Abstract: A carbon material for a non-aqueous secondary battery containing a graphite capable of occluding and releasing lithium ions, and having a cumulative pore volume at pore diameters in a range of 0.01 ?m to 1 ?m of 0.08 mL/g or more, a roundness, as determined by flow-type particle image analysis, of 0.88 or greater, and a pore diameter to particle diameter ratio (PD/d50 (%)) of 1.8 or less, the ratio being given by equation (1A): PD/d50 (%)=mode pore diameter (PD) in a pore diameter range of 0.01 ?m to 1 ?m in a pore distribution determined by mercury intrusion/volume-based average particle diameter (d50)×100 is provided.

Abstract: A surface modifying method of modifying a bonding surface of a substrate to be bonded to another substrate by plasma of a processing gas includes an adjusting process and a modifying process. In the adjusting process, an amount of moisture in a processing vessel is adjusted by supplying a humidified gas into the processing vessel allowed to accommodate the substrate therein. In the modifying process, the bonding surface of the substrate is modified by forming the plasma of the processing gas in the processing vessel in a state that the amount of moisture in the processing vessel is adjusted.

Abstract: A film forming method is a method of forming a film on a substrate top face including a first region in which a metal or a semiconductor is exposed and a second region in which an insulator is exposed. The method includes a SAM forming process of forming a self-assembled monolayer film of a perfluoropolyether group-containing compound on the first region and a film growth process of forming a predetermined film on the second region after execution of SAM forming process.

Abstract: A film formation method includes: a step of preparing a substrate including a layer of a first material formed on a surface in a first region, and a layer of a second material formed on a surface in a second region; a first SAM formation step of forming a first self-assembled monolayer in the first region by supplying a raw material gas for the first self-assembled monolayer, wherein the raw material gas corresponds to the first material; and a second SAM formation step for forming a second self-assembled monolayer including an organic acid group or a second self-assembled monolayer including a condensable group on top of the first self-assembled monolayer in the first region by supplying a first gas, which includes an organic acid group, while including a self-assembling molecule, or by supplying a second gas, which includes a condensable group, while including a self-assembling molecule.

Abstract: A surface-treating agent including a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH?CH2 or —C?CH, which is able to form a layer having higher alkaline resistance.

Abstract: Provided is an information processing apparatus capable of acquiring a second inspection program capable of determining whether it is appropriate to cause a first inspection program, which has undergone machine learning so that acceptance of an acceptable image/unacceptable image may be determined, to determine acceptance of an unknown image. The information processing apparatus ranks, for pseudo pair images including acceptable images and unacceptable images obtained by performing pseudo image generation processing on determined pair images including acceptable images and unacceptable images, the pseudo pair images according to correctness of the acceptance determination by the first inspection program for each pair on the basis of results of the acceptance determination by the first inspection program, and by causing a mathematical model to undergo second machine learning that uses the determined pair images and a predetermined number or more of the ranked pseudo pair images as inputs.

Abstract: A film forming method is a method of forming a film on a substrate top face including a first region in which a metal or a semiconductor is exposed and a second region in which an insulator is exposed. The method includes a SAM forming process of forming a self-assembled monolayer film of a perfluoropolyether group-containing compound on the first region and a film growth process of forming a predetermined film on the second region after execution of SAM forming process.

Abstract: A surface-treating agent for a nitrided surface, including a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH?CH2 or —C?CH. Also disclosed is an article treated with the surface-treating agent, a method for forming a surface-treating layer on a surface of a base material, a surface-treating layer forming apparatus, and a process for producing an article including a base material and a surface-treating layer coating a surface of the base material.

Abstract: An abnormal detection apparatus including an imaging unit configured to image generate a first and second image frames included in a first image frame group; a pseudo work generation unit configured to generate the first and a third image frames, the third and the second image frames, or the third and a fourth image frames, included in a second image frame group, respectively, with respect to the first and second image frames included in the first image frame group; a normal space generation unit configured to generate a normal space data based on the first and second image frames included in the first image frame group, and the first and third image frames, the third and second image frames, or the third and fourth image frames, included in the second image frame group; and a comparison unit configured to detect abnormality based on the normal space data.

Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.

Abstract: In a preparation stage, an abnormality detection device detects a first characteristic amount from each first frame contained in video data and stores the first characteristic amount in a storage unit. In an abnormality detection stage, the abnormality detection device detects a second characteristic amount from each second frame contained in video data obtained by imaging a work operation of the robot and stores the first characteristic amount in the storage unit. The abnormality detection device compares the second characteristic mount of the second frame and the first characteristic amount of each of the first frames and specifies the first characteristic amount that is the closest to the second characteristic amount. The abnormality detection device determines whether the work operation of the robot in the abnormality detection stage is abnormal on the basis of the specified first characteristic amount and the second characteristic amount.

Abstract: An etching method includes: forming straight-chain molecules containing CFx on a substrate to be etched; and irradiating the substrate on which the molecules are formed with an activation gas that activates the CFx.

Abstract: A plasma electrode is provided with an electrode plate, a ground plate, and an insulating plate arranged between the electrode plate and the ground plate. Protrusions of the electrode plate are arranged inside through holes of the ground plate and inside through holes of the insulating plate. One of the through hole provided on the center axes of the protrusions and the through hole provided around the through hole discharges a first processing gas to below the ground plate. The other of the through holes exhausts a gas existing below the ground plate. A second flow path around the protrusions supplies a second processing gas supplied via a first flow path to a gap between outer walls of the protrusions and inner walls of the through holes. The second processing gas supplied to the gap is converted into plasma by high frequency power applied to the electrode plate.

Abstract: An abnormal detection apparatus including an imaging unit configured to image generate a first and second image frames included in a first image frame group; a pseudo work generation unit configured to generate the first and a third image frames, the third and the second image frames, or the third and a fourth image frames, included in a second image frame group, respectively, with respect to the first and second image frames included in the first image frame group; a normal space generation unit configured to generate a normal space data based on the first and second image frames included in the first image frame group, and the first and third image frames, the third and second image frames, or the third and fourth image frames, included in the second image frame group; and a comparison unit configured to detect abnormality based on the normal space data.

Abstract: A film formation apparatus for forming a self-assembled monomolecular film on a film formation surface of a substrate includes: a chamber for accommodating the substrate, the chamber including a facing inner wall surface facing the film formation surface of the substrate, the facing inner wall surface being a ground potential surface; a source gas supply part for supplying a source gas for the self-assembled monomolecular film into the chamber; and an electrode positioned between the film formation surface of the substrate accommodated in the chamber and the facing inner wall surface of the chamber, and configured to form an electric field in a direction extending from the film formation surface of the substrate accommodated in the chamber toward the facing inner wall surface of the chamber or in a direction extending from the facing inner wall surface of the chamber toward the film formation surface of the substrate.

Abstract: A surface-treating agent for a nitrided surface, including a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH?CH2 or —C?CH. Also disclosed is an article treated with the surface-treating agent, a method for forming a surface-treating layer on a surface of a base material, a surface-treating layer forming apparatus, and a process for producing an article including a base material and a surface-treating layer coating a surface of the base material.

Abstract: There is provided a SiC film forming method for forming a SiC film on a workpiece, including: a first step of forming a carbon film on the workpiece; and a second step of exposing the carbon film to a silicon-containing gas and causing silicon to be combined into the carbon film.

Abstract: In a preparation stage, an abnormality detection device detects a first characteristic amount from each first frame contained in video data and stores the first characteristic amount in a storage unit. In an abnormality detection stage, the abnormality detection device detects a second characteristic amount from each second frame contained in video data obtained by imaging a work operation of the robot and stores the first characteristic amount in the storage unit. The abnormality detection device compares the second characteristic mount of the second frame and the first characteristic amount of each of the first frames and specifies the first characteristic amount that is the closest to the second characteristic amount. The abnormality detection device determines whether the work operation of the robot in the abnormality detection stage is abnormal on the basis of the specified first characteristic amount and the second characteristic amount.

Abstract: The present invention provides a surface-treating agent comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH?CH2 or —C?CH, which is able to form a layer having higher alkaline resistance.

Abstract: There is provided a method for forming an organic monomolecular film on a surface of a workpiece with a network structure of Si and O formed in at least a portion of the surface. The method includes: performing a surface treatment on the workpiece such that the surface has a state where bonding sites of an organic monomolecular film material to be used exist at high density; and supplying the organic monomolecular film material to the workpiece subjected to the surface treatment and forming the organic monomolecular film on the surface of the workpiece.