Patents by Inventor Takahiro Kaitou

Takahiro Kaitou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Production process of synthetic quartz glass
    Patent number: 7841211
    Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: November 30, 2010
    Assignee: Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Tatsuhiro Sato, Takahiro Kaitou, Akira Fujinoki, Toshiyuki Kato, Tohru Segawa, Nobumasa Yoshida
  • Method for producing synthetic quartz glass and synthetic quartz glass article
    Publication number: 20060059948
    Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.
    Type: Application
    Filed: November 28, 2003
    Publication date: March 23, 2006
    Inventors: Tatsuhiro Sato, Takahiro Kaitou, Akira Fujinoki, Toshiyuki Kato, Tohru Segawa, Nobumasa Yoshida