Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.

Abstract: An alignment apparatus performs alignment of a substrate is provided. The apparatus comprises a stage that moves while holding a substrate, an imaging device that captures an image of a mark on the substrate, and a processor that obtains a position of the mark based on the image of the mark. The imaging device includes an image sensor and a storage device that stores image data obtained by the image sensor. The imaging device performs next image capturing after the image sensor performs accumulation of charge and transfer of image data to the storage device is completed. The apparatus moves the stage for next image capturing concurrently with transfer of the image data to the storage device when capturing an image of the mark using the imaging device at a plurality of positions while moving the stage.

Abstract: A method detects a position of a target in an image using a template having first to Nth feature points. The method includes obtaining an index indicating correlation between the template and the image by repeating processing for each relative positions of the template with respect to the image, while sequentially setting first to nth (n?N) feature points as a feature point of interest. When the feature point of interest is a Jth feature point, whether an intermediate index indicating the correlation obtained based on processing of the first to Jth feature points satisfies a censoring condition is determined, and processing of (J+1)th and subsequent feature points is canceled if the intermediate index satisfies the censoring condition.

Abstract: An alignment apparatus performs alignment of a substrate is provided. The apparatus comprises a stage that moves while holding a substrate, an imaging device that captures an image of a mark on the substrate, and a processor that obtains a position of the mark based on the image of the mark. The imaging device includes an image sensor and a storage device that stores image data obtained by the image sensor. The imaging device performs next image capturing after the image sensor performs accumulation of charge and transfer of image data to the storage device is completed. The apparatus moves the stage for next image capturing concurrently with transfer of the image data to the storage device when capturing an image of the mark using the imaging device at a plurality of positions while moving the stage.

Abstract: A position detecting apparatus that detects a position of an object by detecting a mark on the object includes a light receiving element, a control unit, a light source, and an adjusting unit. The light receiving element receives light from the mark and accumulates the light as signals. The control unit detects a position of the mark based on the light from the mark. The light source illuminates the mark. The adjusting unit adjusts an amount of light applied to the mark. The control unit determines the amount of the light from the mark based on the accumulated signals in parallel with a term during which the accumulated signals are transferred to the control unit. The control unit adjusts the amount of light applied to the mark based on the amount of the light from the mark or detects the position of the mark based on the light from the mark.

Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.

Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.

Abstract: A method detects a position of a target in an image using a template having first to Nth feature points. The method includes obtaining an index indicating correlation between the template and the image by repeating processing for each relative positions of the template with respect to the image, while sequentially setting first to nth (n?N) feature points as a feature point of interest. When the feature point of interest is a Jth feature point, whether an intermediate index indicating the correlation obtained based on processing of the first to Jth feature points satisfies a censoring condition is determined, and processing of (J+1)th and subsequent feature points is canceled if the intermediate index satisfies the censoring condition.

Abstract: Provided is a lithography apparatus which forms a pattern on a substrate that includes a detector configured to detect a mark formed on the substrate; a controller configured to obtain a displacement amount of a position of the mark from a reference position thereof based on an output of the detector; wherein the controller is configured to obtain a representative value of, with respect to each of a plurality of marks associated with each sample shot region on the substrate, a plurality of the displacement amount respectively obtained based on outputs of the detector with respect to a plurality of the sample shot region, and obtain information relating to a form of a shot region on the substrate based on a plurality of the representative value respectively obtained with respect to the plurality of marks.

Abstract: The present invention provides a measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having position information in a first direction and a second mark having position information in a second direction different from the first direction, the apparatus including a detector configured to detect an image of the alignment mark, a controller configured to control movement of a stage for holding the substrate and detection by the detector, and a processor configured to obtain a position of the alignment mark whose image is detected by the detector, wherein the controller is configured to cause the detector to detect the image of the alignment mark with the stage moving in the first direction, and cause the detector to detect the image of the alignment mark with the stage moving in the second direction.

Abstract: A position detecting apparatus that detects a position of an object by detecting a mark on the object includes a light receiving element, a control unit, a light source, and an adjusting unit. The light receiving element receives light from the mark and accumulates the light as signals. The control unit detects a position of the mark based on the light from the mark. The light source illuminates the mark. The adjusting unit adjusts an amount of light applied to the mark. The control unit determines the amount of the light from the mark based on the accumulated signals in parallel with a term during which the accumulated signals are transferred to the control unit. The control unit adjusts the amount of light applied to the mark based on the amount of the light from the mark or detects the position of the mark based on the light from the mark.

Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.

Abstract: The present invention provides a measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having position information in a first direction and a second mark having position information in a second direction different from the first direction, the apparatus including a detector configured to detect an image of the alignment mark, a controller configured to control movement of a stage for holding the substrate and detection by the detector, and a processor configured to obtain a position of the alignment mark whose image is detected by the detector, wherein the controller is configured to cause the detector to detect the image of the alignment mark with the stage moving in the first direction, and cause the detector to detect the image of the alignment mark with the stage moving in the second direction.

Abstract: Provided is a lithography apparatus which forms a pattern on a substrate that includes a detector configured to detect a mark formed on the substrate; a controller configured to obtain a displacement amount of a position of the mark from a reference position thereof based on an output of the detector; wherein the controller is configured to obtain a representative value of, with respect to each of a plurality of marks associated with each sample shot region on the substrate, a plurality of the displacement amount respectively obtained based on outputs of the detector with respect to a plurality of the sample shot region, and obtain information relating to a form of a shot region on the substrate based on a plurality of the representative value respectively obtained with respect to the plurality of marks.

Abstract: The present invention provides a position detection apparatus including a sensor in which a plurality of regions where light from a mark formed on a substrate held by a stage is detected are arrayed in a first direction, a driving unit configured to drive the stage, a control unit configured to control the driving unit so as to drive the stage in a second direction perpendicular to a height direction of the substrate, so that the light guided from the mark to the sensor enters the plurality of regions while moving in the first direction, and to drive the stage in the height direction of the substrate, and a processing unit configured to process the signals from the sensor, wherein the processing unit determines a position of the substrate in the height direction, which exhibits a peak in a light intensity distribution in the first direction generated by the signals.

Abstract: The present invention provides a position detection apparatus including a sensor in which a plurality of regions where light from a mark formed on a substrate held by a stage is detected are arrayed in a first direction, a driving unit configured to drive the stage, a control unit configured to control the driving unit so as to drive the stage in a second direction perpendicular to a height direction of the substrate, so that the light guided from the mark to the sensor enters the plurality of regions while moving in the first direction, and to drive the stage in the height direction of the substrate, and a processing unit configured to process the signals from the sensor, wherein the processing unit determines a position of the substrate in the height direction, which exhibits a peak in a light intensity distribution in the first direction generated by the signals.