Patents by Inventor Su Youn KIM

Su Youn KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microdevice for detecting aldehydes or ketones
    Patent number: 11969729
    Abstract: A microdevice for detecting aldehydes or ketones by utilizing a rotary platform, the microdevice comprising a disc-shaped rotary platform and a microfluidic structure disposed on the rotary platform, and the microfluidic structure comprising a sample storage part, an eluent storage part, a separation part, a first microfluid flow channel, a second microfluid flow channel, and an absorption pad.
    Type: Grant
    Filed: April 16, 2020
    Date of Patent: April 30, 2024
    Assignee: LG CHEM, LTD.
    Inventors: Byung Hyun Park, Byoung Hyoun Kim, Su Youn Han
  • Nano-structure manufacturing method using sacrificial etching mask
    Patent number: 8895412
    Abstract: Disclosed is a nano-structure manufacturing method which includes: forming a first semiconductor composite layer, a semiconductor quantum structure layer, a second semiconductor composite layer, and a semiconductor quantum dot layer on a substrate in order; thermally treating the semiconductor quantum dot layer so that quantum dots of the semiconductor quantum dot layer are aggregated; and performing an etching process by using the aggregated quantum dots as a mask.
    Type: Grant
    Filed: November 5, 2012
    Date of Patent: November 25, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Seung Kyu Ha, Su Youn Kim, Il Ki Han, Jin Dong Song, Won Jun Choi
  • NANO-STRUCTURE MANUFACTURING METHOD USING SACRIFICIAL ETCHING MASK
    Publication number: 20140030872
    Abstract: Disclosed is a nano-structure manufacturing method which includes: forming a first semiconductor composite layer, a semiconductor quantum structure layer, a second semiconductor composite layer, and a semiconductor quantum dot layer on a substrate in order; thermally treating the semiconductor quantum dot layer so that quantum dots of the semiconductor quantum dot layer are aggregated; and performing an etching process by using the aggregated quantum dots as a mask.
    Type: Application
    Filed: November 5, 2012
    Publication date: January 30, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seung Kyu HA, Su Youn KIM, Il Ki HAN, Jin Dong SONG, Won Jun CHOI