Patents by Inventor Syohei YAMAGUCHI

Syohei YAMAGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tin or tin alloy electroplating bath, and electronic component having electrodeposit formed thereon using the plating bath
    Patent number: 11939691
    Abstract: An electrodeposit formed by using a tin or tin alloy plating bath containing a prescribed branched polyoxyalkylene compound, such as an alkylene oxide adduct of aliphatic monoamine or polyamine in which a plurality of oxyalkylene chains are bonded to a nitrogen atom of an amine structure in a molecule, or an alkylene oxide adduct of glycerin or polyglycerin in which oxyalkylene chains are respectively bonded to a plurality of oxygen atoms of an alcohol structure in a molecule, suppresses formation defect such as abnormal growth of the electrodeposit. The electrodeposit also improves yield from the viewpoint of quality control.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: March 26, 2024
    Assignee: ISHIHARA CHEMICAL CO., LTD.
    Inventors: Syohei Yamaguchi, Hiroki Ishida, Masaru Hatabe, Shoya Iuchi
  • ELECTROLYTIC TIN OR TIN ALLOY PLATING BATH AND ELECTRONIC COMPONENT HAVING ELECTRODEPOSITION ARTICLE THAT IS FORMED WITH USE OF SAID PLATING BATH
    Publication number: 20190368063
    Abstract: An electrodeposit formed by using a tin or tin alloy plating bath containing a prescribed branched polyoxyalkylene compound, such as an alkylene oxide adduct of aliphatic monoamine or polyamine in which a plurality of oxyalkylene chains are bonded to a nitrogen atom of an amine structure in a molecule, or an alkylene oxide adduct of glycerin or polyglycerin in which oxyalkylene chains are respectively bonded to a plurality of oxygen atoms of an alcohol structure in a molecule, suppresses formation defect such as abnormal growth of the electrodeposit. The electrodeposit also improves yield from the viewpoint of quality control.
    Type: Application
    Filed: June 13, 2017
    Publication date: December 5, 2019
    Applicant: Ishihara Chemical Co., Ltd.
    Inventors: Syohei YAMAGUCHI, Hiroki ISHIDA, Masaru HATABE, Shoya IUCHI