Patents by Inventor Tac-Hyung Kim

Tac-Hyung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same
    Patent number: 8545631
    Abstract: A mask device, a method of fabricating the mask device with improved reliability, a method of manufacturing a large-sized division mask device by forming a striped aperture parallel to the roll direction, and a method of fabricating an organic light emitting display device (OLED) using the mask device. The mask device includes: at least one mask alignment mark formed on a mask; a blocking region formed on the mask and blocking a deposition material; and an aperture region formed on the mask and through which the deposition material passes, wherein the at least one mask alignment mark is formed outside the aperture region, the aperture region has a stripe pattern, and the roll direction of the mask substrate is parallel to the longitudinal direction of the stripe pattern.
    Type: Grant
    Filed: December 26, 2007
    Date of Patent: October 1, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Eui-Gyu Kim, Tac-Hyung Kim, Wook Han
  • MASK DEVICE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING ORGANIC LIGHT EMITTING DISPLAY DEVICE USING THE SAME
    Publication number: 20080157084
    Abstract: A mask device, a method of fabricating the mask device with improved reliability, a method of manufacturing a large-sized division mask device by forming a striped aperture parallel to the roll direction, and a method of fabricating an organic light emitting display device (OLED) using the mask device. The mask device includes: at least one mask alignment mark formed on a mask; a blocking region formed on the mask and blocking a deposition material; and an aperture region formed on the mask and through which the deposition material passes, wherein the at least one mask alignment mark is formed outside the aperture region, the aperture region has a stripe pattern, and the roll direction of the mask substrate is parallel to the longitudinal direction of the stripe pattern.
    Type: Application
    Filed: December 26, 2007
    Publication date: July 3, 2008
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Eui-Gyu Kim, Tac-Hyung Kim, Wook Han