Patents by Inventor Takaaki Negishi

Takaaki Negishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Novel atopic dermatitis-associated gene and proteins
    Publication number: 20040076986
    Abstract: A gene and/or a protein involved in the prevention or treatment of allergic diseases and dermatitis, in particular atopic dermatitis are provided.
    Type: Application
    Filed: November 17, 2003
    Publication date: April 22, 2004
    Inventors: Osamu Ohara, Takahiro Nagase, Takaaki Negishi, Seiichi Mizushima, Shoji Furusako
  • Pattern formation process
    Patent number: 5670299
    Abstract: A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: September 23, 1997
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Fumiyoshi Urano, Hirotoshi Fujie, Keiji Oono, Takaaki Negishi
  • Pattern formation method
    Patent number: 5558976
    Abstract: A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.
    Type: Grant
    Filed: November 29, 1995
    Date of Patent: September 24, 1996
    Assignees: Wako Pure Chemical Industries, LTD., Matsushita Electric Industrial Co., LTD.
    Inventors: Fumiyoshi Urano, Takaaki Negishi, Akiko Katsuyama, Masayuki Endo
  • Resist material and pattern formation process
    Patent number: 5468589
    Abstract: A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: November 21, 1995
    Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industrial Co., Ltd.
    Inventors: Fumiyoshi Urano, Hirotoshi Fujie, Keiji Oono, Takaaki Negishi
  • Optically active compounds and liquid crystal compositions containing such compounds
    Patent number: 5128062
    Abstract: An optically active compound of the formula: ##STR1## wherein R is alkyl or alkoxy, R* is an optically active alkyl group, X is alkyl or halogen, Y is a single bond ##STR2## and C* is an asymmetric carbon, is chemically stable and shows or induces large spontaneous polarization and is useful in a chiral liquid crystal composition.
    Type: Grant
    Filed: June 6, 1990
    Date of Patent: July 7, 1992
    Assignees: Wako Pure Chemical Industries, Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Shogo Kobayashi, Shigeki Ishibashi, Fumiyoshi Urano, Takaaki Negishi
  • Liquid crystal compounds and intermediates thereof
    Patent number: 5114615
    Abstract: A liquid crystal compound of the formula: ##STR1## wherein m and n are independently integers of 1 to 22; k and l are independently integers of 1 to 2; and C* is an asymmetric carbon atom, is chemically stable and can be applied to liquid crystal display devices operable at room temperature.
    Type: Grant
    Filed: September 25, 1991
    Date of Patent: May 19, 1992
    Assignees: Wako Pure Chemical Industries, Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Shigeki Ishibashi, Kouzaburou Nakamura, Tohru Maruno, Masaaki Nakahata, Takaaki Negishi, Fumiyoshi Urano