Patents by Inventor Tadashi Onishi

Tadashi Onishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080223400
    Abstract: A substrate processing apparatus includes: a support member supporting a substrate in a process chamber; a first temperature adjusting member in thermal contact with the support member; and a second temperature adjusting member capable of thermally coming into contact with and separating from the support member, wherein the first temperature adjusting member and the second temperature adjusting member are temperature-adjusted to different temperatures respectively.
    Type: Application
    Filed: March 13, 2008
    Publication date: September 18, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tadashi ONISHI, Hiroshi Fujii
  • Patent number: 7195936
    Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: March 27, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
  • Publication number: 20070026210
    Abstract: The present invention relates to a laminated glass having an interlayer film between at least two transparent glass platy bodies. Functional ultra-fine particles of a particle diameter of not greater than 0.2 ?m are dispersed in the interlayer film. The functional ultra-fine particles comprise a single substance of metal, oxide, nitride, sulfide or Sb— or F-doped substance of Sn, Ti, Si, Zn, Zr, Fe, Al, Cr, Co, Ce, In, Ni, Ag, Cu, Pt, Mn, Ta, W, V and Mo, or a composite selected from at least two of these, or a mixture containing an organic resin substance in the single substance or composite, or a coated substance coated with the single substance or composite, or an antimony-doped tin oxide and/or tin-doped indium oxide. An infrared-reflective film that selectively reflects a near-infrared ray and has a sheet resistivity ranging from 1 k?/? to 10 G?/? is formed on at least one surface of the interlayer film or at least one transparent glass platy body.
    Type: Application
    Filed: September 15, 2004
    Publication date: February 1, 2007
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Tadashi Onishi, Isao Nakamura, Chiharu Takimoto
  • Publication number: 20060194516
    Abstract: A processing apparatus according to the present invention, which conditions a substrate placed on a table equipped with a heater by radiating an electron beam onto the substrate while heating the substrate with the heater, includes at least three projecting portions for holding the substrate at a predetermined distance from the table. This structure minimizes the extent of uneven heating of the substrate, which, in turn, enables uniform processing of the surface on the substrate.
    Type: Application
    Filed: January 31, 2006
    Publication date: August 31, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akiko Kamigori, Tadashi Onishi
  • Patent number: 7023002
    Abstract: Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: April 4, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Kazuya Nagaseki, Tadashi Onishi, Koichi Murakami, Daisuke Hayashi, Akiko Kamigori, Minoru Honda
  • Publication number: 20050196712
    Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.
    Type: Application
    Filed: April 20, 2005
    Publication date: September 8, 2005
    Inventors: Tadashi Onishi, Manabu Hama
  • Patent number: 6903800
    Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: June 7, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Tadashi Onishi, Manabu Hama
  • Publication number: 20050042388
    Abstract: A processing method according to the present invention coats a polar liquid film or forms an inorganic film on a surface of an organic film formed on a substrate as a protective film. The processing method comprises a modifying step of curing an organic film by irradiating the organic film with electron beams by means of an electron-beam irradiation device in a rare gas atmosphere, and an applying step of applying a polar liquid to the modified surface of the organic film or an film forming step of forming an inorganic film on the organic film. The organic film is cured and affinity for the polar liquid or the inorganic film is imparted to the organic film.
    Type: Application
    Filed: December 4, 2003
    Publication date: February 24, 2005
    Inventors: Kazuyuki Mitsuoka, Tadashi Onishi, Minoru Honda, Ryuichi Asako, Mitsuaki Iwashita
  • Publication number: 20040262540
    Abstract: Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.
    Type: Application
    Filed: July 21, 2004
    Publication date: December 30, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kazuya Nagaseki, Tadashi Onishi, Koichi Murakami, Daisuke Hayashi, Akiko Kamigori, Minoru Honda
  • Publication number: 20040137760
    Abstract: In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 15, 2004
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
  • Publication number: 20040131351
    Abstract: A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.
    Type: Application
    Filed: December 19, 2003
    Publication date: July 8, 2004
    Inventors: Tadashi Onishi, Manabu Hama
  • Patent number: 6558506
    Abstract: The present invention provides an etching system having a plurality of etching chambers (16, 18, 20) disposed about a transfer chamber (14), wherein the etching chambers are adapted to be selectively mounted at different positions with respect to the transfer chamber.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: May 6, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Richard J. Freeman, Jay R. Wallace, Yoichi Kurono, Arthur H. Laflamme, Jr., Louise Smith Barriss, Tadashi Onishi
  • Publication number: 20010037431
    Abstract: In a digital information system for realizing the sale of information or the like having a commercial value in the form of a digital signal, and an audio processor, and signal processor suitably used with the system, when a digital signal is received/delivered, a digital signal source is connected directly to a player for receiving and storing a specified information, which is reproduced by the player independently. A voice interval of a digital audio signal is processed to realize the slow and fast playback. The system includes a data compressor and a data extender of simple configuration. The value of the digital signal received/delivered can be exhibited directly. A selling system is constructed easily, and the player is simple in configuration and easy to operate by anyone.
    Type: Application
    Filed: June 22, 2001
    Publication date: November 1, 2001
    Inventors: Nobuo Hamamoto, Minoru Nagata, Masatoshi Ohtake, Katsutaka Kimura, Toshio Sasaki, Hiroshi Kishida, Isamu Orita, Katsuro Sasaki, Naoki Ozawa, Kazuhiro Kondo, Toshiaki Masuhara, Tadashi Onishi, Hidehito Obayashi, Kiyoshi Aiki, Hisashi Horikoshi
  • Patent number: 6282611
    Abstract: In a digital information system for realizing the sale of information or the like having a commercial value in the form of a digital signal, and an audio processor, and signal processor suitably used with the system, when a digital signal is received/delivered, a digital signal source is connected directly to a player for receiving and storing a specified information, which is reproduced by the player independently. A voice interval of a digital audio signal is processed to realize the slow and fast playback. The system includes a data compressor and a data extender of simple configuration. The value of the digital signal received/delivered can be exhibited directly. A selling system is constructed easily, and the player is simple in configuration and easy to operate by anyone.
    Type: Grant
    Filed: May 22, 1995
    Date of Patent: August 28, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Nobuo Hamamoto, Minoru Nagata, Masatoshi Ohtake, Katsutaka Kimura, Toshio Sasaki, Hiroshi Kishida, Isamu Orita, Katsuro Sasaki, Naoki Ozawa, Kazuhiro Kondo, Toshiaki Masuhara, Tadashi Onishi, Hidehito Obayashi, Kiyoshi Aiki, Hisashi Horikoshi
  • Patent number: 5842123
    Abstract: A radio paging system with voice transfer function for transmitting a voice message input from an ordinary push-button telephone set to a small-sized receive-only unsophisticated radio pager. A paging station is provided to transmit by radio the message from a telephone network to the radio pager as follows: voice information constituting the message is first converted from analog to digital format, compressed, stored in memory, and scrambled by a privacy function part for transmission. The radio pager in turn demodulates the received information, stores it in memory, retrieves a necessary message therefrom as designated, descrambles the designated message from scrambled state, expands the message from compressed state, and outputs the message as an audible output. In this manner, the user carrying the radio pager is able to get the message from the caller without the risk of being tapped by a third party.
    Type: Grant
    Filed: April 20, 1995
    Date of Patent: November 24, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Nobuo Hamamoto, Tadashi Onishi, Tatsundo Suzuki, Minoru Nagata, Kenichi Mizuishi, Yosuke Tyojamori
  • Patent number: 5412719
    Abstract: A radio paging system with voice transfer function for transmitting a voice message input from an ordinary push-button telephone set to a small-sized receive-only unsophisticated radio pager. A paging station is provided to transmit by radio the message from a telephone network to the radio pager as follows: voice information constituting the message is first converted from analog to digital format, compressed, stored in memory, and scrambled by a privacy function part for transmission. The radio pager in turn demodulates the received information, stores it in memory, retrieves a necessary message therefrom as designated, descrambles the designated message from scrambled state, expands the message from compressed state, and outputs the message as an audible output. In this manner, the user carrying the radio pager is able to get the message from the caller without the risk of being tapped by a third party.
    Type: Grant
    Filed: January 15, 1993
    Date of Patent: May 2, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Nobuo Hamamoto, Tadashi Onishi, Tatsundo Suzuki, Minoru Nagata, Kenichi Mizuishi, Yosuke Tyojamori