Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a liquid to a substrate; and heating the substrate after the supplying the liquid, and wherein the supplying the liquid includes: supplying a first liquid to the substrate; and supplying a second liquid which is different from the first liquid to a substrate to which the first liquid is supplied, and wherein the second liquid is supplied as a test to the substrate and a contact angle between the second liquid which is supplied and the substrate is measured to determine a degree of hydrophilization of the substrate, and a supply mechanism of the second liquid supplied to the substrate is determined based on the degree of hydrophilization of the substrate which is determined, before the supplying the second liquid is performed.

Abstract: The present invention relates to a method and system for providing language learning services. The method of providing language learning services, according to the present invention, the method may include: activating, in response to receiving an input for acquiring a learning target image through a user terminal, a camera of the user terminal; specifying at least a portion of an image taken by the camera as the learning target image; receiving language learning information for the learning target image from a server; providing the language learning information to the user terminal; and storing, based on a request for storing of the language learning information, the language learning information in association with the learning target image, such that the learning target image is used in conjunction with learning of the language learning information.

Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes pre-treating a substrate by cleaning the substrate; etching the substrate by supplying an etchant and heating a substrate supplied with the etchant; and post-treating the substrate after the etching the substrate, and wherein the pre-treating the substrate, the etching the substrate, and the post-treating the substrate are each performed in different chambers, a substrate on which the pre-treating the substrate is completed is transferred in a dry state to a chamber at which the etching the substrate is performed, and a substrate on which the etching the substrate is completed is transferred in a wetted state with a liquid to a chamber at which the post-treating the substrate is performed.

Abstract: An embodiment method, performed by a device, for recommending a location in which a vehicle picks up a user includes acquiring user data including a location of the user, acquiring traffic data corresponding to the user data, calculating a plurality of candidate pickup locations corresponding to a plurality of types based on the user data and the traffic data, and providing the candidate pickup locations and operation information of each of the candidate pickup locations to the user.

Abstract: An embodiment of a display apparatus includes a display panel provided within a vehicle and including a main display area and an edge display area disposed outside the main display area and an integrated controller configured to control the display panel, wherein the integrated controller includes a passenger behavior determining unit configured to determine whether a passenger uses the display panel, a driving state determining unit configured to determine a driving state of the vehicle, and an output controller configured to control a first driving display, corresponding to the driving state of the vehicle, to be outputted to the edge display area in response to a determination that the passenger uses the display panel.

Abstract: The rectangular planar-type ICP (Inductively Coupled Plasma) antenna having a balanced ratio of a magnetic field and an electric potential is capable of improving uniformity of plasma as well as improving a density of plasma. The planar-type ICP antenna includes first and second antenna elements spirally shaped outwards from an end thereof, respectively. The ends of the fist and second antenna elements are interconnected by means of a grounded common terminal. A RF power source is connected to a powered common terminal for connecting first and second powered terminals that are the other ends of the first and second antenna elements. The first and second powered terminals are arranged in peripheral portions of the antenna and the grounded common terminal is arranged in a center portion of the antenna in order to compensate for a drop of plasma ion flux in a region to which power is applied.