Patents by Inventor Tadaaki Shinozaki

Tadaaki Shinozaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Scanning exposure method and scanning type exposure apparatus
    Patent number: 6288772
    Abstract: In the scanning exposure method of the present invention, a mask and a substrate are moved in a synchronous manner, and first patterns and a second pattern are connectedly exposed on the substrate. At least a portion of the first patterns and at least a portion of the second pattern form a common pattern, and the common pattern and non-common patterns, which differ from the common pattern, are formed in mask as the first patterns and the second pattern. The first patterns and the second pattern are connected by means of the common pattern.
    Type: Grant
    Filed: February 9, 2000
    Date of Patent: September 11, 2001
    Assignee: Nikon Corporation
    Inventors: Tadaaki Shinozaki, Masamitsu Yanagihara
  • Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask
    Patent number: 5995199
    Abstract: Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: November 30, 1999
    Assignee: Nikon Corporation
    Inventors: Tadaaki Shinozaki, Nobutaka Fujimori, Toshio Matsuura, Toshinobu Morioka
  • Method of measuring orthogonality of stage unit
    Patent number: 5532822
    Abstract: A method of measuring the orthogonality of a movement coordinate system of a stage unit having a stage which two-dimensionally moves along the movement coordinate system determined by first and second axes that cross each other, by mounting a measurement substrate having at least three measurement patterns on the stage, the at least three measurement patterns including at least two first patterns arranged on a line parallel to a third axis on an array coordinate system determined by the third and fourth axes crossing each other, and at least two second patterns arranged on a line parallel to the fourth axis; aligning the third axis with respect to the first axis of the movement coordinate system; obtaining a difference in an angle between the fourth axis of the array coordinate system and the second axis of the movement coordinate system as a first deviation by detecting the positions of the second patterns on the movement coordinate system in an aligned state; rotating the measurement substrate by 90 degrees
    Type: Grant
    Filed: March 17, 1995
    Date of Patent: July 2, 1996
    Assignee: Nikon Corporation
    Inventors: Tadaaki Shinozaki, Manabu Toguchi, Kunihiro Kawae, Kazuo Murano