Patents by Inventor Takashi Inuzima

Takashi Inuzima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Contact image sensor having light-receiving windows
    Patent number: 5091638
    Abstract: An improved image sensor is described. The sensor includes a photosensitive semiconductor device comprises a glass substrate, a light blocking electrode formed on the glass substrate, a photosensitive semiconductor film formed on the electrode, a transparent electrode. A light window is opened through the semiconductor device. On the light path including the light window, an uneven interface is formed in order that light rays incident on the sensor is modified and reachs the photosensitive semiconductor after reflection on an original.
    Type: Grant
    Filed: July 19, 1990
    Date of Patent: February 25, 1992
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hisato Shinohara, Nobumitsu Amachi, Naoya Sakamoto, Takashi Inuzima
  • Photosensitive semiconductor contact image sensor
    Patent number: 4959533
    Abstract: An improved image sensor is described. The sensor includes a photosensitive semiconductor device comprises a glass substrate, a light blocking electrode formed on the glass substrate, a photosensitive semiconductor film formed on the electrode, a transparent electrode. A light window is opened through the semiconductor device. On the light path including the light window, an uneven interface is formed in order that light rays incident on the sensor is modified and reachs the photosensitive semiconductor after reflection on an original.
    Type: Grant
    Filed: October 18, 1988
    Date of Patent: September 25, 1990
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hisato Shinohara, Nobumitsu Amachi, Naoya Sakamoto, Takashi Inuzima
  • Method of depositing films using photo-CVD with chamber plasma cleaning
    Patent number: 4950624
    Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light source for photo CVD or a pair of electrode for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light or plasma evenly throughout the surfaces to be coated.
    Type: Grant
    Filed: May 16, 1988
    Date of Patent: August 21, 1990
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inuzima, Shigenori Hayashi, Toru Takayama, Seiichi Odaka, Naoki Hirose