Patents by Inventor Takafumi Morimoto
Takafumi Morimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240081167Abstract: An agricultural work assistance system includes a display to display a map representing an agricultural field, and a controller configured or programmed to define or function as an area setter to set a first area and a second area located inward of the first area in the map displayed by the display, and a route creator to create, in at least one of the first area or the second area, a travel route along which an agricultural machine is to travel. The route creator is configured or programmed to set at least a portion of the travel route as an automatic steering route on which the agricultural machine is to be automatically steered and a travel speed of the agricultural machine is to be changed manually.Type: ApplicationFiled: November 16, 2023Publication date: March 14, 2024Inventors: Takanori MORIMOTO, Takafumi MORISHITA, Kenji TAMATANI, Fumiya YOSHIMURA, Ryota KIKUCHI, Ken SAKUTA
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Publication number: 20220413488Abstract: A controller of a work machine includes: a service request generation unit that generates and transfers information for requesting a remote service; a service execution condition management unit that confirms and manages the condition for executing the remote service; and an operating mode management unit that manages the operating mode and the operation status of the work machine. The service request generation unit generates service request information containing function types of a plurality of remote services, the operating mode of the vehicle, and the communication performance of the communication network, and transfers it to the data center. For each function type included in the service request information, the service execution condition management unit outputs service execution information containing the execution possibility, the condition for operating mode, and the condition for communication performance.Type: ApplicationFiled: March 11, 2021Publication date: December 29, 2022Inventors: Takashi SAEGUSA, Yuuki NAGAOKA, Takafumi MORIMOTO, Yutaka WATANABE
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Publication number: 20140298548Abstract: A scanning probe microscope is provided for scanning a sample surface with a probe formed on a cantilever and detecting an interaction acting between the probe and the sample surface to measure a physical property including a surface shape of the sample. The microscope includes an arrangement for detecting torsion of the cantilever and for correcting a profile error caused by deflection of the probe and torsion of the cantilever based on the amount of torsion which is detected.Type: ApplicationFiled: June 13, 2014Publication date: October 2, 2014Inventors: Shuichi BABA, Masahiro WATANABE, Takafumi MORIMOTO, Manabu EDAMURA, Toshihiko NAKATA, Yukio KEMBO, Toru KURENUMA, Satoshi SEKINO
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Patent number: 8844061Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: GrantFiled: December 26, 2012Date of Patent: September 23, 2014Assignee: HITACHI, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Yukio Kembo, Toru Kurenuma, Takafumi Morimoto, Manabu Edamura, Satoshi Sekino
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Publication number: 20130205454Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: ApplicationFiled: December 26, 2012Publication date: August 8, 2013Applicant: Hitachi, Ltd.Inventors: Shuichi BABA, Masahiro WATANABE, Toshihiko NAKATA, Yukio KEMBO, Toru KURENUMA, Takafumi MORIMOTO, Manabu EDAMURA, Satoshi SEKINO
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Patent number: 8342008Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: GrantFiled: August 7, 2008Date of Patent: January 1, 2013Assignee: Hitachi, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Yukio Kembo, Toru Kurenuma, Takafumi Morimoto, Manabu Edamura, Satoshi Sekino
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Patent number: 8011230Abstract: A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.Type: GrantFiled: January 31, 2008Date of Patent: September 6, 2011Assignee: Hitachi, Ltd.Inventors: Masahiro Watanabe, Toru Kurenuma, Hiroshi Kuroda, Takafumi Morimoto, Shuichi Baba, Toshihiko Nakata, Manabu Edamura, Yukio Kembo
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Publication number: 20100043108Abstract: In a tip having a carbon nanotube tip used to a scanning probe microscope, its length of the tip is adjusted in a several order of 10 nm and the tip maintains cylindrical shape up to the extremity portion.Type: ApplicationFiled: October 31, 2008Publication date: February 18, 2010Inventors: Motoyuki Hirooka, Makoto Okai, Takafumi Morimoto, Satoshi Sekino, Hiroki Tanaka, Masato Takashina, Yuuki Uozumi
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Patent number: 7631548Abstract: With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed.Type: GrantFiled: April 20, 2007Date of Patent: December 15, 2009Assignee: Hitachi, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Toru Kurenuma, Hiroshi Kuroda, Takafumi Morimoto, Yukio Kembo, Manabu Edamura
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Publication number: 20090158828Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: ApplicationFiled: August 7, 2008Publication date: June 25, 2009Inventors: Shuichi BABA, Masahiro Watanabe, Toshihiko Nakata, Yukio Kembo, Toru Kurenuma, Takafumi Morimoto, Manabu Edamura, Satoshi Sekino
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Publication number: 20080245139Abstract: A measurement method of a scanning probe microscope including a first approach operation adjusting an operation position of a fine positioning unit to near a maximum extension amount and ending the approach by coarse positioning, a first measurement operation making the probe scan the surface for measurement in a close probe state based on the first approach operation to obtain relief information of the sample surface, a positioning operation positioning the probe at a recessed part based on the relief information obtained by the first measurement operation, a second approach operation making the probe again approach the surface at a position determined by the positioning operation, adjusting an operation position of the Z-axis fine positioning device to close to a maximum extension amount, and ending the repeated approach, and a second measurement operation making the probe scan the surface for measurement in a close probe state based on the second approach operation to obtain relief information of the samplType: ApplicationFiled: April 2, 2008Publication date: October 9, 2008Inventors: Takafumi Morimoto, Toru Kurenuma, Manabu Edamura, Hiroshi Kuroda, Yukio Kembo, Masahiro Watanabe, Shuichi Baba
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Publication number: 20080236259Abstract: A scanning probe microscope provided with a cantilever 21 having a probe 20 facing a sample 12, a measurement unit 24 measuring a physical quantity occurring between the probe and sample, and movement mechanisms 11, 29 changing a positional relationship between the probe and sample to cause a scanning operation and making the probe scan the surface of the sample by the movement mechanism and measure the surface of the sample by the measurement unit.Type: ApplicationFiled: August 18, 2005Publication date: October 2, 2008Inventors: Tooru Kurenuma, Yukio Kenbou, Hiroaki Yanagimoto, Hiroshi Kuroda, Takafumi Morimoto
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Publication number: 20080223122Abstract: A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.Type: ApplicationFiled: January 31, 2008Publication date: September 18, 2008Inventors: Masahiro Watanabe, Toru KURENUMA, Hiroshi Kuroda, Takafumi Morimoto, Shuichi Baba, Toshihiko Nakata, Manabu Edamura, Yukio Kembo
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Patent number: 7388199Abstract: A probe is made by attaching a carbon nanotube 12 to a mounting base end 13, which eliminates the effects of a carbon contamination film, to increase the bonding strength, increase the conductivity of the probe, and strengthen the bonding performance thereof by coating the entire circumference of the nanotube and the base with a coating film, rather than coating just one side. The work of mounting the carbon nanotube and mounting base end are performed under observation by a microscope. Further, the carbon contamination film 14 formed by an electron microscope is stripped off at a stage before bonding by the coating film.Type: GrantFiled: September 3, 2004Date of Patent: June 17, 2008Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Takafumi Morimoto, Tooru Shinaki, Yoshiyuki Nag'No, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa, Ken Murayama, Mitsuo Hayashibara, Kishio Hidaka, Tadashi Fujieda
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Publication number: 20080087820Abstract: This probe control method is applied to the scanning probe microscope having a probe section with a probe pointed at a sample, a detection section for detecting physical quantity between the sample and the probe, a measurement section for measuring the surface of the sample to obtain the surface information on the basis of the physical quantity when scanning the sample surface by the probe, and a movement mechanism with at least two degree of freedom. The probe control method has steps of moving the probe in a scanning direction different from the contact direction while making the probe come into contact with the sample surface, detecting the torsional state of the probe during the movement of the probe, and adjusting either or both of the rate in the scanning direction and the force in the contact direction on the basis of the detected value obtained by the detection step.Type: ApplicationFiled: October 4, 2007Publication date: April 17, 2008Inventors: Toru KURENUMA, Hiroaki Yanagimoto, Yukio Kembo, Yuichi Kunitomo, Takafumi Morimoto, Satoshi Sekino
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Patent number: 7350404Abstract: The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is measured when the probe tip scans the surface of the sample. X-, Y-, and Z-fine movement mechanisms 23, 29, and 30 are used to relatively change the positions of the probe tip and sample. It is possible to maintain a high measurement accuracy and enable scan movement of a probe tip on a sample surface by simple control when measuring a part having a gradient in measurement of an uneven shape on a sample surface.Type: GrantFiled: August 27, 2004Date of Patent: April 1, 2008Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Yasushi Minomoto, Shigeru Miwa, Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto
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Patent number: 7333191Abstract: A scanning probe microscope has a cantilever with a probe facing a sample and a measurement section for measuring a physical quantity occurring between the probe and the sample when the probe scans a surface of the sample, holding the physical quantity constant to measure the surface of the sample. The above microscope further has a probe tilt mechanism, an optical microscope etc. for detecting a position of the probe when the probe is tilted, and a control section for setting the probe in a first tilt posture and second tilt posture, measuring a surface of the sample by the measurement section at each tilt posture, detecting the position of the probe at least at the second tilt posture by the optical microscope etc., and making a measurement location at the second tilt posture match with a measurement location at the first tilt posture for measurement.Type: GrantFiled: July 19, 2004Date of Patent: February 19, 2008Assignee: Hitachi Kenki Finetech Co., Ltd.Inventors: Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa
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Publication number: 20070266780Abstract: With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed.Type: ApplicationFiled: April 20, 2007Publication date: November 22, 2007Inventors: SHUICHI BABA, Masahiro Watanabe, Toshihiko Nakata, Toru Kurenuma, Hiroshi Kuroda, Takafumi Morimoto, Yukio Kembo, Manabu Edamura
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Publication number: 20070180889Abstract: A probe replacement method for a scanning probe microscope for measuring the surface of a sample, having a cantilever (21) having a probe (20), and a measurement unit for measuring a physical quantity between the probe and sample. The scanning probe microscope is provided with a cantilever mount (22), a cantilever cassette (30), an XY stage (14) and Z stage (15) for moving the cantilever cassette, and an optical microscope (18). In a first step, a cantilever is selected from the cantilever cassette and is mounted on the cantilever mount. In a second step, an optical microscope is moved and the mounted cantilever is set in a prescribed position in the field of view after the cantilever is mounted in the scanning probe microscope. In the second step, a step is provided for moving the optical microscope side or the cantilever side and performing positional adjustment.Type: ApplicationFiled: March 22, 2004Publication date: August 9, 2007Inventors: Ken Murayama, Yokio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa, Takashi Furutani
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Patent number: 7243441Abstract: A method an apparatus for measuring the depths of many fine holes formed in the surface of a sample by etching. Positional information on a plurality of hole patterns is acquired by scanning, with a stylus, the surface of the sample in which the hole patterns are formed by etching. The depths of the plurality of hole patterns are measured by scanning, with the stylus, bottom faces of the plurality of hole patterns and the surface of the sample in the respective vicinities of the hole patterns on the basis of the positional information that has been acquired. Information on distribution of the depths of the plurality of hole patterns is displayed on a screen on the basis of information on the measured depths of the plurality of hole patterns and the positional information on each of the hole patterns.Type: GrantFiled: November 15, 2004Date of Patent: July 17, 2007Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Masahiro Watanabe, Takenori Hirose, Yukio Kembo, Yoshiyuki Nagano, Takafumi Morimoto