Patents by Inventor Tadao Kusaka

Tadao Kusaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum system with a secondary gas also connected to the roughing pump for a semiconductor processing chamber
    Patent number: 5062771
    Abstract: This invention concerns a production method and a processing apparatus for semiconductor devices, as well as an evacuating apparatus used for the processing apparatus. According to this invention, since the evacuation system of pressure-reduction processing apparatus for conducting various wafer processings during production steps of semiconductor devices is constituted only with oil-free vacuum pump, deleterious oil contaminations or carbonation products of oils produced from oils upon heating are not present in the pressure-reducing processing chamber as compared with conventional pressure-reducing processing apparatus using a vacuum oil pump as an evacuation pump and the production method of semiconductor devices using such apparatus.
    Type: Grant
    Filed: March 20, 1989
    Date of Patent: November 5, 1991
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co. Ltd.
    Inventors: Akihiko Satou, Tadao Kusaka, Shigeo Tomiyama, Kouzi Aoki, Ichiro Gyobu, Kimio Muramatsu, Hiroaki Sakamoto, Shinjiroo Ueda, Masahiro Mase, Takashi Nagaoka
  • Method for LPCVD of semiconductors using oil free vacuum pumps
    Patent number: 4835114
    Abstract: This invention concerns a production method and a processing apparatus for semiconductor devices, as well as an evacuating apparatus used for the processing apparatus. According to this invention, since the evacuation system of pressure-reduction processing apparatus for conducting various wafer processings during production steps of semi-conductor devices is constituted only with oil-free vacuum pump, deleterious oil contaminations or carbonation products of oils produced from oils upon heating are not present in the pressure-reducing processing chamber as compared with conventional pressure-reducing processing apparatus using a vacuum oil pump as an evacuation pump and the production method of semiconductor devices using such apparatus.
    Type: Grant
    Filed: February 19, 1987
    Date of Patent: May 30, 1989
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Akihiko Satou, Tadao Kusaka, Shigeo Tomiyama, Kouzi Aoki, Ichiro Gyobu, Kimio Muramatsu, Hiroaki Sakamoto, Shinjiroo Ueda, Masahiro Mase, Takashi Nagaoka