Patents by Inventor Tae Keun Kim

Tae Keun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240173738
    Abstract: Provided is a substrate processing apparatus and substrate processing method capable of allowing a liquid chemical to penetrate deeply into patterns of a substrate, the substrate processing apparatus including a housing for forming a treatment space where a substrate is processed, a substrate supporter mounted in the treatment space to rotate about a rotational axis, and provided to support the substrate, a liquid chemical supplier provided above the substrate supporter to eject a liquid chemical toward an upper surface of the substrate supported by the substrate supporter, and an ejector provided at a side of the treatment space to eject a heat transfer medium with a temperature different from the temperature of the liquid chemical onto the substrate.
    Type: Application
    Filed: November 6, 2023
    Publication date: May 30, 2024
    Inventors: Yong Jun KIM, Tae-keun KIM, Junhee CHOI, Kang Sul KIM, Kyeong Min LEE
  • Publication number: 20240173752
    Abstract: Disclosed are a substrate processing apparatus and a substrate processing method that allow a chemical liquid to penetrate deeply into a gap between patterns of a substrate. The substrate processing apparatus includes a chamber having a processing space defined therein in which a substrate is processed; a chuck installed in the processing space and configured to support the substrate thereon; a chemical liquid supply formed on top of the chuck and configured to supply a chemical liquid droplet toward an upper surface of the substrate supported on the chuck; and a pressurizer formed on top of the chuck and configured to pressurize the chemical liquid droplet supplied on the upper surface of the substrate so that the pressed chemical liquid droplet fills a gap between patterns formed on the substrate.
    Type: Application
    Filed: November 21, 2023
    Publication date: May 30, 2024
    Applicant: SEMES CO., LTD.
    Inventors: Junhee CHOI, Tae-keun KIM, Kang Sul KIM, Kyeong Min LEE, Yong Jun KIM
  • Publication number: 20240178009
    Abstract: Disclosed are a substrate processing apparatus that allow a chemical liquid to penetrate deeply into a gap between patterns of a substrate. The substrate processing apparatus includes a housing having a processing space defined therein in which a substrate is processed; a substrate support installed in the processing space so as to be rotatable about a rotation axis and configured to support the substrate; a chemical liquid supply disposed on top of the substrate support and configured to spray a chemical liquid toward an upper surface of the substrate supported on the substrate support; and a controller configured to repeatedly apply a first rotation control signal and a second rotation control signal indicating different rotation speeds to the substrate support so as to generate an inertial behavior of the chemical liquid coated on the substrate.
    Type: Application
    Filed: October 26, 2023
    Publication date: May 30, 2024
    Applicant: SEMES CO., LTD.
    Inventors: Kang Sul KIM, Tae-keun KIM, Junhee CHOI, Kyeong Min LEE, Yong Jun KIM
  • Publication number: 20240178010
    Abstract: A liquid supply apparatus is provided.
    Type: Application
    Filed: September 5, 2023
    Publication date: May 30, 2024
    Inventors: Kang Sul KIM, Tae Keun KIM, Kyeong Min LEE
  • Patent number: 11987499
    Abstract: The present invention relates to entangled-type carbon nanotubes which have a bulk density of 31 kg/m3 to 85 kg/m3 and a ratio of tapped bulk density to bulk density of 1.37 to 2.05, and a method for preparing the entangled-type carbon nanotubes.
    Type: Grant
    Filed: February 28, 2023
    Date of Patent: May 21, 2024
    Assignee: LG CHEM, LTD.
    Inventors: Sung Jin Kim, Dong Hyun Cho, Jae Keun Yoon, Tae Hyung Kim, Og Sin Kim
  • Patent number: 11958874
    Abstract: According to the embodiment of the present disclosure, an organo tin compound is represented by the following Chemical Formula 1: In Chemical Formula 1, L1 and L2 are each independently selected from an alkoxy group having 1 to 10 carbon atoms and an alkylamino group having 1 to 10 carbon atoms, R1 is a substituted or unsubstituted aryl group having 6 to 8 carbon atoms, and R2 is selected from a substituted or unsubstituted linear alkyl group having 1 to 4 carbon atoms, a branched alkyl group having 3 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an allyl group having 2 to 4 carbon atoms.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: April 16, 2024
    Assignees: EGTM Co., Ltd., SK hynix Inc.
    Inventors: Jang Keun Sim, Sung Jun Ji, Tae Young Lee, Shin Beom Kim, Sun Young Baik, Tae Hwan Lim, Dong Kyun Lee, Sang Hyun Lee, Su Pill Chun
  • Publication number: 20240121924
    Abstract: A water-cooled heat dissipation module assembly capable of cooling a power module of a vehicle driving inverter system using a battery or fuel cell. The water-cooled heat dissipation module assembly includes a housing unit provided in the form of a housing having an opening portion at least partially opened at one side thereof. The housing unit and at least a part of a rim region of the cooling unit are made of a plastic material, and the housing unit and the cooling unit are joined to each other by plastic welding using a laser.
    Type: Application
    Filed: August 4, 2022
    Publication date: April 11, 2024
    Inventors: Kwan Ho RYU, Jeong Keun LEE, Min Woo LEE, Ju Hyun SUN, Tae Keun PARK, Kang Wook PARK, Lee Cheol JI, Hyeok Chul YANG, Tae Heon KIM, Keun Jae LEE
  • Patent number: 11950439
    Abstract: Disclosed herein are a white organic light-emitting device. The white organic light-emitting device enables an overall improvement in characteristics such as color temperature, efficiency, luminance, and service life, by changing the configuration of different types of emission layers in contact with each other, and a display device using the same.
    Type: Grant
    Filed: October 3, 2022
    Date of Patent: April 2, 2024
    Assignee: LG Display Co., Ltd.
    Inventors: Eun-Jung Park, Jung-Keun Kim, Wook Song, Tae-Shick Kim
  • Patent number: 11925963
    Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a dissolving solution onto a rotating substrate; and supplying, after the supplying a dissolution solution, a treating liquid including a polymer onto the rotating substrate to form a liquid film.
    Type: Grant
    Filed: May 27, 2022
    Date of Patent: March 12, 2024
    Assignee: SEMES CO., LTD.
    Inventors: Kyeong Min Lee, Tae-Keun Kim, Min Hee Cho, Won Young Kang
  • Publication number: 20230405645
    Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes supplying a dissolving solution onto a rotating substrate; and supplying, after the supplying a dissolution solution, a treating liquid including a polymer onto the rotating substrate to form a liquid film.
    Type: Application
    Filed: May 27, 2022
    Publication date: December 21, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Kyeong Min LEE, Tae-Keun KIM, Min Hee CHO, Won Young KANG
  • Publication number: 20230364656
    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes discharging a treating liquid including a polymer and a solvent onto a substrate; and solidifying a liquid film of the treating liquid by volatilizing the solvent from the treating liquid on the substrate, and wherein the solidifying a liquid film comprises a first period of stopping the rotation of the substrate or rotating the substrate at a first speed for a first time period.
    Type: Application
    Filed: May 10, 2022
    Publication date: November 16, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Tae-Keun KIM, Kyeong Min LEE, Min Hee CHO, Won Young KANG
  • Publication number: 20230215740
    Abstract: There are provided a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a stage on which a substrate is seated, in a chamber; and a treatment liquid supply apparatus supplying a treatment liquid containing a solvent and a solute onto the substrate, wherein the treatment liquid supply apparatus supplies the treatment liquid onto the substrate while moving from a center of the substrate to an outer peripheral surface of the substrate.
    Type: Application
    Filed: June 17, 2022
    Publication date: July 6, 2023
    Inventors: Won Young KANG, Tae Keun KIM, Kang Sul KIM, Kyeong Min LEE, Min Hee CHO
  • Publication number: 20230207338
    Abstract: An exemplary embodiment of the present invention provides a substrate treating method including removing particles formed on a substrate by continuously performing a process of supplying a treatment liquid including a polymer and a solvent onto the substrate, forming a solidified liquid film by volatilizing the solvent in the treatment liquid, removing the solidified liquid film from the substrate by supplying a stripping liquid onto the substrate; and supplying a rinse liquid onto the substrate.
    Type: Application
    Filed: November 1, 2022
    Publication date: June 29, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Min Hee CHO, Kyeong Min LEE, Won Young KANG, Kang Sul KIM, Tae-Keun KIM
  • Publication number: 20230170229
    Abstract: Provided are a substrate treatment apparatus and method for treating a substrate by simultaneously providing a stripper for peeling a coating film on the substrate to an entire surface of the substrate. The substrate treatment method includes discharging a first liquid onto a substrate by using a first nozzle, and forming a coating film collecting particles by using the first liquid; spraying a second liquid on the substrate by using a second nozzle, and peeling the coating film from the substrate by using the second liquid; and discharging a third liquid onto the substrate by using a third nozzle, and rinsing the coating film from the substrate by using the third liquid, wherein in the peeling of the coating film, the second liquid is simultaneously sprayed on an entire surface of the substrate.
    Type: Application
    Filed: August 3, 2022
    Publication date: June 1, 2023
    Inventors: Kyeong Min LEE, Tae Keun KIM, Kang Sul KIM, Min Hee CHO, Won Young KANG
  • Patent number: 11149234
    Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: October 19, 2021
    Assignees: Samsung Electronics Co., Ltd., Semes Co., Ltd.
    Inventors: Mi Hyun Park, Jung-Min Oh, Young-Hoo Kim, Hyo San Lee, Tae Keun Kim, Ye Rim Yeon, Hae Rim Oh, Ji Soo Jeong, Min Hee Cho
  • Publication number: 20190241844
    Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.
    Type: Application
    Filed: January 17, 2019
    Publication date: August 8, 2019
    Inventors: Mi Hyun PARK, Jung-Min OH, Young-Hoo KIM, Hyo San LEE, Tae Keun KIM, Ye Rim YEON, Hae Rim OH, Ji Soo JEONG, Min Hee CHO
  • Publication number: 20190057884
    Abstract: Disclosed are relate to an apparatus for supplying a cleaning liquid to a substrate. The cleaning liquid supply unit includes a mixing container having a liquid mixing space in the interior thereof, a first supply member configured to supply a first liquid into the liquid mixing space, a second supply member configured to supply a second liquid that is different from the first liquid into the liquid mixing space, and a mixing member configured to mix the first liquid and the second liquid supplied into the liquid mixing space, and the mixing member may include a circulation line, through which the liquids in the liquid mixing space circulate, and a pressure adjusting member configured to provide a pressure to the liquids such that the liquids in the liquid mixing space flows into the circulation line and adjust the pressure.
    Type: Application
    Filed: August 14, 2018
    Publication date: February 21, 2019
    Inventors: MINHEE CHO, JAEHYEOK YU, SEHOON OH, TAE-KEUN KIM, YERIM YEON, HAE RIM OH, JI SOO JEONG
  • Publication number: 20180335661
    Abstract: Disclosed are an apparatus and a method for manufacturing a cleaning solution. The method includes mixing a surfactant chemical and pure water at a first temperature, and after the mixing of the surfactant chemical and the pure water at the first temperature, mixing the surfactant chemical and the pure water while cooling the surfactant chemical and the pure water to a second temperature that is lower than the first temperature.
    Type: Application
    Filed: May 16, 2018
    Publication date: November 22, 2018
    Inventors: TAE-KEUN KIM, JAEHYEOK YU, MINHEE CHO, SEHOON OH, HAE RIM OH, JI SOO JEONG
  • Patent number: 10083840
    Abstract: Disclosed is a method of regenerating a phosphoric acid solution from a treatment liquid including silicon (Si), hydrogen fluoride (HF), and phosphoric acid, the method including removing the silicon by supplying hydrogen fluoride corresponding to a preset amount or more to the treatment liquid, removing the hydrogen fluoride by heating the treatment liquid to a boiling point of hydrogen fluoride or higher, and adjusting a temperature and a concentration of the phosphoric acid to preset values.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: September 25, 2018
    Assignee: SEMES CO., LTD.
    Inventors: Seungho Lee, Minhee Cho, Ki-Moon Kang, Tae-Keun Kim
  • Patent number: 10049888
    Abstract: Disclosed is a method of regenerating a phosphoric acid solution from a treatment liquid including silicon (Si), hydrogen fluoride (HF), and phosphoric acid, the method including removing the silicon by supplying hydrogen fluoride corresponding to a preset amount or more to the treatment liquid, removing the hydrogen fluoride by heating the treatment liquid to a boiling point of hydrogen fluoride or higher, and adjusting a temperature and a concentration of the phosphoric acid to preset values.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: August 14, 2018
    Assignee: SEMES CO., LTD.
    Inventors: Seungho Lee, Minhee Cho, Ki-Moon Kang, Tae-Keun Kim