Patents by Inventor Takako Fujimoto

Takako Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-depressant imidazoles, compositions and use
    Patent number: 4602031
    Abstract: An antidepressive imidazole compound of the formula: ##STR1## wherein R.sub.1 is lower alkyl, R.sub.2 is hydrogen or lower alkyl, and R.sub.3, R.sub.4 and R.sub.5 are hydrogen, lower alkyl, trifluoromethyl, amino, mono- or di-lower alkylamino, heterocyclic amino, halogen or ##STR2## (in which R.sub.6 is hydrogen, lower alkyl or lower alkylsulfonyl, A is carbonyl or sulfonyl, and R.sub.7 is lower alkyl, halogenated lower alkyl, mono- or di-lower alkylamino, mono- or di-lower alkylaminoalkyl, unsubstituted phenyl or phenyl having halogen, lower alkyl, lower alkoxy or trifluoromethyl, phenylamino or phenylamino having halogen, lower alkyl, lower alkoxy or trifluoromethyl); and their pharmaceutically acceptable acid addition salts.
    Type: Grant
    Filed: June 6, 1985
    Date of Patent: July 22, 1986
    Assignee: Eisai Co., Ltd.
    Inventors: Motosuke Yamanaka, Isao Saito, Kiyomi Yamatsu, Takako Fujimoto
  • Anti-depressant imidazoles
    Patent number: 4533669
    Abstract: An anti-depressant imidazole compound of the formula: ##STR1## wherein R.sub.1 is lower alkyl, R.sub.2 is hydrogen or lower alkyl, and R.sub.3, R.sub.4 and R.sub.5 are hydrogen, lower alkyl, trifluoromethyl, amino, mono- or di-lower alkylamino, heterocyclic amino, halogen or ##STR2## (in which R.sub.6 is hydrogen, lower alkyl or lower alkylsulfonyl, A is carbonyl or sulfonyl, and R.sub.7 is lower alkyl, halogenated lower alkyl, mono- or di-lower alkylamino, mono- or di-lower alkylaminoalkyl, unsubstituted phenyl or phenyl having halogen, lower alkyl, lower alkoxy or trifluoromethyl, phenylamino or phenylamino having halogen, lower alkyl, lower alkoxy or trifluoromethyl); and their pharmaceutically acceptable acid addition salts. These compounds are useful as agents for treating depression and depressive states.
    Type: Grant
    Filed: February 25, 1983
    Date of Patent: August 6, 1985
    Assignee: Eisai Co., Ltd.
    Inventors: Motosuke Yamanaka, Isao Saito, Kiyomi Yamatsu, Takako Fujimoto
  • Acylaminophenyl imidazoles and anti-depressing agent containing the same
    Patent number: 4402966
    Abstract: An imidazole compound of the formula: ##STR1## wherein R.sub.1 is lower alkyl, R.sub.2 is hydrogen or lower alkyl, and R.sub.3, R.sub.4 and R.sub.5 are hydrogen, lower alkyl, trifluoromethyl, amino, mono- or di-lower alkylamino, heterocyclic amino, halogen or ##STR2## (in which R.sub.6 is hydrogen, lower alkyl or lower alkylsulfonyl, A is carbonyl or sulfonyl, and R.sub.7 is lower alkyl, halogenated lower alkyl, mono- or di-lower alkylamino, mono- or di-lower alkylaminoalkyl, unsubstituted phenyl or phenyl having halogen, lower alkyl, lower alkoxy or trifluoromethyl, phenylamino or phenylamino having halogen, lower alkyl, lower alkoxy or trifluoromethyl); and their pharmaceutically acceptable acid addition salts.The compounds are useful for treating patients suffering from depression.
    Type: Grant
    Filed: April 9, 1981
    Date of Patent: September 6, 1983
    Assignee: Eisai Co., Ltd.
    Inventors: Motosuke Yamanaka, Isao Saito, Kiyomi Yamatsu, Takako Fujimoto
  • Novel imidazole compound and anti-depressing agent containing the same
    Patent number: 4301169
    Abstract: An imidazole compound of the formula: ##STR1## wherein R.sub.1 is lower alkyl, R.sub.2 is hydrogen or lower alkyl, and R.sub.3, R.sub.4 and R.sub.5 are hydrogen, lower alkyl, trifluoromethyl, amino, mono- or di-lower alkylamino, heterocyclic amino, halogen or ##STR2## (in which R.sub.6 is hydrogen, lower alkyl or lower alkylsulfonyl, A is carbonyl or sulfonyl, and R.sub.7 is lower alkyl, halogenated lower alkyl, mono- or di-lower alkylamino, mono- or di-lower alkylaminoalkyl, unsubstituted phenyl or phenyl having halogen, lower alkyl, lower alkoxy or trifluoromethyl, phenylamino or phenylamino having halogen, lower alkyl, lower alkoxy or trifluoromethyl); and their pharmaceutically acceptable acid addition salts.
    Type: Grant
    Filed: November 13, 1979
    Date of Patent: November 17, 1981
    Assignee: Eisai Co., Ltd.
    Inventors: Motosuke Yamanaka, Isao Saito, Kiyomi Yamatsu, Takako Fujimoto