Patents by Inventor Tadayuki Kawashima

Tadayuki Kawashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130032600
    Abstract: A direct-touch diaphragm valve according to the present invention includes a valve body having inlet and outlet passages, a valve chamber being in communication with the inlet and outlet passages, a valve seat located around an open inner end of the inlet passage and a diaphragm arranged on the valve seat so as to hermetically seal the valve chamber and open or close the inlet and outlet passages, wherein the valve seat and the diaphragm have respective contact surfaces formed therebetween such that: such that: the contact surface of the valve seat has a surface roughness Ra of 0.1 to 10.0 ?m and a curvature radius Ra of 100 to 1000 mm; and the area ratio Sb/Sa of a contact area Sb of the valve seat with the diaphragm to a gas contact surface area Sa of the diaphragm ranges from 0.2 to 10%.
    Type: Application
    Filed: March 8, 2011
    Publication date: February 7, 2013
    Applicant: Central Glass Company, Limited
    Inventors: Tomonori Umezaki, Kenji Tanaka, Akifumi Yao, Tatsuo Miyazaki, Isamu Mori, Tadayuki Kawashima
  • Patent number: 6659111
    Abstract: A cleaning gas includes HF gas whose concentration is greater than or equal to 1 vol % and oxygen containing gas whose concentration ranges from 0.5 to 99 vol %. The oxygen containing gas includes at least one of O2 gas, O3 gas, N2O gas, NO gas, CO gas and CO2 gas. The cleaning gas is employed to remove a deposited material generated in a vacuum treatment apparatus for producing a thin film of at least one of Ti, W, Ta, Ru, Ir, a compound thereof and an alloy thereof.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: December 9, 2003
    Assignees: Central Glass Company, Limited, Tokyo Electron Limited
    Inventors: Isamu Mouri, Tetsuya Tamura, Mitsuya Ohashi, Tadayuki Kawashima, Masahiko Matsudo, Tatsuo Hatano
  • Patent number: 6197205
    Abstract: The present invention relates to a method for producing an electrolytic solution containing a solute of lithium hexafluorophosphate. This method includes a step of (a) reacting lithium fluoride with phosphorus pentafluiride, in a nonaqueous organic solvent that is used for producing a lithium cell's electrolytic solution, thereby to form the lithium hexafluorophosphate dissolved in the solvent. According to this method, both yield and purity of the reaction product are sufficiently high, and the reaction can easily be managed. According to need, after the step (a), the nonaqueous organic solvent may be replaced with another nonaqueous organic solvent. The present invention further relates to a method for purifying an electrolytic solution used for a lithium cell. This electrolytic solution contains an acid impurity having at least one hydrogen atom in the molecule.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: March 6, 2001
    Assignee: Central Glass Company, Limited
    Inventors: Shouichi Tsujioka, Mituo Takahata, Hisakazu Itou, Tadayuki Kawashima, Keiji Sato, Hiromi Sasaki, Sunao Yamamoto
  • Patent number: 6156930
    Abstract: The present invention provides a method for producing trifluoromethanesulfonyl chloride. This method includes the step of reacting trifluoromethanesulfonic acid with phosphorous trichloride and chlorine. With this method, trifluoromethanesulfonyl chloride can be easily and highly selectively produced at high yield. The reaction may be carried out at about atmospheric pressure. Furthermore, the reaction may be carried out in the presence of phosphorus oxychloride either under a pressurized condition or at about atmospheric pressure.
    Type: Grant
    Filed: December 28, 1999
    Date of Patent: December 5, 2000
    Assignee: Central Glass Company, Limited
    Inventors: Kaoru Mori, Takanori Hamana, Shigenori Sakai, Tadayuki Kawashima
  • Patent number: 6147006
    Abstract: A cleaning gas which is employed to remove an unnecessary deposited material formed in a thin film forming apparatus by thermal decomposition of pentaethoxytantalum or tetraethoxysilane without damaging a reactor, tools, parts and piping of a silicon oxide film-forming apparatus or a tantalum oxide film-forming apparatus. The cleaning gas comprises HF gas and at least one of an oxygen-containing gas, a fluorine gas, a chlorine fluoride gas, a bromine fluoride gas and an iodine fluoride gas.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: November 14, 2000
    Assignee: Central Glass Company, Limited
    Inventors: Isamu Mouri, Tetsuya Tamura, Mitsuya Ohashi, Tadayuki Kawashima
  • Patent number: 5866059
    Abstract: In order to produce a new substance having a diamond crystal structure, the following steps are taken in order. First, a graphite-like substance is prepared which contains boron (B), carbon (C) and nitrogen (N) as main elements. Then, the graphite-like substance is mixed with a metal powder to produce a mixture. Then, a pressure is applied to the mixture to produce a molded body, and then an explosion pressure is applied to the molded body.
    Type: Grant
    Filed: July 17, 1996
    Date of Patent: February 2, 1999
    Assignees: Central Glass Company, Limited, Agency of Industrial Science and Technology, Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Shuzo Fujiwara, Masatake Yoshida, Yozo Kakudate, Shu Usuba, Hiroyuki Yokoi, Katsutoshi Aoki, Masayuki Kawaguchi, Tadayuki Kawashima, Katsuharu Kasami, Tamikuni Komatsu