Patents by Inventor Tadakazu Nishikawa
Tadakazu Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7955578Abstract: To provide a method and apparatus for treating a waste gas containing fluorine-containing compounds, according to which PFCs can be decomposed efficiently even at low temperature, and moreover fluorine from the product of the decomposition can be recovered for reuse efficiently. An embodiment of the present invention relates to a method of treating a gas containing a fluorine-containing compound, comprising contacting the gas with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide.Type: GrantFiled: March 18, 2005Date of Patent: June 7, 2011Assignee: Ebara CorporationInventors: Yoichi Mori, Tadakazu Nishikawa, Masaaki Osato, Saburou Nagano, Yoshihiro Tanabe
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Patent number: 7607914Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: GrantFiled: February 23, 2007Date of Patent: October 27, 2009Assignee: Ebara CorporationInventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Publication number: 20070264188Abstract: To provide a method and apparatus for treating a waste gas containing fluorine-containing compounds, according to which PFCs can be decomposed efficiently even at low temperature, and moreover fluorine from the product of the decomposition can be recovered for reuse efficiently. An embodiment of the present invention relates to a method of treating a gas containing a fluorine-containing compound, comprising contacting the gas with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide.Type: ApplicationFiled: March 18, 2005Publication date: November 15, 2007Applicant: EBARA CORPORATIONInventors: Yoichi Mori, Tadakazu Nishikawa, Masaaki Osato, Saburou Nagano, Yoshihiro Tanabe
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Publication number: 20070160946Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: ApplicationFiled: February 23, 2007Publication date: July 12, 2007Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Patent number: 7112060Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).Type: GrantFiled: April 12, 2004Date of Patent: September 26, 2006Assignee: Ebara CorporationInventors: Yoshiro Takemura, Tetsuo Komai, Kotaro Kawamura, Takeshi Tsuji, Kazutaka Okuda, Rikiya Nakamura, Keiichi Ishikawa, Tomonori Ohashi, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao, Hiroyuki Yamada
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Publication number: 20050271988Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: ApplicationFiled: August 18, 2005Publication date: December 8, 2005Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Patent number: 6948929Abstract: A combustion type waste gas treatment system is capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: GrantFiled: September 26, 2001Date of Patent: September 27, 2005Assignee: Ebara CorporationInventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Publication number: 20040191142Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).Type: ApplicationFiled: April 12, 2004Publication date: September 30, 2004Applicant: EBARA CORPORATIONInventors: Yoshiro Takemura, Tetsuo Komai, Kotaro Kawamura, Takeshi Tsuji, Kazutaka Okuda, Rikiya Nakamura, Keiichi Ishikawa, Tomonori Ohashi, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao, Hiroyuki Yamada
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Patent number: 6736635Abstract: The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH4 and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO2 to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (15), which is open toward a combustion chamber (11), surrounded by a peripheral wall (12), and closed by a plate (14) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (15), and the mixed gases are ejected toward the combustion chamber (11) perpendicularly to the plate (14).Type: GrantFiled: May 1, 2002Date of Patent: May 18, 2004Assignee: Ebara CorporationInventors: Yoshiro Takemura, Tetsuo Komai, Kotaro Kawamura, Takeshi Tsuji, Kazutaka Okuda, Rikiya Nakamura, Keiichi Ishikawa, Tomonori Ohashi, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao, Hiroyuki Yamada
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Publication number: 20020041836Abstract: A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous and combustible waste gas under heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion frames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.Type: ApplicationFiled: September 26, 2001Publication date: April 11, 2002Inventors: Tetsuo Komai, Kohtaro Kawamura, Takeshi Tsuji, Rikiya Nakamura, Kazutaka Okuda, Keiichi Ishikawa, Tomonori Ohashi, Yoshiro Takemura, Yasutaka Muroga, Tadakazu Nishikawa, Yuji Shirao
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Patent number: 4783108Abstract: The present invention provides a catching head of apparatus for catching parts, having a tube expansible by a fluid such as air, etc. hermetically fixed at both the ends thereof to a hard base end and free end, respectively, of a core member. When in use, the tube of the catching head is expanded by air to catch a part or any other object to be handled. The one end of the tube attached to the free end of the core member is fitted as folded back to the free end of the core member. A passage is formed in the base end of the core member to supply air into the tube hermetically sealed.Type: GrantFiled: June 11, 1987Date of Patent: November 8, 1988Assignee: Bridgestone CorporationInventors: Hiroshi Fukuyama, Tadakazu Nishikawa, Junichi Misawa, Yasuo Suzuki