Patents by Inventor Sylvia Adae-Amoakoh

Sylvia Adae-Amoakoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6998290
    Abstract: A method for forming a flip-chip joinable substrate having non-plated-on contact pads. The substrate has an external metal foil layer upon a dielectric layer upon a patterned internal metal layer having an internal contact area. An area of the external metal foil layer above the internal contact area is selected. A microvia cavity extending to the internal contact area is perforated centrally within the selected area and is filled with a mass of conductive paste forming an external contact pad. The external contact pad is used as an etch mask for removing the adjacent external metal foil.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: February 14, 2006
    Assignee: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John S. Kresge, Voya R. Markovich, Thurston B. Youngs, Jr.
  • Patent number: 6753612
    Abstract: A flip-chip joinable substrate having non-plated-on contact pads. The substrate has an external metal foil layer upon a dielectric layer upon a patterned internal metal layer having an internal contact area. An area of the external metal foil layer above the internal contact area is selected. A microvia cavity extending to the internal contact area is perforated centrally within the selected area and is filled with a mass of conductive paste forming an external contact pad. The external contact pad is used as an etch mask for removing the adjacent external metal foil.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: June 22, 2004
    Assignee: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John S. Kresge, Voya R. Markovich, Thurston B. Youngs, Jr.
  • Publication number: 20040099960
    Abstract: A flip-chip joinable substrate having non-plated-on contact pads and a method for making the same. The substrate has an external metal foil layer upon a dielectric layer upon a patterned internal metal layer having an internal contact area. An area of the external metal foil layer above the internal contact area is selected. A microvia cavity extending to the internal contact area is perforated centrally within the selected area and is filled with a mass of conductive paste forming an external contact pad. The external contact pad is used as an etch mask for removing the adjacent external metal foil.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 27, 2004
    Inventors: Sylvia Adae-Amoakoh, John S. Kresge, Voya R. Markovich, Thurston B. Youngs
  • Patent number: 6524352
    Abstract: A parallel capacitor structure capable of forming an internal part of a larger circuit board or the like structure to provide capacitance therefore. Alternatively, the capacitor may be used as an interconnector to interconnect two different electronic components (e.g., chip carriers, circuit boards, and even semiconductor chips) while still providing desired levels of capacitance for one or more of said components. The capacitor includes at least one internal conductive layer, two additional conductor layers added on opposite sides of the internal conductor, and inorganic dielectric material (preferably an oxide layer on the second conductor layer's outer surfaces or a suitable dielectric material such as barium titanate applied to the second conductor layers). Further, the capacitor includes outer conductor layers atop the inorganic dielectric material, thus forming a parallel capacitor between the internal and added conductive layers and the outer conductors.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: February 25, 2003
    Assignee: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John M. Lauffer, Michael D. Lowell, Voya R. Markovich, Joseph J. Sniezek
  • Publication number: 20020145203
    Abstract: A flip-chip joinable substrate having non-plated-on contact pads and a method for making the same. The substrate has an external metal foil layer upon a dielectric layer upon a patterned internal metal layer having an internal contact area. An area of the external metal foil layer above the internal contact area is selected. A microvia cavity extending to the internal contact area is perforated centrally within the selected area and is filled with a mass of conductive paste forming an external contact pad. The external contact pad is used as an etch mask for removing the adjacent external metal foil.
    Type: Application
    Filed: April 5, 2001
    Publication date: October 10, 2002
    Applicant: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John S. Kresge, Voya R. Markovich, Thurston B. Youngs
  • Publication number: 20020054471
    Abstract: A parallel capacitor structure capable of forming an internal part of a larger circuit board or the like structure to provide capacitance therefore. Alternatively, the capacitor may be used as an interconnector to interconnect two different electronic components (e.g., chip carriers, circuit boards, and even semiconductor chips) while still providing desired levels of capacitance for one or more of said components. The capacitor includes at least one internal conductive layer, two additional conductor layers added on opposite sides of the internal conductor, and inorganic dielectric material (preferably an oxide layer on the second conductor layer's outer surfaces or a suitable dielectric material such as barium titanate applied to the second conductor layers). Further, the capacitor includes outer conductor layers atop the inorganic dielectric material, thus forming a parallel capacitor between the internal and added conductive layers and the outer conductors.
    Type: Application
    Filed: January 9, 2002
    Publication date: May 9, 2002
    Applicant: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John M. Lauffer, Michael D. Lowell, Voya R. Markovich, Joseph J. Sniezek
  • Patent number: 6370012
    Abstract: A parallel capacitor structure capable of forming an internal part of a larger circuit board or the like structure to provide capacitance therefore. Alternatively, the capacitor may be used as an interconnector to interconnect two different electronic components (e.g., chip carriers, circuit boards, and even semiconductor chips) while still providing desired levels of capacitance for one or more of said components. The capacitor includes at least one internal conductive layer, two additional conductor layers added on opposite sides of the internal conductor, and inorganic dielectric material (preferably an oxide layer on the second conductor layer's outer surfaces or a suitable dielectric material such as barium titanate applied to the second conductor layers). Further, the capacitor includes outer conductor layers atop the inorganic dielectric material, thus forming a parallel capacitor between the internal and added conductive layers and the outer conductors.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: April 9, 2002
    Assignee: International Business Machines Corporation
    Inventors: Sylvia Adae-Amoakoh, John M. Lauffer, Michael D. Lowell, Voya R. Markovich, Joseph J. Sniezek
  • Patent number: 5792598
    Abstract: Photographic developing compositions are provided that are free of dihydroxybenzene developing agents and are used in the processing of photographic elements. The developing compositions have a pH in the range of from 10.1 to 10.9 and comprise at least 0.17 moles per liter of an ascorbic acid developing agent, 0.3 to 0.5 moles per liter of a sulfite and 0.2 to 0.4 moles per liter of a carbonate buffer. Also provided is an ecologically advantageous method for processing photographic elements which utilizes the non-toxic developing compositions.
    Type: Grant
    Filed: March 27, 1996
    Date of Patent: August 11, 1998
    Assignee: International Paper Company
    Inventors: Sylvia Adae-Amoakoh, Bruce Mel Resnick
  • Patent number: 5503966
    Abstract: Photographic developing compositions are provided that are free of dihydroxybenzene developing agents and are used in the processing of photographic elements. The developing compositions have a pH in the range of from 10.1 to 10.9 and comprise at least 0.17 moles per liter of an ascorbic acid developing agent, 0.3 to 0.5 moles per liter of a sulfite and 0.2 to 0.4 moles per liter of a carbonate buffer. Also provided is an ecologically advantageous method for processing photographic elements which utilizes the non-toxic developing compositions.
    Type: Grant
    Filed: July 22, 1994
    Date of Patent: April 2, 1996
    Assignee: International Paper Company
    Inventors: Sylvia Adae-Amoakoh, Bruce M. Resnick