Abstract: A lighting system includes a light source unit and a light-distributing member. The light source unit includes a laser light source. The light-distributing member has the function of reflecting incident light that has been emitted as a beam of light from the light source unit toward a target space. The light-distributing member transforms the incident light into lighting light having a different light distribution property from the incident light and distributes the lighting light over the target space.

Abstract: The present invention provides a vacuum deposition device that can improve the measurement accuracy of the thickness of the deposition film. The vacuum deposition device includes, in a vacuum chamber, a plurality of evaporation sections, a deposition target, a tubular body surrounding a space between the plurality of evaporation sections and the deposition target, and a film thickness meter. Deposition material vaporized from the plurality of evaporation sections passes through tubular body, reaches a surface of the deposition target, and is deposited on surface. Between film thickness meter and at least one of the evaporation sections, a guide tube is disposed which guides deposition material vaporized from the evaporation section to film thickness meter. An opening surface of the guide tube on the evaporation section side is disposed at substantially the same level as that of the opening surface of the evaporation section or inside the evaporation section.

Abstract: A vacuum deposition device, wherein an evaporation source 2 and a deposited body 3 are disposed in a vacuum chamber 1 and a space between the evaporation source 2 and the deposited body 3 is surrounded by a tubular body 4 heated at a temperature for vaporizing the substances of the evaporation source so that the substances vaporized from the evaporation source 2 can reach the surface of the deposited body 3 through the inside of the tubular body 4 and then be deposited thereon, and a control member 8 for controllably guiding the movement of the vaporized substances to the deposited body 3 inside the tubular body 4 is installed in the tubular body 4, whereby the distribution of the vaporized substances adhered onto the deposited body can be controlled so that deposition with uniform film thickness can be performed on the deposited body and, as the case may be, the deposition can be performed with an intentionally set film thickness distribution.

Abstract: A vacuum deposition device, wherein an evaporation source 2 and a deposited body 3 are disposed in a vacuum chamber 1 and a space between the evaporation source 2 and the deposited body 3 is surrounded by a tubular body 4 heated at a temperature for vaporizing the substances of the evaporation source so that the substances vaporized from the evaporation source 2 can reach the surface of the deposited body 3 through the inside of the tubular body 4 and then be deposited thereon, and a control member 8 for controllably guiding the movement of the vaporized substances to the deposited body 3 inside the tubular body 4 is installed in the tubular body 4, whereby the distribution of the vaporized substances adhered onto the deposited body can be controlled so that deposition with uniform film thickness can be performed on the deposited body and, as the case may be, the deposition can be performed with an intentionally set film thickness distribution.