Patents by Inventor Syoichi Nito

Syoichi Nito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Retardation film
    Patent number: 8451540
    Abstract: Disclosed is a film suitable for improvement of luminance, contrast and view angle of a liquid crystal display. Specifically disclosed is a retardation film having a thickness of 30-500 ?m, a light transmittance of not less than 85%, and an Nz factor of not less than 10.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: May 28, 2013
    Assignees: MGC Filsheet Co., Ltd., Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kenji Kato, Katsushige Hayashi, Noriyuki Kato, Haruaki Eto, Syoichi Nito
  • RETARDATION FILM
    Publication number: 20100033825
    Abstract: Disclosed is a film suitable for improvement of luminance, contrast and view angle of a liquid crystal display. Specifically disclosed is a retardation film having a thickness of 30-500 ?m, a light transmittance of not less than 85%, and an Nz factor of not less than 10.
    Type: Application
    Filed: September 11, 2007
    Publication date: February 11, 2010
    Inventors: Kenji Kato, Katsuhige Hayashi, Noriyuki Kato, Haruaki Eto, Syoichi Nito
  • Oxygen absorbent composition absorbing water vapor
    Patent number: 6596192
    Abstract: An oxygen absorbent composition absorbing water vapor mixed a liquid mixed (A) an aliphatic compound(s) with an unsaturated group(s) and (B) a transition metal salt(s) with (C) at least one solid selected from the group consisting of calcium oxide, calcium chloride and magnesium chloride.
    Type: Grant
    Filed: July 20, 2001
    Date of Patent: July 22, 2003
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tomoharu Himeshima, Nahomi Aoyama, Syoichi Nito, Kazuyuki Tomita, Junko Baba
  • Oxygen absorbent composition absorbing water vapor
    Publication number: 20020153512
    Abstract: An oxygen absorbent composition absorbing water vapor mixed a liquid mixed (A) an aliphatic compound(s) with an unsaturated group(s) and (B) a transition metal salt(s) with (C) at least one solid selected from the group consisting of calcium oxide, calcium chloride and magnesium chloride.
    Type: Application
    Filed: July 20, 2001
    Publication date: October 24, 2002
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC
    Inventors: Tomoharu Himeshima, Nahomi Aoyama, Syoichi Nito, Kazuyuki Tomita, Junko Baba
  • Process for producing a purified hydrazine hydrate
    Patent number: 4963232
    Abstract: Provided by this invention is a process for producing a purified hydrazine hydrate having a low total organic carbon concentration and which involves:a first step which includes distilling an aqueous solution of hydrazine hydrate in the presence of at least one salt selected from the group consisting of chloride, sulfate, phosphate and carbonate of (a) the metals of Group Ia and IIa of the Periodic Table of the Elements, (b) ammonium or (c) hydrazinium to concentrate the aqueous solution of hydrazine hydrate by distilling water and the majority of the total organic carbon constituents off and separating the resultant concentrate as a bottom product, anda second step which includes distilling the resultant concentrate to recover a purified aqueous solution of hydrazine hydrate as a top product and separating an aqueous solution of the above salt as a bottom product.
    Type: Grant
    Filed: May 22, 1989
    Date of Patent: October 16, 1990
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yasuhisa Kuriyama, Shuuzabu Sakaguchi, Toshiaki Kohzaki, Syoichi Nito