Patents by Inventor Takanobu Tsudera
Takanobu Tsudera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7576231Abstract: A method for producing an isocyanate group-containing siloxane compound is provided. In this method, a halogenated siloxane compound represented by the following general formula (1): or the following general formula (2) wherein R1, R2, R3, and R4 are independently hydrogen atom, a monovalent hydrocarbon group containing 1 to 8 carbon atoms, or a siloxy group represented by OSiR5R6R7 wherein R8, R6, and R7 are a monovalent hydrocarbon group containing 1 to 8 carbon atoms, X is a halogen atom, n is an integer of 1 to 10, a is 0, 1, or 2, and b is an integer of 2 to 9; is reacted with a cyanate salt represented by the following general formula (3): Mm+(OCN)m??(3) wherein M represents an alkali metal or an alkaline earth metal, and m is 1 or 2. The isocyanate group-containing siloxane compound produced is represented by the following general formula (4): or the following general formula (5): wherein R1, R2, R3, R4, n, q, and a are as defined above.Type: GrantFiled: August 1, 2007Date of Patent: August 18, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Tsudera, Tohru Kubota, Ayumu Kiyomori
-
Publication number: 20080183001Abstract: A method for producing an isocyanate group-containing siloxane compound is provided. In this method, a halogenated siloxane compound represented by the following general formula (1): or the following general formula (2) wherein R1, R2, R3, and R4 are independently hydrogen atom, a monovalent hydrocarbon group containing 1 to 8 carbon atoms, or a siloxy group represented by OSiR5R6R7 wherein R8, R6, and R7 are a monovalent hydrocarbon group containing 1 to 8 carbon atoms, X is a halogen atom, n is an integer of 1 to 10, a is 0, 1, or 2, and b is an integer of 2 to 9; is reacted with a cyanate salt represented by the following general formula (3): Mm+(OCN)m ??(3) wherein M represents an alkali metal or an alkaline earth metal, and m is 1 or 2. The isocyanate group-containing siloxane compound produced is represented by the following general formula (4): or the following general formula (5): wherein R1, R2, R3, R4, n, q, and a are as defined above.Type: ApplicationFiled: August 1, 2007Publication date: July 31, 2008Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Takanobu Tsudera, Tohru Kubota, Ayumu Kiyomori
-
Patent number: 7179931Abstract: High-purity trimethylaluminum has the following impurity contents: organosilicon components?0.5 ppm, chlorine components?20 ppm, hydrocarbon components?1,000 ppm, Ca?0.05 ppm, Fe?0.05 ppm, Mg?0.05 ppm, Na?0.05 ppm, Si (Si components other than the organosilicon components)?0.07 ppm, Zn?0.05 ppm, and S?0.05 ppm. The high-purity trimethylaluminum can be obtained by removing impurities from crude trimethylaluminum through distillation and evaporation.Type: GrantFiled: June 17, 2005Date of Patent: February 20, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Tsudera, Shuji Tanaka, Daisuke Iwai, Hiromi Nishiwaki, Takayuki Honma
-
Patent number: 7112691Abstract: A method of purifying an organometallic compound comprising distilling the organometallic compound for purification while blowing an inert gas through a vapor of the organopolysiloxane, thereby removing from the organometallic compound an impurity having a higher vapor pressure than the organometallic compound.Type: GrantFiled: June 17, 2005Date of Patent: September 26, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Tsudera, Daisuke Iwai, Takayuki Honma, Hiromi Nishiwaki, Shuji Tanaka
-
Patent number: 7005530Abstract: A contaminated Group III metal hydrocarbon is purified by providing an adduct of Group III metal hydrocarbon with a Lewis base in a solvent having a boiling point which is up to 200° C., but at least 30° C. higher than the boiling point of the Group III metal hydrocarbon, separating the solvent from the adduct, and heating the adduct for thermal dissociation, thereby releasing the Group III metal hydrocarbon in high purity form.Type: GrantFiled: June 17, 2004Date of Patent: February 28, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiromi Nishiwaki, Takanobu Tsudera, Takayuki Honma, Shuji Tanaka
-
Patent number: 6987565Abstract: An organometallic compound vaporizing and feeding system includes a carrier gas feed passageway connecting a carrier gas source to a container containing an organometallic compound MO and having a carrier gas mass flow controller, an MO gas passageway connecting the container to an in-line monitor for transporting the MO gas, a sample gas passageway connecting the in-line monitor to a sample inlet of an ICP spectrometer, a standard gas passageway connecting a gas cylinder filled with a calibration standard gas to the sample gas passageway and having a standard gas mass flow controller, and a diluent gas passageway connected to the standard gas passageway for passing a diluent gas for adjusting the concentration of the standard gas and having a diluent gas mass flow controller.Type: GrantFiled: September 22, 2003Date of Patent: January 17, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kazuhiro Hirahara, Takanobu Tsudera, Daisuke Iwai
-
Publication number: 20050283016Abstract: High-purity trimethylaluminum has the following impurity contents: organosilicon components?0.5 ppm, chlorine components?20 ppm, hydrocarbon components?1,000 ppm, Ca?0.05 ppm, Fe?0.05 ppm, Mg?0.05 ppm, Na?0.05 ppm, Si (Si components other than the organosilicon components)?0.07 ppm, Zn?0.05 ppm, and S?0.05 ppm. The high-purity trimethylaluminum can be obtained by removing impurities from crude trimethylaluminum through distillation and evaporation.Type: ApplicationFiled: June 17, 2005Publication date: December 22, 2005Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Tsudera, Shuji Tanaka, Daisuke Iwai, Hiromi Nishiwaki, Takayuki Honma
-
Publication number: 20050283015Abstract: A method of purifying an organometallic compound comprising distilling the organometallic compound for purification while blowing an inert gas through a vapor of the organopolysiloxane, thereby removing from the organometallic compound an impurity having a higher vapor pressure than the organometallic compound.Type: ApplicationFiled: June 17, 2005Publication date: December 22, 2005Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Takanobu Tsudera, Daisuke Iwai, Takayuki Honma, Hiromi Nishiwaki, Shuji Tanaka
-
Patent number: 6867315Abstract: Trialkylgallium is prepared by reacting a gallium halide or alkyl gallium with trialkylaluminum in a solvent having a boiling point which is at least 10° C. higher than the boiling point of the trialkylgallium, such as mesitylene or o-dichlorobenzene. High purity alkyl gallium is obtained in high yields.Type: GrantFiled: June 17, 2004Date of Patent: March 15, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takayuki Honma, Takanobu Tsudera, Hiromi Nishiwaki, Shuji Tanaka
-
Publication number: 20050004383Abstract: A contaminated Group III metal hydrocarbon is purified by providing an adduct of Group III metal hydrocarbon with a Lewis base in a solvent having a boiling point which is up to 200° C., but at least 30° C. higher than the boiling point of the Group III metal hydrocarbon, separating the solvent from the adduct, and heating the adduct for thermal dissociation, thereby releasing the Group III metal hydrocarbon in high purity form.Type: ApplicationFiled: June 17, 2004Publication date: January 6, 2005Inventors: Hiromi Nishiwaki, Takanobu Tsudera, Takayuki Honma, Shuji Tanaka
-
Publication number: 20040260106Abstract: Trialkylgallium is prepared by reacting a gallium halide or alkyl gallium with trialkylaluminum in a solvent having a boiling point which is at least 10° C. higher than the boiling point of the trialkylgallium, such as mesitylene or o-dichlorobenzene. High purity alkyl gallium is obtained in high yields.Type: ApplicationFiled: June 17, 2004Publication date: December 23, 2004Inventors: Takayuki Honma, Takanobu Tsudera, Hiromi Nishiwaki, Tanaka Shuji
-
Publication number: 20040056368Abstract: A liquid organometallic compound vaporizing and feeding system includes a container containing a liquid organometallic compound MO, a vaporizer for vaporizing MO, a liquid passageway connecting the container to the vaporizer and having a liquid MO mass flow controller, a carrier gas source, a carrier gas passageway connecting the source to the vaporizer and having a carrier gas mass flow controller, a sample gas passageway connecting the vaporizer to an ICP emission spectrometer and having an in-line monitor, a calibration standard gas cylinder, and a standard gas passageway connecting the cylinder to the sample gas passageway downstream of the in-line monitor and having a standard gas mass flow controller.Type: ApplicationFiled: September 22, 2003Publication date: March 25, 2004Inventors: Kazuhiro Hirahara, Takanobu Tsudera, Daisuke Iwai
-
Publication number: 20040056044Abstract: An organometallic compound vaporizing and feeding system includes a carrier gas feed passageway connecting a carrier gas source to a container containing an organometallic compound MO and having a carrier gas mass flow controller, an MO gas passageway connecting the container to an in-line monitor for transporting the MO gas, a sample gas passageway connecting the in-line monitor to a sample inlet of an ICP spectrometer, a standard gas passageway connecting a gas cylinder filled with a calibration standard gas to the sample gas passageway and having a standard gas mass flow controller, and a diluent gas passageway connected to the standard gas passageway for passing a diluent gas for adjusting the concentration of the standard gas and having a diluent gas mass flow controller.Type: ApplicationFiled: September 22, 2003Publication date: March 25, 2004Inventors: Kazuhiro Hirahara, Takanobu Tsudera, Daisuke Iwai