Patents by Inventor Tadashi Onishi
Tadashi Onishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20080223400Abstract: A substrate processing apparatus includes: a support member supporting a substrate in a process chamber; a first temperature adjusting member in thermal contact with the support member; and a second temperature adjusting member capable of thermally coming into contact with and separating from the support member, wherein the first temperature adjusting member and the second temperature adjusting member are temperature-adjusted to different temperatures respectively.Type: ApplicationFiled: March 13, 2008Publication date: September 18, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Tadashi ONISHI, Hiroshi Fujii
-
Patent number: 7195936Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.Type: GrantFiled: December 29, 2003Date of Patent: March 27, 2007Assignee: Tokyo Electron LimitedInventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
-
Publication number: 20070026210Abstract: The present invention relates to a laminated glass having an interlayer film between at least two transparent glass platy bodies. Functional ultra-fine particles of a particle diameter of not greater than 0.2 ?m are dispersed in the interlayer film. The functional ultra-fine particles comprise a single substance of metal, oxide, nitride, sulfide or Sb— or F-doped substance of Sn, Ti, Si, Zn, Zr, Fe, Al, Cr, Co, Ce, In, Ni, Ag, Cu, Pt, Mn, Ta, W, V and Mo, or a composite selected from at least two of these, or a mixture containing an organic resin substance in the single substance or composite, or a coated substance coated with the single substance or composite, or an antimony-doped tin oxide and/or tin-doped indium oxide. An infrared-reflective film that selectively reflects a near-infrared ray and has a sheet resistivity ranging from 1 k?/? to 10 G?/? is formed on at least one surface of the interlayer film or at least one transparent glass platy body.Type: ApplicationFiled: September 15, 2004Publication date: February 1, 2007Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Tadashi Onishi, Isao Nakamura, Chiharu Takimoto
-
Publication number: 20060194516Abstract: A processing apparatus according to the present invention, which conditions a substrate placed on a table equipped with a heater by radiating an electron beam onto the substrate while heating the substrate with the heater, includes at least three projecting portions for holding the substrate at a predetermined distance from the table. This structure minimizes the extent of uneven heating of the substrate, which, in turn, enables uniform processing of the surface on the substrate.Type: ApplicationFiled: January 31, 2006Publication date: August 31, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Akiko Kamigori, Tadashi Onishi
-
Patent number: 7023002Abstract: Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.Type: GrantFiled: July 21, 2004Date of Patent: April 4, 2006Assignee: Tokyo Electron LimitedInventors: Kazuya Nagaseki, Tadashi Onishi, Koichi Murakami, Daisuke Hayashi, Akiko Kamigori, Minoru Honda
-
Publication number: 20050196712Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: ApplicationFiled: April 20, 2005Publication date: September 8, 2005Inventors: Tadashi Onishi, Manabu Hama
-
Patent number: 6903800Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: GrantFiled: December 19, 2003Date of Patent: June 7, 2005Assignee: Tokyo Electron LimitedInventors: Tadashi Onishi, Manabu Hama
-
Publication number: 20050042388Abstract: A processing method according to the present invention coats a polar liquid film or forms an inorganic film on a surface of an organic film formed on a substrate as a protective film. The processing method comprises a modifying step of curing an organic film by irradiating the organic film with electron beams by means of an electron-beam irradiation device in a rare gas atmosphere, and an applying step of applying a polar liquid to the modified surface of the organic film or an film forming step of forming an inorganic film on the organic film. The organic film is cured and affinity for the polar liquid or the inorganic film is imparted to the organic film.Type: ApplicationFiled: December 4, 2003Publication date: February 24, 2005Inventors: Kazuyuki Mitsuoka, Tadashi Onishi, Minoru Honda, Ryuichi Asako, Mitsuaki Iwashita
-
Publication number: 20040262540Abstract: Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.Type: ApplicationFiled: July 21, 2004Publication date: December 30, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Kazuya Nagaseki, Tadashi Onishi, Koichi Murakami, Daisuke Hayashi, Akiko Kamigori, Minoru Honda
-
Publication number: 20040137760Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.Type: ApplicationFiled: December 29, 2003Publication date: July 15, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
-
Publication number: 20040131351Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.Type: ApplicationFiled: December 19, 2003Publication date: July 8, 2004Inventors: Tadashi Onishi, Manabu Hama
-
Patent number: 6558506Abstract: The present invention provides an etching system having a plurality of etching chambers (16, 18, 20) disposed about a transfer chamber (14), wherein the etching chambers are adapted to be selectively mounted at different positions with respect to the transfer chamber.Type: GrantFiled: October 24, 2001Date of Patent: May 6, 2003Assignee: Tokyo Electron LimitedInventors: Richard J. Freeman, Jay R. Wallace, Yoichi Kurono, Arthur H. Laflamme, Jr., Louise Smith Barriss, Tadashi Onishi
-
Publication number: 20010037431Abstract: In a digital information system for realizing the sale of information or the like having a commercial value in the form of a digital signal, and an audio processor, and signal processor suitably used with the system, when a digital signal is received/delivered, a digital signal source is connected directly to a player for receiving and storing a specified information, which is reproduced by the player independently. A voice interval of a digital audio signal is processed to realize the slow and fast playback. The system includes a data compressor and a data extender of simple configuration. The value of the digital signal received/delivered can be exhibited directly. A selling system is constructed easily, and the player is simple in configuration and easy to operate by anyone.Type: ApplicationFiled: June 22, 2001Publication date: November 1, 2001Inventors: Nobuo Hamamoto, Minoru Nagata, Masatoshi Ohtake, Katsutaka Kimura, Toshio Sasaki, Hiroshi Kishida, Isamu Orita, Katsuro Sasaki, Naoki Ozawa, Kazuhiro Kondo, Toshiaki Masuhara, Tadashi Onishi, Hidehito Obayashi, Kiyoshi Aiki, Hisashi Horikoshi
-
Patent number: 6282611Abstract: In a digital information system for realizing the sale of information or the like having a commercial value in the form of a digital signal, and an audio processor, and signal processor suitably used with the system, when a digital signal is received/delivered, a digital signal source is connected directly to a player for receiving and storing a specified information, which is reproduced by the player independently. A voice interval of a digital audio signal is processed to realize the slow and fast playback. The system includes a data compressor and a data extender of simple configuration. The value of the digital signal received/delivered can be exhibited directly. A selling system is constructed easily, and the player is simple in configuration and easy to operate by anyone.Type: GrantFiled: May 22, 1995Date of Patent: August 28, 2001Assignee: Hitachi, Ltd.Inventors: Nobuo Hamamoto, Minoru Nagata, Masatoshi Ohtake, Katsutaka Kimura, Toshio Sasaki, Hiroshi Kishida, Isamu Orita, Katsuro Sasaki, Naoki Ozawa, Kazuhiro Kondo, Toshiaki Masuhara, Tadashi Onishi, Hidehito Obayashi, Kiyoshi Aiki, Hisashi Horikoshi
-
Patent number: 5842123Abstract: A radio paging system with voice transfer function for transmitting a voice message input from an ordinary push-button telephone set to a small-sized receive-only unsophisticated radio pager. A paging station is provided to transmit by radio the message from a telephone network to the radio pager as follows: voice information constituting the message is first converted from analog to digital format, compressed, stored in memory, and scrambled by a privacy function part for transmission. The radio pager in turn demodulates the received information, stores it in memory, retrieves a necessary message therefrom as designated, descrambles the designated message from scrambled state, expands the message from compressed state, and outputs the message as an audible output. In this manner, the user carrying the radio pager is able to get the message from the caller without the risk of being tapped by a third party.Type: GrantFiled: April 20, 1995Date of Patent: November 24, 1998Assignee: Hitachi, Ltd.Inventors: Nobuo Hamamoto, Tadashi Onishi, Tatsundo Suzuki, Minoru Nagata, Kenichi Mizuishi, Yosuke Tyojamori
-
Patent number: 5412719Abstract: A radio paging system with voice transfer function for transmitting a voice message input from an ordinary push-button telephone set to a small-sized receive-only unsophisticated radio pager. A paging station is provided to transmit by radio the message from a telephone network to the radio pager as follows: voice information constituting the message is first converted from analog to digital format, compressed, stored in memory, and scrambled by a privacy function part for transmission. The radio pager in turn demodulates the received information, stores it in memory, retrieves a necessary message therefrom as designated, descrambles the designated message from scrambled state, expands the message from compressed state, and outputs the message as an audible output. In this manner, the user carrying the radio pager is able to get the message from the caller without the risk of being tapped by a third party.Type: GrantFiled: January 15, 1993Date of Patent: May 2, 1995Assignee: Hitachi, Ltd.Inventors: Nobuo Hamamoto, Tadashi Onishi, Tatsundo Suzuki, Minoru Nagata, Kenichi Mizuishi, Yosuke Tyojamori