizo Suzuki, Junji Shigeta, Hiroshi Masuda, Mitsuhiro Mori, Takuma Tanimoto, Shinichi Nakatsuka, Katsuhiko Mitani
  • Patent number: 5110407
    Abstract: Anisotropic etching can be obtained in the direction of the incident heated beam of reactive gas with the introduction of a second material for controlling reactivity.
    Type: Grant
    Filed: February 20, 1991
    Date of Patent: May 5, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Tetsuo Ono, Susumu Hiraoka, Keizo Suzuki
  • Patent number: 5108778
    Abstract: Disclosed are a surface treatment method and apparatus in which an active species beam that contains active species having translational energy in a range of 0.01-100 eV as at least a partial constituent thereof constructs at least a part of treatment means.
    Type: Grant
    Filed: April 16, 1990
    Date of Patent: April 28, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Keizo Suzuki, Susumu Hiraoka, Tatsumi Mizutani, Shigeru Nishimatsu
  • Patent number: 4886571
    Abstract: An apparatus for surface treating a sample article with activated particles, comprising a reaction chamber in which a sample article to be surface processed is placed, means for introducing a reaction gas into the reaction chamber, an activation surface properly set in the reaction chamber and arranged capable of activating at least one part of the particles composing the reaction gas, and means for evacuating the used reaction gas out of the reaction chamber.
    Type: Grant
    Filed: January 27, 1989
    Date of Patent: December 12, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Keizo Suzuki, Susumu Hiraoka, Shigeru Nishimatsu
  • Patent number: 4828874
    Abstract: A surface treatment method, wherein gas particles are applied to a solid surface of a substrate to treat the same surface, comprising the step of applying to the gas particles the narrow line width laser light capable of exciting or decomposing only such gas particles that have velocities in a predetermined range.
    Type: Grant
    Filed: May 5, 1987
    Date of Patent: May 9, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Susumu Hiraoka, Keizo Suzuki, Shigeru Nishimatsu