Abstract: A semiconductor device includes a substrate, a semiconductor layer, an element region, and fin transistors. The substrate includes a principal surface. The semiconductor layer is formed as a surface layer or on the principal surface of the substrate, the surface layer being the principal surface of the substrate. The semiconductor layer has a crystal structure in which an angle between two of crystal orientations with equivalent relationships on a crystal plane having a correspondence with the principal surface of the substrate is 60 degrees or 120 degrees. The element region includes unit element regions formed on the principal surface of the substrate. The fin transistors are formed in the semiconductor layer, in the respective unit element regions. The fin transistors radially extend from a center toward an outer periphery of the element region. Adjacent two of the fin transistors have a spacing with a 60° angle or a 120° angle.

Abstract: The present embodiment relates to a light emission device capable of removing zero-order light from output light of an S-iPM laser. The light emission device comprises an active layer and a phase modulation layer. The phase modulation layer includes a base layer and a plurality of modified refractive index regions. In a state in which a virtual square lattice is set on the phase modulation layer, a center of gravity of each modified refractive index region is separated from a corresponding lattice point, and a rotation angle around each lattice point that decides a position of the center of gravity of each modified refractive index region is set according to a phase distribution for forming an optical image. A lattice spacing and an emission wavelength satisfy a condition of M-point oscillation in a reciprocal lattice space of the phase modulation layer.

Abstract: An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which the exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the exposure operation. In accordance with detection of a predetermined event before the exposure operation period, the controller performs, before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.

Abstract: An information processing apparatus includes an acquisition unit configured to acquire process information about a substrate process, the process information including process data and a process condition, and a display control unit configured to control a display on a display apparatus based on the process information acquired by the acquisition unit, wherein the display control unit selectively displays, on the display apparatus, a first screen that displays the process data of a lot including a plurality of substrates on a lot-by-lot basis and a second screen that displays the process data of a first lot on a substrate-by-substrate basis, the first lot being a lot designated by a user from the lot displayed on the first screen.

Abstract: An information processing apparatus includes an acquisition unit configured to acquire process information about a substrate process, the process information including process data and a process condition, and a display control unit configured to control a display on a display apparatus based on the process information acquired by the acquisition unit, wherein the display control unit selectively displays, on the display apparatus, a first screen that displays the process data of a lot including a plurality of substrates on a lot-by-lot basis and a second screen that displays the process data of a first lot on a substrate-by-substrate basis, the first lot being a lot designated by a user from the lot displayed on the first screen.

Abstract: A communication device used as a first communication device in a wireless communication system including the first communication device, a second communication device communicating with the first communication device, and a user equipment communicating with the first communication device, includes an acquisition unit configured to acquire a parameter used for performing a random access procedure from the second communication device; and a control unit configured to transmit, in the case of receiving a random access preamble from the user equipment in a random access channel indicated by the parameter, information indicating that the random access preamble indicated by the parameter is received from the user equipment to the second communication device.

Abstract: A user apparatus configured to perform communication with a base station in a mobile communication system that supports carrier aggregation, including: transmission means configured to transmit, to the base station, the number of layers for each of component carriers that form the carrier aggregation as information of downlink MIMO capability; and reception means configured to receive, from the base station, the number of layers that is used for determining a bit width of a rank indicator for each of the component carriers that form the carrier aggregation.

Abstract: An information processing apparatus includes an acquisition unit configured to acquire process information about a substrate process, the process information including process data and a process condition, and a display control unit configured to control a display on a display apparatus based on the process information acquired by the acquisition unit, wherein the display control unit selectively displays, on the display apparatus, a first screen that displays the process data of a lot including a plurality of substrates on a lot-by-lot basis and a second screen that displays the process data of a first lot on a substrate-by-substrate basis, the first lot being a lot designated by a user from the lot displayed on the first screen.

Abstract: A base station used as a first base station in a wireless communication system including the first base station, a second base station that communicates with the first base station, and a user equipment that communicates with the first base station includes: a reception unit that receives a parameter used for generating a downlink physical data channel and data to be transmitted toward the user equipment from the second base station; a generating unit that generates the downlink physical data channel by performing processing of Layer 1 on the data using the parameter; and a transmission unit that transmits the generated downlink physical data channel.

Abstract: An information processing apparatus for acquiring an inspection condition for performing an inspection on a pattern formed by a lithography apparatus that forms a pattern on a substrate with an original includes an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model, wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern.

Abstract: A substrate processing apparatus is provided. The apparatus includes an imaging unit that images a mark on a substrate, and a processor that aligns the substrate based on an image of the mark obtained by the imaging unit. If the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery processes based on the identified factor. The processor includes an output unit that outputs a condition for the at least one of recovery processes in accordance with an inference model, and a learning unit that learns the inference model based on an execution result of the at least one of the recovery processes under the condition output from the output unit.

Abstract: A base station is provided that includes an obtainer that obtains a first parameter used for generation of a signal of a physical downlink control format indicator channel, a second parameter used for generation of a signal of a physical downlink HARQ indicator channel, or a third parameter used for generation of a signal of a physical downlink control channel; a generator that generates the signal of the physical downlink control format indicator channel, the signal of the physical downlink HARQ indicator channel, or the signal of the physical downlink control channel using the first parameter, the second parameter, or the third parameter; and a transmitter that transmits the generated signal of the physical downlink control format indicator channel, the generated signal of the physical downlink HARQ indicator channel, or the generated signal of the physical downlink control channel.

Abstract: An example system includes: an information processing device including a display processing unit performing processing of displaying on a display unit a basic screen containing a selection image and a background image, the selection image being constructed from one or a plurality of images used for receiving selection operation, the background image serving as a background of the selection image; and a background image transmission device transmitting the background image of the basic screen. The display processing unit of the information processing device automatically receives the background image transmitted by the background image transmission device and displays the received background image in the background of the selection image.

Abstract: An interface method between a central-aggregate apparatus and an extension apparatus is provided, which includes: transmitting, by the central-aggregate apparatus, uplink signal indication information for a user equipment and an identifier of the user equipment to the extension apparatus; retaining, by the extension apparatus, the identifier and uplink signal information extracted from the received uplink signal indication information and transmitting an uplink signal indication to the user equipment; receiving an uplink signal transmitted from the user equipment based on one or both of the retained uplink signal information and identifier; extracting data information from the uplink signal, estimating uplink communication quality based on the uplink signal, and transmitting one or both of the extracted data information and the estimated uplink communication quality to the central-aggregate apparatus; and receiving, by the central-aggregate apparatus, one or both of the data information and the uplink communi

Abstract: A substrate processing apparatus is provided. The apparatus includes an imaging unit that images a mark on a substrate, and a processor that aligns the substrate based on an image of the mark obtained by the imaging unit. If the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery processes based on the identified factor. The processor includes an output unit that outputs a condition for the at least one of recovery processes in accordance with an inference model, and a learning unit that learns the inference model based on an execution result of the at least one of the recovery processes under the condition output from the output unit.

Abstract: A communication device used as a first communication device in a wireless communication system including the first communication device, a second communication device communicating with the first communication device, and a user equipment communicating with the first communication device, includes an acquisition unit configured to acquire a parameter used for performing a random access procedure from the second communication device; and a control unit configured to transmit, in the case of receiving a random access preamble from the user equipment in a random access channel indicated by the parameter, information indicating that the random access preamble indicated by the parameter is received from the user equipment to the second communication device.

Abstract: A base station used as a first base station in a wireless communication system including the first base station, a second base station that communicates with the first base station, and a user equipment that communicates with the first base station includes: a reception unit that receives a parameter used for performing communication in a specific band and data to be transmitted toward the user equipment from the second base station; and a detection unit that performs a process of detecting a use state of the specific band according to the parameter when the data is transmitted to the user equipment.

Abstract: An example system includes: a display processing unit performing processing of displaying on a display unit a home screen containing a selection image and a background image, the selection image being constructed from one or a plurality of images used for receiving selection operation, the background image serving as a background of the selection image; and a scroll operation reception unit receiving operation of scrolling the selection image displayed on the display unit. In accordance with the operation of scrolling received by the scroll operation reception unit, the display processing unit scrolls the selection image while animating the background image of the home screen.

Abstract: An information processing apparatus for acquiring an inspection condition for performing an inspection on a pattern formed by a lithography apparatus that forms a pattern on a substrate with an original includes an acquisition unit configured to acquire a second inspection condition to be applied in a case where an inspection is performed on a second pattern by inputting third information indicating a state of the lithography apparatus acquired when the second pattern is formed to a model, wherein the model is acquired by machine learning with learning data including first information indicating a state of the lithography apparatus acquired when a first pattern is formed and second information indicating a first inspection condition applied when an inspection is performed on the first pattern.