Patents by Inventor Sylvia Tousley

Sylvia Tousley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to define and tailor process limited lithographic features using a modified hard mask process
    Patent number: 6610607
    Abstract: A method to define and tailor process limited lithographic features is provided. The method may be used to form sub lithographic spaces between features on a semiconductor wafer. A mask is formed and patterned on the wafer. Spacers are formed on sidewalls of the mask. The pattern of the mask and spacers is then transferred to an underlying layer.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: August 26, 2003
    Assignee: International Business Machines Corporation
    Inventors: Douglas S. Armbrust, Dale W. Martin, Jed H. Rankin, Sylvia Tousley