Patents by Inventor Tadakatsu Nabeya

Tadakatsu Nabeya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050202762
    Abstract: To provide a dresser for a polishing cloth in which a stable dressing performance is maintained, a uniformly polished surface is provided on the surface of the polishing cloth, and in particular, a scratch on a wafer caused by the dissociation of abrasive grains is prevented, and a method for producing the same A dresser for a polishing cloth includes a base 1 and a dressing part disposed on the surface of the base. The dressing part includes a plurality of abrasive grains 2 and a plate-shaped holding component 3 that holds the abrasive grains 2. The holding component 3 is composed of cemented carbide, cermet, or ceramic. Alternatively, the holding component 3 may be composed of a material containing silicon to which silicon dioxide is added.
    Type: Application
    Filed: March 8, 2005
    Publication date: September 15, 2005
    Applicant: READ CO., LTD.
    Inventor: Tadakatsu Nabeya
  • Publication number: 20040048557
    Abstract: An abrasive cloth dresser is provided which is capable of adjusting the state of its dressing face so as to give an abrasive cloth a uniform polishing surface, and capable of giving the surfaces of an abrasive cloth a suitable polishing capability according to polishing objects, even if the dressing face state exhibits individual differences in, for example, the end shapes of abrasive grains. The abrasive cloth dresser 1 includes a base metal 2 having a ring-shaped dressing face 4 in the outer region of the base metal 2. First abrasive grain units 5 and second abrasive grain units 6 formed of abrasive grains with different grain sizes from each other are alternately arranged on the dressing face 4. The base metal 2 includes adjusters 7 for arbitrarily adjusting the height difference &dgr; between reference planes S1 and S2 of the respective abrasive grain units 5 and 6. The reference planes S1 and S2 each include the ends of the abrasive grains with the largest grain size.
    Type: Application
    Filed: September 8, 2003
    Publication date: March 11, 2004
    Applicant: READ CO., LTD.
    Inventor: Tadakatsu Nabeya
  • Patent number: 5536485
    Abstract: A powder of diamond or high-pressure phase boron nitride core particles charged into a coating space as it is dispersed, and a precursor of a coat forming substance allowed to contact and/or impinge against the particles in the powder of core particles so that their surfaces are covered with the coat forming substance, thereby preparing coated diamond or high-pressure phase boron nitride particles which are subsequently sintered. The thusly produced diamond of high-pressure phase boron nitride sinter is composed of coated core particles of high performance that are superhard, uniform, dense and sintered firmly, and which have a controlled microstructure.
    Type: Grant
    Filed: August 11, 1994
    Date of Patent: July 16, 1996
    Assignees: Agency of Industrial Science & Technology, Nisshin Flour Milling Co., Ltd., Reed Co., Ltd
    Inventors: Shoichi Kume, Haruo Yoshida, Yukiyoshi Yamada, Tadashi Fuyuki, Satoshi Akiyama, Yoshiaki Hamada, Eisuke Kuroda, Tadakatsu Nabeya, Yukio Sumita, Kenichi Kimura