Abstract: The present invention discloses a method and apparatus for delivering and recycling a liquid such that a substantially air bubble-free liquid flow can be supplied to a process machine and a liquid flow that contains air bubbles can be recycled back into a liquid reservoir for venting away the air bubbles. The method and apparatus is not only capable of supplying air bubble-free liquid to a process machine, but also capable of saving a costly process liquid from being purged out into a waste tank in order to eliminate air bubbles entrapped in the liquid.

Abstract: A photoresist supplying system for used in a semiconductor fabrication, the system includes a photoresist holder for storing photoresist. A first gas supplier is connected to the photoresist holder for providing gas to the photoresist holder to force the photoresist out of the photoresist holder. A buffer is connected to the photoresist holder via an input terminal to exhaust the gas, the photoresist is output by an output terminal of the buffer. A first valve is connected to the output terminal of the buffer for controlling the flowing rate of the photoresist. A second valve is connected to the buffer to drain the gas collected by the space. A pumping apparatus is connected to the first valve via an input terminal to suck the photoresist. A filter is connected to the pumping apparatus to filter out the impurity in the photoresist. A vibrator is set in the photoresist supplying system to hold the filter for eliminating bubble.