Patents by Inventor Tadasuke Kobata

Tadasuke Kobata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5998097
    Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.
    Type: Grant
    Filed: April 28, 1999
    Date of Patent: December 7, 1999
    Assignees: Ebara Corporation, Yotaro Hatamura
    Inventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Yotaro Hatamura, Masayuki Nakao
  • Patent number: 5989779
    Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.
    Type: Grant
    Filed: October 17, 1995
    Date of Patent: November 23, 1999
    Assignees: Ebara Corporation, Yotaro Hatamura
    Inventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Yotaro Hatamura, Masayuki Nakao
  • Patent number: 5770123
    Abstract: An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.
    Type: Grant
    Filed: September 21, 1995
    Date of Patent: June 23, 1998
    Assignees: Ebara Corporation, Yotaro Hatamura
    Inventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Masayuki Nakao, Yotaro Hatamura