Abstract: A lithography apparatus is provided. The lithography apparatus includes: a polarizing filter that converts incident light to first polarized light having a single polarizing direction; and a photo mask that is disposed to be separated from the polarizing filter and in which a polarizing pattern having a polarization axis of a predetermined direction in order to convert the applied first polarized light to second polarized light by adjusting a transmittance of the first polarized light and a light blocking pattern that blocks the first polarized light are formed, wherein by radiating light in which a transmittance is adjusted in the photo mask, the photoresist is patterned.