Patents by Inventor Takanori Ushio

Takanori Ushio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8329150
    Abstract: Provided are a method for evaluating evenness of suplatast tosilate crystals; stable suplatast tosilate crystals exhibiting evenness in optical purity; and a method for producing the suplatast tosilate crystals. The method for evaluating evenness of suplatast tosilate crystals includes: (a) a step of adding a solvent to suplatast tosilate crystals to thereby dissolve 3% or less of the crystals in the solvent, and subjecting a portion of the supernatant of the resultant suspension to optical purity measurement, and (b) a step of adding a solvent to the remaining suspension to thereby dissolve the entirety of the suspension in the solvent, and subjecting a portion of the resultant solution to optical purity measurement, wherein the optical purity as measured in the step (a) is compared with the optical purity as measured in the step (b). The suplatast tosilate crystals exhibits excellent evenness and thermal stability. The method for producing the suplatast tosilate crystals is also provided.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: December 11, 2012
    Assignee: Taiho Pharmaceutical Co., Ltd.
    Inventors: Takanori Ushio, Keiko Nagai
  • Publication number: 20110213179
    Abstract: Provided are a method for evaluating evenness of suplatast tosilate crystals; stable suplatast tosilate crystals exhibiting evenness in optical purity; and a method for producing the suplatast tosilate crystals. The method for evaluating evenness of suplatast tosilate crystals includes: (a) a step of adding a solvent to suplatast tosilate crystals to thereby dissolve 30 or less of the crystals in the solvent, and subjecting a portion of the supernatant of the resultant suspension to optical purity measurement, and (b) a step of adding a solvent to the remaining suspension to thereby dissolve the entirety of the suspension in the solvent, and subjecting a portion of the resultant solution to optical purity measurement, wherein the optical purity as measured in the step (a) is compared with the optical purity as measured in the step (b). The suplatast tosilate crystals exhibits excellent evenness and thermal stability. The method for producing the suplatast tosilate crystals is also provided.
    Type: Application
    Filed: February 24, 2011
    Publication date: September 1, 2011
    Applicant: TAIHO PHARMACEUTICAL CO., LTD.
    Inventors: Takanori Ushio, Keiko Nagai
  • Patent number: 7955607
    Abstract: Provided are a method for evaluating evenness of suplatast tosilate crystals; stable suplatast tosilate crystals exhibiting evenness in optical purity; and a method for producing the suplatast tosilate crystals. The method for evaluating evenness of suplatast tosilate crystals includes: (a) a step of adding a solvent to suplatast tosilate crystals to thereby dissolve 3% or less of the crystals in the solvent, and subjecting a portion of the supernatant of the resultant suspension to optical purity measurement, and (b) a step of adding a solvent to the remaining suspension to thereby dissolve the entirety of the suspension in the solvent, and subjecting a portion of the resultant solution to optical purity measurement, wherein the optical purity as measured in the step (a) is compared with the optical purity as measured in the step (b). The suplatast tosilate crystals exhibits excellent evenness and thermal stability. The method for producing the suplatast tosilate crystals is also provided.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: June 7, 2011
    Assignee: Taiho Pharmaceutical Co., Ltd.
    Inventors: Takanori Ushio, Keiko Nagai
  • Publication number: 20080070989
    Abstract: Provided are a method for evaluating evenness of suplatast tosilate crystals; stable suplatast tosilate crystals exhibiting evenness in optical purity; and a method for producing the suplatast tosilate crystals. The method for evaluating evenness of suplatast tosilate crystals includes: (a) a step of adding a solvent to suplatast tosilate crystals to thereby dissolve 3% or less of the crystals in the solvent, and subjecting a portion of the supernatant of the resultant suspension to optical purity measurement, and (b) a step of adding a solvent to the remaining suspension to thereby dissolve the entirety of the suspension in the solvent, and subjecting a portion of the resultant solution to optical purity measurement, wherein the optical purity as measured in the step (a) is compared with the optical purity as measured in the step (b). The suplatast tosilate crystals exhibits excellent evenness and thermal stability. The method for producing the suplatast tosilate crystals is also provided.
    Type: Application
    Filed: July 13, 2005
    Publication date: March 20, 2008
    Applicant: Taiho Pharmaceutical Co., Ltd.
    Inventors: Takanori Ushio, Keiko Nagai
  • Patent number: 7138140
    Abstract: Provided are a suplatast tosilate crystal showing characteristic peaks in powder X-ray diffraction diffraction angles (20±0.1°) of 5.6°, 9.0°, 11.0°, 15.3°, 16.5°, 17.2°, 17.9°, 19.2°, 19.9°, and 21.5°; and a preparation process of the crystal. Owing to merits such as fluctuation-free optically active substance ratio, low hygroscopicity and high storage stability, the suplatast tosilate crystal of the present invention can be mass-produced easily and, at the same time, is advantageous in drug preparation quality management. It is thus excellent as raw material for pharmaceuticals.
    Type: Grant
    Filed: April 16, 2002
    Date of Patent: November 21, 2006
    Assignee: Taiho Pharmaceutical Co., Ltd.
    Inventors: Takanori Ushio, Hidenori Miura, Keiko Nagai
  • Publication number: 20030149105
    Abstract: Provided are a suplatast tosilate crystal showing characteristic peaks in powder X-ray diffraction at diffraction angles (2&thgr;+0.1°) of 5.6°, 9.0°, 11.0°, 15.3°, 16.5°, 17.2°, 17.9°, 19.2°, 19.9° and 21.5°; and a preparation process of the crystal.
    Type: Application
    Filed: December 13, 2002
    Publication date: August 7, 2003
    Inventors: Takanori Ushio, Hidenori Miuta, Keiko Nagai