Patents by Inventor Sylvia W. Thomas
Sylvia W. Thomas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10105656Abstract: Novel electrospun nanofibers and nanofibrous membranes, methods of manufacturing the same, and methods of using the same are provided. The nanofibers include a cactus mucilage, such as mucilage from Opuntia ficus-indica. An organic polymer can be added to the cactus mucilage before electrospinning. The nanofibrous membranes can be used in water filtration.Type: GrantFiled: December 19, 2016Date of Patent: October 23, 2018Assignee: University of South FloridaInventors: Sylvia W. Thomas, Norma A. Alcantar, Yanay Pais
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Patent number: 9691554Abstract: A method of forming an ordered nanorods array in a confined space is used to form a high surface area device where an ensemble of parallel trenches has micrometer dimensions for the width and depth of the trenches, which are decorated with crystalline nanowires radiating from the sidewalls and bases of the trenches. The high surface area device is formed by depositing a conformal crystalline seed coating in the trenches, forming microchannels from these trenches by placing a barrier layer on the open surface of the trenches, contacting the conformal coating with a crystal precursor solution that is caused to flow through the microchannels. In an embodiment, a very high surface area electrode is constructed with ZnO nanowires radiating from the sidewalls and base of trenches formed on a silicon substrate. The device can be a dye-sensitized solar cell.Type: GrantFiled: August 12, 2016Date of Patent: June 27, 2017Assignee: UNIVERSITY OF SOUTH FLORIDAInventors: Mikhail Ladanov, Paula C. Algarin Amaris, Garrett Matthews, Manoj Kumar Ram, Sylvia W. Thomas, Ashok Kumar, Jing Wang, Arash Takshi
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Publication number: 20170157571Abstract: Novel electrospun nanofibers and nanofibrous membranes, methods of manufacturing the same, and methods of using the same are provided. The nanofibers include a cactus mucilage, such as mucilage from Opuntia ficus-indica. An organic polymer can be added to the cactus mucilage before electrospinning. The nanofibrous membranes can be used in water filtration.Type: ApplicationFiled: December 19, 2016Publication date: June 8, 2017Applicant: University of South FloridaInventors: Sylvia W. Thomas, Norma A. Alcantar, Yanay Pais
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Patent number: 9618002Abstract: The present invention is turbine generator capable of integration into a bio-physiological or microfluidic system. The generator can convert biomechanical energy into electrical energy by using electromagnetic subsystems to transform the kinetic energy to electricity. These systems have the potential to convert hydraulic energy (such as flow of body fluid, blood flow, contraction of blood vessel, dynamic fluid in nature) into electric energy that may be sufficient for self-powering nano/micro devices and systems, such as artificial organs, valves, sensors, micro motors, and micro robots. The system incorporates a new turbine model having, notched blades; a rotor in levitation; and a special casing capable of integration into a bio-physiological or microfluidic system.Type: GrantFiled: September 3, 2014Date of Patent: April 11, 2017Assignee: University of South FloridaInventors: Henry Cabra, Sylvia W. Thomas
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Patent number: 9555392Abstract: Novel electrospun nanofibers and nanofibrous membranes, methods of manufacturing the same, and methods of using the same are provided. The nanofibers include a cactus mucilage, such as mucilage from Opuntia ficus-indica. An organic polymer can be added to the cactus mucilage before electrospinning. The nanofibrous membranes can be used in water filtration.Type: GrantFiled: June 25, 2012Date of Patent: January 31, 2017Assignee: UNIVERSITY OF SOUTH FLORIDAInventors: Sylvia W. Thomas, Yanay Pais, Norma A. Alcantar
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Publication number: 20160351341Abstract: A method of forming an ordered nanorods array in a confined space is used to form a high surface area device where an ensemble of parallel trenches has micrometer dimensions for the width and depth of the trenches, which are decorated with crystalline nanowires radiating from the sidewalls and bases of the trenches. The high surface area device is formed by depositing a conformal crystalline seed coating in the trenches, forming microchannels from these trenches by placing a barrier layer on the open surface of the trenches, contacting the conformal coating with a crystal precursor solution that is caused to flow through the microchannels. In an embodiment, a very high surface area electrode is constructed with ZnO nanowires radiating from the sidewalls and base of trenches formed on a silicon substrate. The device can be a dye-sensitized solar cell.Type: ApplicationFiled: August 12, 2016Publication date: December 1, 2016Inventors: Mikhail Ladanov, Paula C. Algarin Amaris, Garrett Matthews, Manoj Kumar Ram, Sylvia W. Thomas, Ashok Kumar, Jing Wang, Arash Takshi
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Patent number: 9443662Abstract: A method of forming an ordered nanorods array in a confined space is used to form a high surface area device where an ensemble of parallel trenches has micrometer dimensions for the width and depth of the trenches, which are decorated with crystalline nanowires radiating from the sidewalls and bases of the trenches. The high surface area device is formed by depositing a conformal crystalline seed coating in the trenches, forming microchannels from these trenches by placing a barrier layer on the open surface of the trenches, contacting the conformal coating with a crystal precursor solution that is caused to flow through the microchannels. In an embodiment, a very high surface area electrode is constructed with ZnO nanowires radiating from the sidewalls and base of trenches formed on a silicon substrate. The device can be a dye-sensitized solar cell.Type: GrantFiled: November 7, 2013Date of Patent: September 13, 2016Assignee: UNIVERSITY OF SOUTH FLORIDAInventors: Mikhail Ladanov, Paula C. Algarin Amaris, Garrett Matthews, Manoj Kumar Ram, Sylvia W. Thomas, Ashok Kumar, Jing Wang, Arash Takshi
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Publication number: 20140124021Abstract: A method of forming an ordered nanorods array in a confined space is used to form a high surface area device where an ensemble of parallel trenches has micrometer dimensions for the width and depth of the trenches, which are decorated with crystalline nanowires radiating from the sidewalls and bases of the trenches. The high surface area device is formed by depositing a conformal crystalline seed coating in the trenches, forming microchannels from these trenches by placing a barrier layer on the open surface of the trenches, contacting the conformal coating with a crystal precursor solution that is caused to flow through the microchannels. In an embodiment, a very high surface area electrode is constructed with ZnO nanowires radiating from the sidewalls and base of trenches formed on a silicon substrate. The device can be a dye-sensitized solar cell.Type: ApplicationFiled: November 7, 2013Publication date: May 8, 2014Applicant: UNIVERSITY OF SOUTH FLORIDAInventors: MIKHAIL LADANOV, PAULA C. ALGARIN AMARIS, GARRETT MATTHEWS, MANOJ KUMAR RAM, SYLVIA W. THOMAS, ASHOK KUMAR, JING WANG, ARASH TAKSHI
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Publication number: 20130068692Abstract: Novel electrospun nanofibers and nanofibrous membranes, methods of manufacturing the same, and methods of using the same are provided. The nanofibers include a cactus mucilage, such as mucilage from Opuntia ficus-indica. An organic polymer can be added to the cactus mucilage before electrospinning The nanofibrous membranes can be used in water filtration.Type: ApplicationFiled: June 25, 2012Publication date: March 21, 2013Applicant: University of South FloridaInventors: Sylvia W. Thomas, Yanay Pais, Norma A. Alcantar
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Patent number: 6847077Abstract: A semiconductor device having a capacitor integrated in a damascene structure. In one embodiment, the capacitor is formed entirely within a metallization layer of a damascene structure, having therein a semiconductor device component. Preferably, the capacitor is formed within a trench, having been etched in the dielectric material of the metal layer and the capacitor includes a first capacitor electrode formed within the recess in electrical contact with the device component of the metallization layer. An insulator may be formed over the first capacitor electrode, with a second capacitor electrode formed over the insulator. These elements are preferably conformally deposited within the trench, thereby forming a recess, a portion of which extends within the trench. A subsequently fabricated device component may then be placed in electrical contact with the second capacitor electrode.Type: GrantFiled: June 25, 2002Date of Patent: January 25, 2005Assignee: Agere Systems, Inc.Inventors: Sylvia W. Thomas, Michael Jay Parrish, Tony G. Ivanov, Edward Belden Harris, Richard William Gregor, Michael Scott Carroll
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Publication number: 20030234416Abstract: A semiconductor device having a capacitor integrated in a damascene structure. In one embodiment, the capacitor is formed entirely within a metallization layer of a damascene structure, having therein a semiconductor device component. Preferably, the capacitor is formed within a trench, having been etched in the dielectric material of the metal layer and the capacitor includes a first capacitor electrode formed within the recess in electrical contact with the device component of the metal layer. An insulator may be formed over the first capacitor electrode, with a second capacitor electrode formed over the insulator. These elements are preferably conformally deposited within the trench, thereby forming a recess, a portion of which extends within the trench. A subsequently fabricated device component may then be placed in electrical contact with the second capacitor electrode.Type: ApplicationFiled: June 25, 2002Publication date: December 25, 2003Inventors: Sylvia W. Thomas, Michael Jay Parrish, Tony G. Ivanov, Edward Belden Harris, Richard William Gregor, Michael Scott Carroll
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Patent number: 6472307Abstract: The present invention provides a method of manufacturing an integrated circuit having a capping layer over a thick metal feature. In one embodiment, the method comprises forming first and second oxide layers over the thick metal feature, forming a composite oxide layer including an oxide spacer by etching the first and second oxide layers, and forming a capping layer over the composite oxide layer. More specifically, forming the first oxide layer involves using a high density plasma (HDP) process, forming the second oxide layer involves using a plasma enhanced chemical vapor deposition (PECVD) process, and forming the composite oxide layer preferably involves etching with a reactive ion etch.Type: GrantFiled: January 27, 2000Date of Patent: October 29, 2002Assignee: Agere Systems Guardian Corp.Inventors: Donald C. Dennis, Nace Layadi, Simon J. Molloy, Kurt G. Steiner, Sylvia W. Thomas