Patents by Inventor Sylvia Jia Yun Lewis
Sylvia Jia Yun Lewis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10295486Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.Type: GrantFiled: August 18, 2016Date of Patent: May 21, 2019Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Benjamin Donald Stripe
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Publication number: 20190145917Abstract: An x-ray spectrometer system includes an x-ray source, an x-ray optical system, a mount, and an x-ray spectrometer. The x-ray optical system is configured to receive, focus, and spectrally filter x-rays from the x-ray source to form an x-ray beam having a spectrum that is attenuated in an energy range above a predetermined energy and having a focus at a predetermined focal plane.Type: ApplicationFiled: December 19, 2018Publication date: May 16, 2019Inventors: Wenbing Yun, Srivatsan Seshadri, Janos Kirz, Sylvia Jia Yun Lewis
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Patent number: 10269528Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.Type: GrantFiled: May 27, 2016Date of Patent: April 23, 2019Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
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Patent number: 10247683Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.Type: GrantFiled: December 3, 2017Date of Patent: April 2, 2019Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20190088438Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.Type: ApplicationFiled: October 13, 2017Publication date: March 21, 2019Applicant: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
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Publication number: 20190088381Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.Type: ApplicationFiled: February 14, 2017Publication date: March 21, 2019Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20190011379Abstract: A method for performing x-ray absorption spectroscopy and an x-ray absorption spectrometer system to be used with a compact laboratory x-ray source to measure x-ray absorption of the element of interest in an object with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness laboratory x-ray source, an optical train to focus the x-rays through an object to be examined, and a spectrometer comprising a single crystal analyzer (and, in some embodiments, also a mosaic crystal) to disperse the transmitted beam onto a spatially resolving x-ray detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 105 mrad. and be coupled to an optical train that collects and focuses the high flux x-rays to spots less than 500 micrometers, leading to high flux density.Type: ApplicationFiled: March 21, 2018Publication date: January 10, 2019Inventors: Wenbing Yun, Srivatsan Seshadri, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, Benjamin Donald Stripe
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Publication number: 20180261350Abstract: Systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro-or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using a arrayed x-ray source and a set of Talbot interference fringes.Type: ApplicationFiled: April 16, 2018Publication date: September 13, 2018Applicant: Sigray, Inc.Inventors: Wenbing Yun, David Vine, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri
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Publication number: 20180202951Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.Type: ApplicationFiled: December 3, 2017Publication date: July 19, 2018Applicant: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20180144901Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.Type: ApplicationFiled: October 13, 2017Publication date: May 24, 2018Applicant: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
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Patent number: 9874531Abstract: Periodic spatial patterns of x-ray illumination are used to gather information about periodic objects. The structured illumination may be created using the interaction of a coherent or partially coherent x-ray source with a beam splitting grating to create a Talbot interference pattern with periodic structure. The object having periodic structures to be measured is then placed into the structured illumination, and the ensemble of signals from the multiple illumination spots is analyzed to determine various properties of the object and its structures. Applications to x-ray absorption/transmission, small angle x-ray scattering, x-ray fluorescence, x-ray reflectance, and x-ray diffraction are all possible using the method of the invention.Type: GrantFiled: May 15, 2015Date of Patent: January 23, 2018Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20170336334Abstract: An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.Type: ApplicationFiled: July 31, 2017Publication date: November 23, 2017Applicant: Sigray, Inc.Inventors: Wenbing Yun, Srivatsan Seshadri, Janos Kirz, Sylvia Jia Yun Lewis
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Patent number: 9823203Abstract: Systems for x-ray diffraction/scattering measurements having greater x-ray flux and x-ray flux density are disclosed. These are useful for applications such as material structural analysis and crystallography. The higher flux is achieved by using designs for x-ray targets comprising a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density, and used to illuminate materials for the analysis based on their scattering/diffractive effects.Type: GrantFiled: March 3, 2016Date of Patent: November 21, 2017Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20170261442Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.Type: ApplicationFiled: May 26, 2017Publication date: September 14, 2017Applicant: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri, Alan Francis Lyon, David Charles Reynolds
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Patent number: 9719947Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a ? phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.Type: GrantFiled: April 29, 2015Date of Patent: August 1, 2017Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20170162288Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.Type: ApplicationFiled: February 14, 2017Publication date: June 8, 2017Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Patent number: 9594036Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux. The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.Type: GrantFiled: March 1, 2015Date of Patent: March 14, 2017Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Publication number: 20170052128Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.Type: ApplicationFiled: August 18, 2016Publication date: February 23, 2017Applicant: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Benjamin Donald Stripe
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Publication number: 20170047191Abstract: We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.Type: ApplicationFiled: September 19, 2016Publication date: February 16, 2017Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz
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Patent number: 9570265Abstract: We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.Type: GrantFiled: September 19, 2016Date of Patent: February 14, 2017Assignee: Sigray, Inc.Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz